Dr. Akira Kawai Profile

Dr. Akira Kawai

Professor at Nagaoka Univ of Technology

SPIE Involvement:

Author

Publications (17)

Proceedings Article | 23 March 2020 Paper

Paper

Adhesion improvement of photoresist: destruction mode analysis

K. Hasegawa, A. Kawai

Proceedings Volume 11326, 113261V (2020) https://doi.org/10.1117/12.2552019

KEYWORDS: Photoresist materials, Silicon, Interfaces, Coating, Oxygen, Plasma, Lithography, Atomic force microscopy

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Proceedings Article | 23 March 2020 Paper

Paper

Local condensation of TMAH developer at photoresist/glass interface analyzed by using confocal laser scanning microscope (CLSM)

H. Takemi, A. Kawai

Proceedings Volume 11326, 113261U (2020) https://doi.org/10.1117/12.2552018

KEYWORDS: Photoresist materials, Photoresist developing, Interfaces, Atomic force microscopy, Confocal microscopy, Edge roughness, Glasses, In situ metrology, Confocal laser scanning microscopy

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Proceedings Article | 14 December 2009 Paper

Paper

Micro bubble removal from micro pattern structure under alternating electric field

Hiroki Sasazaki, Akira Kawai

Proceedings Volume 7520, 75202Z (2009) https://doi.org/10.1117/12.841227

KEYWORDS: Electrodes, Copper, Interfaces, Liquids, Stereolithography, Control systems, Photography, Lithography, Structural design, Electrical engineering

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Proceedings Article | 14 December 2009 Paper

Paper

Relaxation properties of dielectric dipoles of photo resist materials

Hiroki Sasazaki, Akira Kawai

Proceedings Volume 7520, 75202X (2009) https://doi.org/10.1117/12.841126

KEYWORDS: Dielectrics, Dielectric relaxation, Polymers, Electrodes, Capacitance, Gold, Capacitors, Molecules, Structural design, Microelectromechanical systems

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Proceedings Article | 14 December 2009 Paper

Paper

Spontaneous deformation of resist micro pattern due to van der Waals interaction

Akira Kawai, Takashi Yamaji

Proceedings Volume 7520, 75202Y (2009) https://doi.org/10.1117/12.841117

KEYWORDS: Finite element methods, Atomic force microscopy, Interfaces, Atomic force microscope, Thin films, Statistical analysis, Biological research, Solids, Coating, Optical sensing

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Proceedings Article | 14 December 2009 Paper

Paper

Micro bubble condensation in micro channel controlled by local electrical field method

Shunsuke Ohata, Akira Kawai

Proceedings Volume 7520, 752034 (2009) https://doi.org/10.1117/12.841124

KEYWORDS: Electrodes, Gold, Glasses, Control systems, Agriculture, Motion controllers, Chemical analysis, Photography, Electrical engineering, Chemical elements

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Proceedings Article | 14 December 2009 Paper

Paper

Durability of self-standing resist sheet composed with micro holes

Akihiro Takano, Akira Kawai

Proceedings Volume 7520, 752032 (2009) https://doi.org/10.1117/12.841091

KEYWORDS: Microelectromechanical systems, Finite element methods, Optical lithography, Photoresist materials, 3D modeling, Polymers, Photomasks, Photography, Epoxies, Stress analysis

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Proceedings Article | 14 December 2009 Paper

Paper

PH control of water flowing in micro structure by local electrical field method

Akihiro Takano, Akira Kawai

Proceedings Volume 7520, 752033 (2009) https://doi.org/10.1117/12.841129

KEYWORDS: Electrodes, Control systems, Oxygen, Aluminum, Photoresist materials, Glasses, Photomasks, Photography, Lithography, Gold

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Proceedings Article | 29 March 2006 Paper

Paper

Trap mechanism of micro bubble in micro concave patterns

Akira Kawai, Tomotaka Ariga, Simpei Hori, Masahiko Harumoto, Osamu Tamada, Masakazu Sanada

Proceedings Volume 6153, 61531T (2006) https://doi.org/10.1117/12.655447

KEYWORDS: Interfaces, Liquids, Manufacturing, Thermodynamics, Immersion lithography, Lawrencium, Plating, Photoresist processing, Etching, Light scattering

