Dr. Guanyang Lin Profile

Dr. Guanyang Lin

Business Technology Manager at EMD Electronics

SPIE Involvement:

Author

Publications (28)

SPIE Journal Paper | 17 August 2016

Influence of template fill in graphoepitaxy directed self-assembly

Jan Doise, Joost Bekaert, Boon Teik Chan, Sung Eun Hong, Guanyang Lin, Roel Gronheid

JM3, Vol. 15, Issue 03, 031603, (August 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.031603

KEYWORDS: Directed self assembly, Polymethylmethacrylate, Atomic force microscopy, Critical dimension metrology, System on a chip, Optical lithography, Semiconducting wafers, Etching, Silicon, Photomasks

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Proceedings Article | 25 March 2016 Paper

Directed self-assembly materials for high resolution beyond PS-b-PMMA

Eri Hirahara, Margareta Paunescu, Orest Polishchuk, EunJeong Jeong, Edward Ng, Jianhui Shan, Jian Yin, Jihoon Kim, Yi Cao, Jin Li, SungEun Hong, Durairaj Baskaran, Guanyang Lin

Proceedings Volume 9779, 977914 (2016) https://doi.org/10.1117/12.2220424

KEYWORDS: Directed self assembly, Semiconducting wafers, Scanning electron microscopy, Etching, Silicon, Optical lithography, Polymers, Line edge roughness, Photomicroscopy, Annealing

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Proceedings Article | 25 March 2016 Paper

Influence of template fill in graphoepitaxy DSA

Jan Doise, Joost Bekaert, Boon Teik Chan, SungEun Hong, Guanyang Lin, Roel Gronheid

Proceedings Volume 9779, 97791G (2016) https://doi.org/10.1117/12.2219580

KEYWORDS: Optical lithography, Lithography, Materials processing, Directed self assembly, Polymethylmethacrylate, Atomic force microscopy, Etching, Semiconducting wafers, Critical dimension metrology, System on a chip, Photoresist developing

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Proceedings Article | 22 March 2016 Paper

DSA materials contributions to the defectivity performance of 14nm half-pitch LiNe flow at IMEC

Hari Pathangi, Varun Vaid, Boon Teik Chan, Nadia Vandenbroeck, Jin Li, Sung Eun Hong, Yi Cao, Baskaran Durairaj, Guanyang Lin, Mark Somervell, Takahiro Kitano, Ryota Harukawa, Kaushik Sah, Andrew Cross, Hareen Bayana, Lucia D’Urzo, Roel Gronheid

Proceedings Volume 9777, 97770G (2016) https://doi.org/10.1117/12.2219936

KEYWORDS: Directed self assembly, Metrology, Optical lithography, Silicon, Semiconducting wafers, Etching, Bridges, Polymers, Manufacturing, Scanning electron microscopy, Epitaxy, Lithography, Thin film coatings

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SPIE Journal Paper | 2 July 2015

Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow

Hari Pathangi, Boon Teik Chan, Hareen Bayana, Nadia Vandenbroeck, Dieter Van den Heuvel, Lieve Van Look, Paulina Rincon-Delgadillo, Yi Cao, JiHoon Kim, Guanyang Lin, Doni Parnell, Kathleen Nafus, Ryota Harukawa, Ito Chikashi, Marco Polli, Lucia D’Urzo, Roel Gronheid, Paul Nealey

JM3, Vol. 14, Issue 03, 031204, (July 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031204

KEYWORDS: Etching, Scanning electron microscopy, Silicon, Inspection, Semiconducting wafers, Diffractive optical elements, Defect inspection, Thin film coatings, Directed self assembly

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Proceedings Article | 20 March 2015 Paper

The role of guide stripe chemistry in block copolymer directed self-assembly

Robert Seidel, Lance Williamson, YoungJun Her, Jihoon Kim, Guanyang Lin, Paul Nealey, Roel Gronheid

Proceedings Volume 9425, 94250W (2015) https://doi.org/10.1117/12.2085905

KEYWORDS: Chemistry, Tolerancing, Lithography, Semiconducting wafers, Line edge roughness, Thin films, Plasma etching, Etching, Polymethylmethacrylate, Directed self assembly

