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23 June 2000 Acidity control for compatibility of novel organic bottom antireflective coating materials with various KrF and ArF photoresists
Sung-Eun Hong, Min-Ho Jung, Jae Chang Jung, Geunsu Lee, Jin-Soo Kim, Cha-Won Koh, Ki-Ho Baik
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Proceedings Volume 3999, Advances in Resist Technology and Processing XVII; (2000) https://doi.org/10.1117/12.388259
Event: Microlithography 2000, 2000, Santa Clara, CA, United States
Abstract
The compatibility of novel organic bottom anti-reflective coatings (BARC), HEART003 and HEART004 developed by Hyundai Electronics, with various chemically amplified resists (CAR) was reported. The incompatibility between organic BARC and CARs is caused by the differences of residual activity on the surface of organic BARC after baking process and the types of dissolution inhibitors in the polymer of CAR and photo acid generators (PAG) used in their formulation. In KrF lithography, the HEART003 was much compatible with acetal type resist than annealing type resist because it's neutral acidity on the surface of BARC. The incompatibility with annealing type resist was caused by weak residual acidity on the surface of BARC, relatively. Thus we tried to adjust the feasible residual acidity on the surface of BARC and optimum thermal baking condition. The modified HEART003 has excellent compatibility not only with acetal type resist, but also with annealing type resist in the same platform. In ArF lithography, the HEART004 has also good compatibility with cycloolefin type and (meth)acrylate type ArF resist by modification of its formulation.
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Sung-Eun Hong, Min-Ho Jung, Jae Chang Jung, Geunsu Lee, Jin-Soo Kim, Cha-Won Koh, and Ki-Ho Baik "Acidity control for compatibility of novel organic bottom antireflective coating materials with various KrF and ArF photoresists", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388259
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KEYWORDS
Annealing
Lithography
Bottom antireflective coatings
Photoresist materials
Electronics
Etching
Interfaces
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