An electron beam lithography tool, which employs the SCALPEL technique, requires an extremely uniform beam to illuminate the scattering Mask, with the cathode operating in the temperature limited mode. It has been previously shown that LaB6 cathodes are not stable in this mode of operation. We have explored the possibility of implementing refined Tantalum-based emitters in the SCALPEL source cathode, and have developed large-area flat cathodes featuring suitably high emission uniformity under temperature limited operation.
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