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Proceedings Article | 20 March 2015 Paper

Directed self-assembly of topcoat-free, integration-friendly high-X block copolymers

Eri Hirahara, Margareta Paunescu, Orest Polishchuk, EunJeong Jeong, Edward Ng, Jianhui Shan, Jihoon Kim, SungEun Hong, Durairaj Baskaran, Guanyang Lin, Ankit Vora, Melia Tjio, Noel Arellano, Charles Rettner, Elizabeth Lofano, Chi-Chun Liu, Hsinyu Tsai, Anindarupa Chunder, Khanh Nguyen, Alexander Friz, Amy Bowers, Srinivasan Balakrishnan, Joy Cheng, Daniel Sanders

Proceedings Volume 9425, 94250P (2015) https://doi.org/10.1117/12.2087398

KEYWORDS: Scanning electron microscopy, Etching, Photomicroscopy, Dry etching, Annealing, Thin films, Plasma etching, Polymers, Coating, Directed self assembly

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Proceedings Article | 19 March 2015 Paper

Toward high-performance quality meeting IC device manufacturing requirements with AZ SMART DSA process

JiHoon Kim, Jian Yin, Yi Cao, YoungJun Her, Claire Petermann, Hengpeng Wu, Jianhui Shan, Tomohiko Tsutsumi, Guanyang Lin

Proceedings Volume 9423, 94230R (2015) https://doi.org/10.1117/12.2086160

KEYWORDS: Picosecond phenomena, Line edge roughness, Semiconducting wafers, Line width roughness, Critical dimension metrology, Optical lithography, Polymethylmethacrylate, Etching, Plasma etching, Directed self assembly

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Proceedings Article | 19 March 2015 Paper

Implementation of templated DSA for via layer patterning at the 7nm node

Roel Gronheid, Jan Doise, Joost Bekaert, Boon Teik Chan, Ioannis Karageorgos, Julien Ryckaert, Geert Vandenberghe, Yi Cao, Guanyang Lin, Mark Somervell, Germain Fenger, Daisuke Fuchimoto

Proceedings Volume 9423, 942305 (2015) https://doi.org/10.1117/12.2086090

KEYWORDS: Optical lithography, Photomasks, Etching, Polymethylmethacrylate, Lithography, Double patterning technology, Scanning electron microscopy, Picosecond phenomena, Metals, Directed self assembly

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Proceedings Article | 19 March 2015 Paper

Impact of BCP asymmetry on DSA patterning performance

Lance Williamson, JiHoon Kim, Yi Cao, Guanyang Lin, Roel Gronheid, Paul Nealey

Proceedings Volume 9423, 942315 (2015) https://doi.org/10.1117/12.2085885

KEYWORDS: Scanning electron microscopy, Etching, Optical lithography, Tolerancing, Silicon, Polymethylmethacrylate, Annealing, Picosecond phenomena, Neodymium, Directed self assembly

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Proceedings Article | 19 March 2015 Paper

Defect mitigation and root cause studies in IMEC's 14nm half-pitch chemo-epitaxy DSA flow

Hari Pathangi, Boon Teik Chan, Hareen Bayana, Nadia Vandenbroeck, Dieter Van Den Heuvel, Lieve Van Look, Paulina Rincon-Delgadillo, Yi Cao, JiHoon Kim, Guanyang Lin, Doni Parnell, Kathleen Nafus, Ryota Harukawa, Ito Chikashi, Venkat Nagaswami, Lucia D'Urzo, Roel Gronheid, Paul Nealey

Proceedings Volume 9423, 94230M (2015) https://doi.org/10.1117/12.2085889

KEYWORDS: Etching, Silicon, Bridges, Scanning electron microscopy, Inspection, Diffractive optical elements, Semiconducting wafers, Thin film coatings, Defect inspection, Directed self assembly

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Proceedings Article | 2 April 2014 Paper

Novel metrology methods for fast 3D characterization of directed self-assembly (DSA) patterns for high volume manufacturing

