Mr. Min-Ho Jung Profile

Min-Ho Jung

at Shipley Korea Ltd

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 14 May 2004 Paper

Analysis of solvent effect to control the BARC coating uniformity

Min-Ho Jung, Sangwoong Yoon, Eun-Soon Chung, Beom-Sang Yoo, Jeong Yun Ya, Don Winning, Boo Deuk Kim, Hong Lee, Do Young Kim, Young Hoon Kim, Myungsun Kim, Young Ho Kim, Sang-Mun Chon

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533924

KEYWORDS: Coating, Humidity, Polymers, Statistical modeling, Control systems, Reflectivity, Photoresist materials, Manufacturing, Chemistry, Inspection

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Proceedings Article | 24 August 2001 Paper

Novel high-performance ArF resist for sub-100-nm lithography

Geunsu Lee, Cha-Won Koh, Jae Chang Jung, Min-Ho Jung, Keun-Kyu Kong, Jin-Soo Kim, Ki-Soo Shin, Se-Jin Choi, Yang-Sook Kim, Yong-Jun Choi, Deog-Bae Kim

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436843

KEYWORDS: Lithography, Line edge roughness, Photomasks, Etching, Polymers, Silicon, Monochromatic aberrations, Oxides, Scanning electron microscopy, Optical lithography

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Proceedings Article | 24 August 2001 Paper

Novel chemically amplified positive resist containing acetal-type crosslinker of poly(3,3'-dimethoxypropene) for 193-nm top surface imaging process

Cha-Won Koh, Jae Chang Jung, Myoung-Soo Kim, Keun-Kyu Kong, Geunsu Lee, Min-Ho Jung, Jin-Soo Kim, Ki-Soo Shin

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436911

KEYWORDS: Lithography, Photoresist processing, Image processing, 193nm lithography, Etching, Photoresist materials, Photoresist developing, Line edge roughness, Resistance, Electron beam lithography

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Proceedings Article | 23 June 2000 Paper

Acidity control for compatibility of novel organic bottom antireflective coating materials with various KrF and ArF photoresists

Sung-Eun Hong, Min-Ho Jung, Jae Chang Jung, Geunsu Lee, Jin-Soo Kim, Cha-Won Koh, Ki-Ho Baik

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388259

KEYWORDS: Annealing, Lithography, Bottom antireflective coatings, Photoresist materials, Electronics, Reflectivity, Etching, Interfaces, Natural surfaces, Polymers

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Proceedings Article | 23 June 2000 Paper

ArF photoresist containing novel acid labile cross-linker for high contrast and PED stability

Geunsu Lee, Cha-Won Koh, Sung-Eun Hong, Jae Chang Jung, Min-Ho Jung, Hyeong-Soo Kim, Ki-Ho Baik

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388303

KEYWORDS: Etching, Photoresist materials, Lithography, Polymers, Resistance, Critical dimension metrology, Photoresist processing, Scanning electron microscopy, Photoresist developing, Yield improvement

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Proceedings Article | 11 June 1999 Paper

Acid diffusion and evaporation in chemically amplified resists

Jin-Baek Kim, Young-Gil Kwon, Jae-Hak Choi, Min-Ho Jung

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350236

KEYWORDS: Diffusion, Polymers, Chemically amplified resists, Semiconducting wafers, Silicon, Absorbance, Deep ultraviolet, Optical filters, Chemistry, Molecules

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Proceedings Article | 11 June 1999 Paper

Novel e-beam resist with alicyclic olefin moieties for high etch selectivity

Sung-Eun Hong, Chi-Hyeong Roh, Jae Chang Jung, Min-Ho Jung, Hyeong-Soo Kim, Ki-Ho Baik

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350243

KEYWORDS: Etching, Electron beam lithography, Silica, Tungsten, Photoresist materials, Electron beams, Lithography, Polymerization, Resistance, Polymers

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Proceedings Article | 11 June 1999 Paper

Novel 193-nm single-layer resist containing a multifunctional monomer

Geunsu Lee, Cha-Won Koh, Jae Chang Jung, Min-Ho Jung, Hyeong-Soo Kim, Ki-Ho Baik, Il-Hyun Choi

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350206

KEYWORDS: Etching, Resistance, Lithography, Photoresist materials, Polymers, Silicon, Scanning electron microscopy, Yield improvement, Photoresist processing, Polymerization

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Proceedings Article | 7 July 1997 Paper

Environmentally stable chemically amplified positive resist containing vinyllactam terpolymers

Cheol-Kyu Bok, Cha-Won Koh, Min-Ho Jung, Ki-Ho Baik, Jin-Baek Kim, Jong-Ho Cheong

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275852

KEYWORDS: Lithography, Polymers, Contamination, Deep ultraviolet, Semiconducting wafers, Chemically amplified resists, Excimers, Diffusion, Photoresist materials, Polymerization

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Showing 5 of 9 publications

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