Dr. Dmitriy V. Gorelikov Profile

Dr. Dmitriy V. Gorelikov

Senior Scientist at Nanometrics Inc

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Publications (4)

Proceedings Article | 24 March 2006 Paper

Minimizing CD measurement bias through real-time acquisition of 3D feature shapes

Johann Foucher, Dmitry Gorelikov, Marc Poulingue, Pascal Fabre, Ganesh Sundaram

Proceedings Volume 6152, 61521A (2006) https://doi.org/10.1117/12.660233

KEYWORDS: Atomic force microscopy, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, 3D metrology, 3D acquisition, Metrology, Silicon, Lithography, Electron beam lithography

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Proceedings Article | 10 May 2005 Paper

The application of critical shape metrology toward CD-SEM measurement accuracy on sub-60nm features

J. Foucher, G. Sundaram, D. Gorelikov

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.601068

KEYWORDS: Scatterometry, Semiconducting wafers, Monte Carlo methods, Metrology, 3D metrology, Silicon, Critical dimension metrology, Optical simulations, Databases, Scanning electron microscopy

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Proceedings Article | 10 May 2005 Paper

Application of critical shape metrology to 90nm process

Dmitry Gorelikov, John Haywood, Colin Yates

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599894

KEYWORDS: Semiconducting wafers, Metrology, Oxides, Scanning electron microscopy, Monte Carlo methods, Computer simulations, Cadmium sulfide, Critical dimension metrology, Image processing, Wafer inspection

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Proceedings Article | 24 May 2004 Paper

CD-SEM-based critical shape metrology of integrated circuits

Dmitry Gorelikov, Jason Remillard, Neal Sullivan

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536499

KEYWORDS: Critical dimension metrology, Atomic force microscopy, Semiconducting wafers, Monte Carlo methods, Metrology, Photoresist materials, Calibration, Scanning electron microscopy, Integrated circuits, Computer simulations

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