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Colin D. Yates
at ON Semiconductor
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Author
Publications (4)
Proceedings Article | 5 April 2007 Paper
Carbon nanotube metrology in a CD SEM
Colin Yates, Thomas Rueckes, Richard Carter
Proceedings Volume 6518, 65180N (2007) https://doi.org/10.1117/12.712352
KEYWORDS: Scanning electron microscopy, Metals, Metrology, Carbon nanotubes, Inspection, Etching, Semiconducting wafers, Overlay metrology, Structural design, Optical lithography
Proceedings Article | 10 May 2005 Paper
Characterization of E-beam induced resist slimming using etched feature measurements
Colin Yates, Galen Sapp, Paul Knutrud
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.601155
KEYWORDS: Etching, Process control, Image processing, Image acquisition, Metrology, Photoresist processing, Lithography, Semiconducting wafers, Logic, Scanning electron microscopy
Proceedings Article | 10 May 2005 Paper
Application of critical shape metrology to 90nm process
Dmitry Gorelikov, John Haywood, Colin Yates
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599894
KEYWORDS: Semiconducting wafers, Metrology, Oxides, Scanning electron microscopy, Monte Carlo methods, Computer simulations, Cadmium sulfide, Critical dimension metrology, Image processing, Wafer inspection
Proceedings Article | 14 May 2004 Paper
Surface conditioning solutions to reduce resist line roughness
Peng Zhang, Manuel Jaramillo, Madhukar Rao, Colin Yates, Danielle King, Brenda Ross, Bridget O'Brien
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535819
KEYWORDS: Line edge roughness, Image processing, Chemistry, Spatial frequencies, Lithography, Polymers, Photoresist processing, Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers
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