Chandra Sarma, Benjamin Bunday, Aron Cepler, Ted Dziura, JiHoon Kim, Guanyang Lin, Jian Yin

Proceedings Volume 9050, 90500O (2014) https://doi.org/10.1117/12.2046785

KEYWORDS: Semiconducting wafers, Scatterometry, Metrology, Polymethylmethacrylate, Bridges, Data modeling, Critical dimension metrology, Picosecond phenomena, Line edge roughness, Directed self assembly

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Proceedings Article | 2 April 2014 Paper

Advanced CD-SEM metrology for pattern roughness and local placement of lamellar DSA

Takeshi Kato, Akiyuki Sugiyama, Kazuhiro Ueda, Hiroshi Yoshida, Shinji Miyazaki, Tomohiko Tsutsumi, JiHoon Kim, Yi Cao, Guanyang Lin

Proceedings Volume 9050, 90501T (2014) https://doi.org/10.1117/12.2060924

KEYWORDS: Semiconducting wafers, Line edge roughness, Line width roughness, Edge roughness, Etching, Critical dimension metrology, Finite element methods, Process control, Chemical analysis, Directed self assembly

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Proceedings Article | 28 March 2014 Paper

Defect reduction and defect stability in IMEC's 14nm half-pitch chemo-epitaxy DSA flow

Roel Gronheid, Paulina Rincon Delgadillo, Hari Pathangi, Dieter Van den Heuvel, Doni Parnell, Boon Teik Chan, Yu-Tsung Lee, Lieve Van Look, Yi Cao, YoungJun Her, Guanyang Lin, Ryota Harukawa, Venkat Nagaswami, Lucia D'Urzo, Mark Somervell, Paul Nealey

Proceedings Volume 9049, 904905 (2014) https://doi.org/10.1117/12.2047265

KEYWORDS: Etching, Inspection, Silicon, Semiconducting wafers, Scanning electron microscopy, Defect inspection, Polymethylmethacrylate, Particles, Critical dimension metrology, Directed self assembly

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Proceedings Article | 28 March 2014 Paper

Using chemo-epitaxial directed self-assembly for repair and frequency multiplication of EUVL contact-hole patterns

Arjun Singh, Boon Teik Chan, Yi Cao, Guanyang Lin, Roel Gronheid

Proceedings Volume 9049, 90492F (2014) https://doi.org/10.1117/12.2047285

KEYWORDS: Extreme ultraviolet lithography, Optical lithography, Polymethylmethacrylate, Critical dimension metrology, Photoresist materials, Extreme ultraviolet, Etching, Printing, Lithography, Directed self assembly

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Proceedings Article | 28 March 2014 Paper

Tuning the strength of chemical patterns for directed self-assembly of block copolymers

Lance Williamson, Guanyang Lin, Yi Cao, Roel Gronheid, Paul Nealey

Proceedings Volume 9049, 90491B (2014) https://doi.org/10.1117/12.2047585

KEYWORDS: Etching, Annealing, Plasma etching, Scanning electron microscopy, Lithography, Semiconducting wafers, Photoresist materials, Picosecond phenomena, Chemistry, Directed self assembly

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Proceedings Article | 27 March 2014 Paper

Process optimization of templated DSA flows

Roel Gronheid, Joost Bekaert, Vijaya-Kumar Murugesan Kuppuswamy, Nadia Vandenbroeck, Jan Doise, Yi Cao, Guanyang Lin, Safak Sayan, Doni Parnell, Mark Somervell

Proceedings Volume 9051, 90510I (2014) https://doi.org/10.1117/12.2047266

KEYWORDS: System on a chip, Scanning electron microscopy, Optical lithography, Etching, Photomasks, Thin film coatings, Coating, Metrology, Materials processing, Directed self assembly

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Proceedings Article | 26 March 2013 Paper

Process sensitivities in exemplary chemo-epitaxy directed self-assembly integration

Paulina Rincon Delgadillo, Roel Gronheid, Guanyang Lin , Yi Cao, Ainhoa Romo, Mark Somervell , Kathleen Nafus , Paul Nealey

