Witold Wroczewski
at IMS Nanofabrication GmbH
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 1 December 2022 Presentation + Paper
Proceedings Volume 12293, 122930O (2022) https://doi.org/10.1117/12.2645895
KEYWORDS: Photomasks, Extreme ultraviolet, Line edge roughness, Line width roughness, Electron beam lithography, Distortion, Optical lithography, Critical dimension metrology

SPIE Journal Paper | 28 October 2021
Peter Hudek, Michal Jurkovic, Pavlina Choleva, Witold Wroczewski, Masahiro Hashimoto, Kazunori Ono, Toru Fukui, Toshiya Takahashi, Kotaro Takahashi
JM3, Vol. 20, Issue 04, 041402, (October 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041402
KEYWORDS: Photomasks, Extreme ultraviolet, Point spread functions, Photoresist processing, Extreme ultraviolet lithography, Scattering, Monte Carlo methods, Lithography, Electron beam lithography, Backscatter

Proceedings Article | 22 February 2021 Presentation
Peter Hudek, Michal Jurkovic, Pavlina Choleva, Witold Wroczewski, Masahiro Hashimoto, Kazunori Ono, Toru Fukui, Toshiya Takahashi, Kotaro Takahashi
Proceedings Volume 11610, 116100T (2021) https://doi.org/10.1117/12.2584588
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Scattering, Point spread functions, Photoresist processing, Numerical simulations, Lithography, Chemically amplified resists

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