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Proceedings Article | 29 March 2006 Paper

Paper

Analysis of the effect of mechanical strength of the resist film on pattern collapse behavior using atomic force microscope

Osamu Tamada, Tomohiro Goto, Masakazu Sanada, Takahiro Moriuchi, Takayoshi Niiyama, Akira Kawai

Proceedings Volume 6153, 61533P (2006) https://doi.org/10.1117/12.651999

KEYWORDS: Refractive index, Photoresist processing, Temperature metrology, Atomic force microscope, Atomic force microscopy, Ellipsometry, Semiconducting wafers, Scanning electron microscopy, Head-mounted displays, Semiconductor manufacturing

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Proceedings Article | 29 March 2006 Paper

Paper

Solid defects condensation during watermark formation for immersion lithography

Takayoshi Niiyama, Akira Kawai, Simpei Hori, Masahiko Harumoto, Osamu Tamada, Masakazu Sanada

Proceedings Volume 6153, 61531U (2006) https://doi.org/10.1117/12.655420

KEYWORDS: Digital watermarking, Particles, Silicon, Liquids, Immersion lithography, Solids, Thermodynamics, Liquid lenses, Convection, Interfaces

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Proceedings Article | 29 March 2006 Paper

Paper

Adhesion and removal of micro bubbles for immersion lithography

Akira Kawai, Takayoshi Niiyama, Hotaka Endo, Masaki Yamanaka, Atsushi Ishikawa, Kenta Suzuki, Osamu Tamada, Masakazu Sanada

Proceedings Volume 6153, 61531S (2006) https://doi.org/10.1117/12.655444

KEYWORDS: Atomic force microscopy, Silicon, Niobium, Interfaces, Particles, Excimers, Liquids, Stereolithography, Immersion lithography, Solids

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Proceedings Article | 4 May 2005 Paper

Paper

Analysis for collapse behavior of resist pattern in short develop time process using atomic force microscope

Masakazu Sanada, Osamu Tamada, Atsushi Ishikawa, Akira Kawai

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599152

KEYWORDS: Interfaces, Refractive index, Photoresist processing, Atomic force microscopy, Water, Atomic force microscope, Semiconducting wafers, Thermodynamics, Scanning electron microscopy, Polymers

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Proceedings Article | 4 May 2005 Paper

Paper

Mechanical strength of resist film analyzed by tip indentation method

Osamu Tamada, Masakazu Sanada, Atsushi Ishikawa, Takayoshi Niiyama, Akira Kawai

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599195

KEYWORDS: Refractive index, Atomic force microscopy, Polymers, Photoresist processing, Polymer thin films, Semiconducting wafers, Image processing, Temperature metrology, Ellipsometry, Atomic force microscope

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Proceedings Article | 4 May 2005 Paper

Paper

Adhesion and removal behavior of nanoscale bubble on resist film surface for immersion lithography

Akira Kawai, Atsushi Ishikawa, Takayoshi Niiyama, Masahiko Harumoto, Osamu Tamada, Masakazu Sanada

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599157

KEYWORDS: Atomic force microscopy, Immersion lithography, Copper, Excimers, Interfaces, Liquids, Stereolithography, Atomic force microscope, Photography, Photoresist processing

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Proceedings Article | 14 June 1999 Paper

Paper

Analysis of adhesion behavior of microresist pattern by direct collapse method with atomic force microscope tip

Akira Kawai

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350844

KEYWORDS: Liquids, Atomic force microscopy, Interfaces, Finite element methods, Atomic force microscope, Scanning electron microscopy, Photography, Chemical elements, Reliability, Stress analysis

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Proceedings Article | 1 July 1991 Paper

Paper

Characterization of automatic overlay measurement technique for sub-half-micron devices

Akira Kawai, Keiji Fujiwara, Kouichirou Tsujita, Hitoshi Nagata

Proceedings Volume 1464, (1991) https://doi.org/10.1117/12.44441

KEYWORDS: Overlay metrology, Semiconducting wafers, Surface roughness, Reflectivity, Manufacturing, Integrated circuits, Inspection, Metrology, Process control, Holmium

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Showing 5 of 17 publications

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