Dr. Daniel J. Brown
VP Technology & Development at Cymer LLC
SPIE Involvement:
Author
Publications (35)

Proceedings Article | 10 April 2024 Presentation + Paper
Klaus Hummler, Qiushi Zhu, Keegan Behm, Liane Matthes, Zhaohan He, Omar Biabani, Andrew LaForge, Bob Rollinger, Dustin Urone, Niek Kleemans, Martin Jurna, Sean McGrogan, Peter Mayer, Michael Purvis, Sander Derks, Alberto Villalta, Abhiram Govindaraju, Yue Ma, Daniel Brown
Proceedings Volume 12953, 129530V (2024) https://doi.org/10.1117/12.3010463
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Carbon monoxide, Light sources, Tin, Semiconducting wafers, Scattering, Scanners, Gas lasers

Proceedings Article | 9 September 2019 Presentation
Michael Purvis, Igor Fomenkov, Alexander Schafgans, Peter Mayer, Klaus Hummler, Martijn Leenders, Yezheng Tao, Slava Rokitski, Jayson Stewart, Alex Ershov, Robert Rafac, Silvia De Dea, Georgiy Vaschenko, David Brandt, Daniel Brown
Proceedings Volume 11111, 111110K (2019) https://doi.org/10.1117/12.2534691

Proceedings Article | 3 October 2018 Presentation + Paper
Igor Fomenkov, Michael Purvis, Alexander Schafgans, Yezheng Tao, Slava Rokitski, Jayson Stewart, Andrew LaForge, Alexander Ershov, Robert Rafac, Silvia De Dea, Chirag Rajyaguru, Georgiy Vaschenko, Mathew Abraham, David Brandt, Daniel Brown
Proceedings Volume 10809, 108091L (2018) https://doi.org/10.1117/12.2502801
KEYWORDS: Extreme ultraviolet, High volume manufacturing

Proceedings Article | 10 May 2018 Paper
Michael Purvis, Igor Fomenkov, Alexander Schafgans, Mike Vargas, Spencer Rich, Yezheng Tao, Slava Rokitski, Melchior Mulder, Erik Buurman, Michael Kats, Jayson Stewart, Andrew LaForge, Chirag Rajyaguru, Georgiy Vaschenko, Alex Ershov, Robert Rafac, Mathew Abraham, David Brandt, Daniel Brown
Proceedings Volume 10583, 1058327 (2018) https://doi.org/10.1117/12.2305955
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Plasma, Tin, High volume manufacturing, Semiconducting wafers, Reflectivity, EUV optics, Photoresist materials

Proceedings Article | 5 May 2017 Presentation
Proceedings Volume 10143, 101431I (2017) https://doi.org/10.1117/12.2258628
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Lithography, Current controlled current source

Showing 5 of 35 publications
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