Ms. Yu Zhang Profile

Yu Zhang

at ARCNL

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Author

Publications (4)

SPIE Journal Paper | 15 September 2017 Open Access

Extreme ultraviolet patterning of tin-oxo cages

Jarich Haitjema, Yu Zhang, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci, Albert Brouwer

JM3, Vol. 16, Issue 03, 033510, (September 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.3.033510

KEYWORDS: Optical lithography, Extreme ultraviolet, Tin, Extreme ultraviolet lithography, Photoresist materials, Lithography, Absorption, Silicon, Molecules, Chemical species

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SPIE Journal Paper | 22 June 2017 Open Access

Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy

Yu Zhang, Jarich Haitjema, Xiaomeng Liu, Fredrik Johansson, Andreas Lindblad, Sonia Castellanos, Niklas Ottosson, Albert Brouwer

JM3, Vol. 16, Issue 02, 023510, (June 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.2.023510

KEYWORDS: Deep ultraviolet, Hard x-rays, Photoemission spectroscopy, Photoresist materials, Extreme ultraviolet lithography, Oxidation, Chemical species, Extreme ultraviolet, Absorption, 3D modeling

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Proceedings Article | 27 March 2017 Paper

Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy

Yu Zhang, Jarich Haitjema, Xiaomeng Liu, Fredrik Johansson, Andreas Lindblad, Sonia Castellanos, Niklas Ottosson, Albert Brouwer

Proceedings Volume 10146, 1014606 (2017) https://doi.org/10.1117/12.2257893

KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Chemical species, Spectroscopy, Tin, Hard x-rays, Photoemission spectroscopy, Photochemistry, Chemical reactions, Electrons, Oxidation, Deep ultraviolet, Oxygen, Molecules

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Proceedings Article | 24 March 2017 Paper

Extreme ultraviolet patterning of tin-oxo cages

Jarich Haitjema, Yu Zhang, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci, Albert Brouwer

Proceedings Volume 10143, 1014325 (2017) https://doi.org/10.1117/12.2257911

KEYWORDS: Photoresist materials, Extreme ultraviolet, Absorption, Infrared spectroscopy, Extreme ultraviolet lithography, Spectroscopy, Tin, Optical lithography, Lithography, Silicon, Thin films, Stochastic processes

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