Yasutohi Ito
at Semiconductor Leading Edge Technologies Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 9 November 2005 Paper
Yasutoshi Itou, Yoshiyuki Tanaka, Osamu Suga, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Tomokazu Kozakai, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida
Proceedings Volume 5992, 59924Y (2005) https://doi.org/10.1117/12.632756
KEYWORDS: Gallium, Photomasks, Quartz, Ions, Transmittance, Lithography, Monte Carlo methods, 193nm lithography, Binary data, Opacity

Proceedings Article | 28 June 2005 Paper
Yasutoshi Itou, Yoshiyuki Tanaka, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Tomokazu Kozakai, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617344
KEYWORDS: Photomasks, Lithography, Opacity, Computer aided design, Atomic force microscopy, Surface conduction electron emitter displays, 193nm lithography, Control systems, Acoustics, Etching

Proceedings Article | 6 December 2004 Paper
Yasutoshi Itou, Yoshiyuki Tanaka, Nobuyuki Yoshioka, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Tomokazu Kozakai, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida, Toshiya Ozawa
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.578615
KEYWORDS: Photomasks, Lithography, Etching, Computer aided design, Control systems, Surface conduction electron emitter displays, 193nm lithography, Chromium, Transmittance, Imaging systems

Proceedings Article | 20 August 2004 Paper
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557763
KEYWORDS: Photomasks, Metrology, Atomic force microscopy, Critical dimension metrology, 3D metrology, Microscopes, Atomic force microscope, Contamination, Chromium, Semiconductors

Proceedings Article | 20 August 2004 Paper
Yasutoshi Itou, Yoshiyuki Tanaka, Nobuyuki Yoshioka, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Junichi Tashiro, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida, Toshiya Ozawa
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557789
KEYWORDS: Computer aided design, Photomasks, Lithography, Transmittance, Control systems, Carbon, Surface conduction electron emitter displays, 193nm lithography, Image resolution, Raman spectroscopy

Showing 5 of 6 publications
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