Advances in Step and Flash imprint lithography

Stephen C. Johnson; Todd C. Bailey; Michael D. Dickey; Britain J. Smith; Eunha K. Kim; Andrew Thomas Jamieson; Nicholas A. Stacey; John G. Ekerdt; C. Grant Willson; David P. Mancini; William J. Dauksher; Kevin J. Nordquist; Douglas J. Resnick

doi:10.1117/12.484985

16 June 2003 Advances in Step and Flash imprint lithography

Stephen C. Johnson, Todd C. Bailey, Michael D. Dickey, Britain J. Smith, Eunha K. Kim, Andrew Thomas Jamieson, Nicholas A. Stacey, John G. Ekerdt, C. Grant Willson, David P. Mancini, William J. Dauksher, Kevin J. Nordquist, Douglas J. Resnick

Author Affiliations +

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.484985
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Recent work on Step and Flash Imprint Lithography (SFIL) has been focused on process and materials fundamentals and demonstration of resolution capability. Etch transfer rpocesses have been developed that are capable of transferring imprinted images though 150 nm of residual etch barrier, yielding sub 50 nm lines with aspect ratios greater than 8:1. A model has been developed for the photoinitiated, free radical curing of the acrylate etch barrier materials that have been used in the SFIL process. This model includes the effects of oxygen transport on the kinetics of the reaction and yields a deeper understanding of the importance of oxygen inhibition, and the resulting impact of that process on throughput and defect generation. This understanding has motivated investigation of etch barrier materials such as vinyl ethers that are cured by a cationic mechanism, which does not exhibit these same effects. Initial work on statistical defect analysis has is reported and it does not reveal pathological trends.

Citation Download Citation

Stephen C. Johnson, Todd C. Bailey, Michael D. Dickey, Britain J. Smith, Eunha K. Kim, Andrew Thomas Jamieson, Nicholas A. Stacey, John G. Ekerdt, C. Grant Willson, David P. Mancini, William J. Dauksher, Kevin J. Nordquist, and Douglas J. Resnick "Advances in Step and Flash imprint lithography", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.484985

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available