Dr. Nick A. Stacey Profile

Dr. Nick A. Stacey

Global Laboratory Manager at 3M Co

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 19 May 2008 Paper

32 nm imprint masks using variable shape beam pattern generators

Douglas Resnick, Jeongho Yeo, Ecron Thompson, Gerard Schmid, Nick Stacey, Ben Eynon, John Maltabes, Joseph Perez, Kosta Selinidis, Hoyeon Kim

Proceedings Volume 7028, 70280R (2008) https://doi.org/10.1117/12.793034

KEYWORDS: Semiconducting wafers, Line width roughness, Lithography, Etching, Photomasks, Critical dimension metrology, Beam shaping, Overlay metrology, Manufacturing, Line edge roughness

Read Abstract +

Proceedings Article | 23 January 2006 Paper

Fabrication of nano and micro optical elements by step and flash imprint lithography

Mike Watts, Dwayne LaBrake, Niyaz Khusnatdinov, Nick Stacey, Mike Miller, Gary Doyle

Proceedings Volume 6110, 61100K (2006) https://doi.org/10.1117/12.647301

KEYWORDS: Lenses, Etching, Lithography, Polarizers, Aluminum, Optical lithography, Optical components, Fabrication, Photoresist processing, Semiconducting wafers

Read Abstract +

The Step and Flash Imprint Lithography (S-FIL^TM) process is a step and repeat nano-imprint lithography (NIL) technique based on UV curable low viscosity liquids.^1,2,3Investigation by this group and others has shown that the resolution of replication by imprint lithography is limited only by the size of the structures that can be created on the template (mold). S-FIL uses field-to-field drop dispensing of UV curable liquids for step and repeat patterning. This approach allows for micro and nano-fabrication of devices with widely varying pattern densities and complicated structures. Wire grid polarizers and micro lenses are two examples for optical components that can be formed using SFIL technology. Step and Flash Imprint Lithography Reverse (S-FIL/R) tone has been used to form resist patterns for a number of different device types ^1,4,6. The authors have employed S-FIL/R and dry develop techniques to form resist patterns with 100 nm period useful for the fabrication of wire grid polarizers. S-FIL/R has a number of advantages over interference lithography techniques for the fabrication of sub 200 nm period grating structures including but no limited to pattern repeatability, vibration insensitivity, high aspect ratio feature formation, greater extendibility and high resolution. The authors have devised imprint and dry etching processes for resist and substrate patterning to form Al based wire grid polarizers with 100 nm pitch. The fabrication processes and resulting devises will be described. While S-FIL is useful for in the formation of resist patterned wafers, it is also capable of forming devices by functional material patterning. Polymer micro lenses are a good examples of functional material devices useful for a number of applications including CMOS and CCD cameras. The fact that lens geometry is defined by the template and requires no post imprint processing provides a strong advantage over current lens formation approaches. Recent results and the state of current micro lens fabrication by S-FIL is described.

Proceedings Article | 6 May 2005 Paper

Fabrication of nanometer sized features on non-flat substrates using a nano-imprint lithography process

Nick Stacey, Frank Xu, Gary Doyle, Mike Watts, S. Sreenivasan, Dwayne LaBrake, Mike Miller

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.607340

KEYWORDS: Semiconducting wafers, Etching, Lithography, Polishing, Nanoimprint lithography, Silicon, Photomicroscopy, Optical lithography, Scanning electron microscopy, Nanolithography

Read Abstract +

Proceedings Article | 20 May 2004 Paper

Mesoscale modeling for SFIL simulating polymerization kinetics and densification

Diana Convey, C. Grant Willson, Peter Fejes, Douglas Resnick, Yi Wei, William Dauksher, Kathleen Gehoski, Eui Kim, Sean Burns, Kevin Nordquist, Jason Meiring, Nicholas Stacey, Stephen Johnson, Ryan Burns, David Mancini, Gerard Schmid, Michael Dickey

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536216

KEYWORDS: Etching, Polymerization, Molecules, Monte Carlo methods, Finite element methods, Lithography, Ultraviolet radiation, Molecular interactions, Scanning electron microscopy, Optical lithography

Read Abstract +

Proceedings Article | 20 May 2004 Paper

Development of imprint materials for the Step and Flash Imprint Lithography process

Philip Schumaker, Nicholas Stacey, Van Truskett, Frank Xu, Jin Choi, C. Grant Willson, Norman Schumaker, Ian McMackin, Mike Watts, Ecron Thompson, Daniel Babbs, S. Sreenivasan

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.538734

KEYWORDS: Lithography, Ultraviolet radiation, Silicon, Optical lithography, Liquids, Semiconducting wafers, Etching, Optical alignment, Scanning electron microscopy, Interfaces

Read Abstract +

Proceedings Article | 16 June 2003 Open Access

Imprint lithography: lab curiosity or the real NGL

William Dauksher, Stephen Johnson, David Mancini, Kevin Nordquist, Norman Schumaker, S. Sreenivasan, Todd Bailey, C. Grant Willson, Nicholas Stacey, John Ekerdt, Douglas Resnick

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490126

KEYWORDS: Etching, Lithography, Semiconducting wafers, Silicon, Nanoimprint lithography, Chromium, Optical alignment, Image processing, Oxides, Inspection

Read Abstract +

DOWNLOAD PAPER

Proceedings Article | 16 June 2003 Paper

Advances in Step and Flash imprint lithography

John Ekerdt, Andrew Jamieson, William Dauksher, Kevin Nordquist, Stephen Johnson, Britain Smith, Nicholas Stacey, Douglas Resnick, David Mancini, Eunha Kim, C. Grant Willson, Michael Dickey, Todd Bailey

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484985

KEYWORDS: Etching, Oxygen, Lithography, Polymerization, Silicon, Data modeling, Semiconducting wafers, Statistical analysis, Inspection, Materials processing

Read Abstract +

Proceedings Article | 16 June 2003 Paper

Employing Step and Flash imprint lithography for gate-level patterning of a MOSFET device

Todd Bailey, Nicholas Stacey, Britain Smith, William Dauksher, Chris Mackay, David Onsongo, J. Donnelly, David Mancini, Grant Willson, Sanjay Banerjee, John Ekerdt, Kevin Nordquist, S. Sreenivasan, Douglas Resnick

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490142

KEYWORDS: Etching, Lithography, Field effect transistors, Optical alignment, Semiconducting wafers, Optical lithography, Photomasks, Oxides, Reactive ion etching, Halogens

Read Abstract +

Showing 5 of 8 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years