Mr. Andrew M. Jost Profile

Andrew M. Jost

Applications Engineer at Siemens EDA

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Author

Publications (7)

Proceedings Article | 9 November 2005 Paper

Integrated post tape outflow for fast design to mask turn-around time

Chi-Yuan Hung, Qingwei Liu, Liguo Zhang, Shumay Shang, George Bailey, Andrew Jost, Travis Brist

Proceedings Volume 5992, 599251 (2005) https://doi.org/10.1117/12.629042

KEYWORDS: Optical proximity correction, Photomasks, Data modeling, Back end of line, Semiconducting wafers, Visualization, Databases, Scanning electron microscopy, Data integration, Metals

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Proceedings Article | 8 November 2005 Paper

Model-based DRC for design and process integration

Chi-Yuan Hung, Andrew Jost, Qingwei Liu

Proceedings Volume 5992, 59923M (2005) https://doi.org/10.1117/12.631505

KEYWORDS: Optical proximity correction, Process modeling, Metals, Model-based design, Error analysis, Computer simulations, Design for manufacturability, Optics manufacturing, Data modeling, Lithography

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Proceedings Article | 28 June 2005 Paper

Lithography process related OPC development and verification demonstration on a sub-90nm poly layer

Chi-Yuan Hung, Qingwei Liu, Liguo Zhang, Shumay Shang, Andrew Jost

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617194

KEYWORDS: Process modeling, Optical proximity correction, Data modeling, Photomasks, Semiconducting wafers, Scanning electron microscopy, Calibration, Lithography, Wafer-level optics, Visualization

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Proceedings Article | 28 May 2004 Paper

Two-dimensional-image-based model calibration for OPC applications

Kunal Taravade, Ebo Croffie, Andrew Jost

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.538244

KEYWORDS: Optical proximity correction, Scanning electron microscopy, Calibration, Process modeling, Lithography, Critical dimension metrology, Image processing, Data modeling, Reticles, Semiconducting wafers

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Proceedings Article | 24 May 2004 Paper

New methodology for evaluating and quantifying reticle line end shortening

Mark Simmons, John Jensen, Robert Muller, Andrew Jost

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.533194

KEYWORDS: Metrology, Reticles, Time metrology, Algorithm development, Photomasks, Binary data, Precision measurement, Distance measurement, Standards development, Logic

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Proceedings Article | 17 December 2003 Paper

OPC model generation procedure for different reticle vendors

Andrew Jost, Nadya Belova, Neal Callan

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518219

KEYWORDS: Reticles, Optical proximity correction, Data modeling, Semiconducting wafers, Statistical modeling, Manufacturing, Quartz, Critical dimension metrology, Logic, Cadmium

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Proceedings Article | 17 December 2003 Paper

Multichip reticle approach for OPC model verification

Kunal Taravade, Nadya Belova, Andrew Jost, Neal Callan

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518217

KEYWORDS: Optical proximity correction, Reticles, Semiconducting wafers, Logic, Metals, Inspection, Performance modeling, Photomasks, Manufacturing, Lithography

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Showing 5 of 7 publications

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