Presentation
13 March 2023 Ultra-large nonlinearity of silicon nanostructure excited via a super-continuum pulsed laser
Author Affiliations +
Proceedings Volume PC12426, Silicon Photonics XVIII; PC1242609 (2023) https://doi.org/10.1117/12.2649562
Event: SPIE OPTO, 2023, San Francisco, California, United States
Abstract
Through the combination of nanoscale Mie-resonance and photothermal/thermo-optical effect, plus a nanosecond excitation source that matches the thermal relaxation time of a silicon nanostructure, we demonstrated an ultra-large nonlinear index n2 = 1 um^2/mW, six-orders larger than the value in bulk. Under a confocal laser scanning scheme, unexpected sharp transition of scattering intensity is unveiled, suggesting a rapid temperature transient. The super-continuum wavelength tunability offers high-efficiency excitation among nano-silicon with various sizes. This robust and ultra-large nonlinearity shall be useful in optical switching and super-resolution mapping of semiconductor nanophotonic structures.
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Te-Hsin Yen, Yu-Chieh Chen, Jhih-Jia Chen, Junichi Takahara, and Shi-Wei Chu "Ultra-large nonlinearity of silicon nanostructure excited via a super-continuum pulsed laser", Proc. SPIE PC12426, Silicon Photonics XVIII, PC1242609 (13 March 2023); https://doi.org/10.1117/12.2649562
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KEYWORDS
Silicon

Nanostructures

Pulsed laser operation

Semiconductor lasers

Optical switching

Photonic devices

Scattering

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