Optimizing noise for defect analysis with through-focus scanning optical microscopy

Ravikiran Attota; John Kramar

doi:10.1117/12.2220679

8 March 2016 Optimizing noise for defect analysis with through-focus scanning optical microscopy

Ravikiran Attota, John Kramar

Proceedings Volume 9778, Metrology, Inspection, and Process Control for Microlithography XXX; 977811 (2016) https://doi.org/10.1117/12.2220679
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

Through-focus scanning optical microscopy (TSOM) shows promise for patterned defect analysis, but it is important to minimize total system noise. TSOM is a three-dimensional shape metrology method that can achieve sub-nanometer measurement sensitivity by analyzing sets of images acquired through-focus using a conventional optical microscope. Here we present a systematic noise-analysis study for optimizing data collection and data processing parameters for TSOM and then demonstrate how the optimized parameters affect defect analysis. We show that the best balance between signalto- noise performance and acquisition time can be achieved by judicious spatial averaging. Correct background-signal subtraction of the imaging-system inhomogeneities is also critical, as well as careful alignment of the constituent images used in differential TSOM analysis.

Citation Download Citation

Ravikiran Attota and John Kramar "Optimizing noise for defect analysis with through-focus scanning optical microscopy", Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 977811 (8 March 2016); https://doi.org/10.1117/12.2220679

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