Dr. Peter Mayer
EUV Source System Architect
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 10 April 2024 Presentation + Paper
Klaus Hummler, Qiushi Zhu, Keegan Behm, Liane Matthes, Zhaohan He, Omar Biabani, Andrew LaForge, Bob Rollinger, Dustin Urone, Niek Kleemans, Martin Jurna, Sean McGrogan, Peter Mayer, Michael Purvis, Sander Derks, Alberto Villalta, Abhiram Govindaraju, Yue Ma, Daniel Brown
Proceedings Volume 12953, 129530V (2024) https://doi.org/10.1117/12.3010463
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Carbon monoxide, Light sources, Tin, Semiconducting wafers, Scattering, Scanners, Gas lasers

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 124940Z (2023) https://doi.org/10.1117/12.2657772
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, High volume manufacturing, Plasma, Light sources, Gas lasers, Scanners, Tin, EUV optics

Proceedings Article | 22 February 2021 Poster + Presentation
Proceedings Volume 11609, 116091E (2021) https://doi.org/10.1117/12.2584413
KEYWORDS: Extreme ultraviolet lithography, Scanners, Extreme ultraviolet, Tin, Semiconductors, Laser stabilization, Laser applications, High volume manufacturing

Proceedings Article | 22 February 2021 Presentation
Proceedings Volume 11609, 1160918 (2021) https://doi.org/10.1117/12.2584407
KEYWORDS: Scanners, Extreme ultraviolet lithography, Tin, Extreme ultraviolet, Semiconductors, High volume manufacturing

Proceedings Article | 22 February 2021 Poster + Presentation
Jack Stahl, Dren Qerimi, Niels Braaksma, Peter Mayer, David Brandt, David Ruzic
Proceedings Volume 11609, 116091R (2021) https://doi.org/10.1117/12.2584334
KEYWORDS: Tin, Scattering, Hydrogen, Laser scattering, Particles, Ions, Chemical species, Binary data

Showing 5 of 8 publications
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