Proceedings Volume 8680, 86801H (2013) https://doi.org/10.1117/12.2011446

KEYWORDS: Chemistry, Coating, Etching, Fourier transforms, Lithography, Materials processing, Nanolithography, Thin film coatings, Picosecond phenomena, Directed self assembly

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Proceedings Article | 16 April 2011 Paper

EUV underlayer materials for 22nm HP and beyond

Huirong Yao, Zachary Bogusz, Jianhui Shan, Joonyeon Cho, Salem Mullen, Guanyang Lin, Mark Neisser

Proceedings Volume 7972, 797212 (2011) https://doi.org/10.1117/12.881639

KEYWORDS: Extreme ultraviolet, Electron beam lithography, Extreme ultraviolet lithography, Absorption, Line width roughness, Semiconducting wafers, Lithography, Polymers, Etching, Contamination

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Proceedings Article | 4 December 2008 Paper

Bottom anti-reflective coating for hyper NA process: theory, application and material development

Huirong Yao, JoonYeon Cho, Jian Yin, Salem Mullen, Guanyang Lin, Mark Neisser, Ralph Dammel

Proceedings Volume 7140, 71402X (2008) https://doi.org/10.1117/12.804617

KEYWORDS: Absorption, Polymers, Lithography, Absorbance, Refractive index, Reflectivity, Etching, Bottom antireflective coatings, Immersion lithography, Antireflective coatings

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Proceedings Article | 15 April 2008 Paper

High-etch-rate low-bias bow outgassing BARC via-filling materials for 193-nm ArF lithographic process

Huirong Yao, Zhong Xiang, Salem Mullen, Jian Yin, Walter Liu, Jianhui Shan, Elleazar Gonzalez, Guanyang Lin, Mark Neisser

Proceedings Volume 6923, 69232J (2008) https://doi.org/10.1117/12.773400

KEYWORDS: Etching, Lithography, Polymers, Reflectivity, Semiconducting wafers, Coating, Immersion lithography, Chromophores, Scanning electron microscopy, Bottom antireflective coatings

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Proceedings Article | 9 April 2007 Paper

Novel diamantane polymer platform for enhanced etch resistance

Munirathna Padmanaban, Srinivasan Chakrapani, Guanyang Lin, Takanori Kudo, Deepa Parthasarathy, Dalil Rahman, Clement Anyadiegwu, Charito Antonio, Ralph Dammel, Shenggao Liu, Frederick Lam, Anthony Waitz, Masao Yamagchi, Takayuki Maehara

Proceedings Volume 6519, 65190G (2007) https://doi.org/10.1117/12.713111

KEYWORDS: Polymers, Etching, Dry etching, Resistance, Lithography, Photoresist materials, 193nm lithography, Line width roughness, Molecules, Polymerization

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Proceedings Article | 6 April 2007 Paper

Some non-resist component contributions to LER and LWR in 193-nm lithography

Takanori Kudo, Srinivasan Chakrapani, Guanyang Lin, Clement Anyadiegwu, Charito Antonio, Deepa Parthasarathy, Ralph Dammel, Munirathna Padmanaban

Proceedings Volume 6519, 651941 (2007) https://doi.org/10.1117/12.713221

KEYWORDS: Line edge roughness, Nanoimprint lithography, Photomasks, Line width roughness, Fourier transforms, Binary data, Transmittance, Lithography, Polymers, Diffusion

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Proceedings Article | 11 April 2006 Paper

Performance of a dry 193nm resist under wet conditions

Munirathna Padmanaban, Andrew Romano, Guanyang Lin, Simon Chiu, Allen Timko, Frank Houlihan, Dalil Rahman, S. Chakrapani, T. Kudo, Ralph Dammel, Karen Turnquest, Georgia Rich, Scott Schuetter, Timothy Shedd, Gregory Nellis

Proceedings Volume 6153, 615307 (2006) https://doi.org/10.1117/12.659392

KEYWORDS: Thin film coatings, Lithography, Polymers, Line edge roughness, Semiconducting wafers, Photoresist processing, Line width roughness, Immersion lithography, Photoresist materials, Fourier transforms

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Proceedings Article | 11 April 2006 Paper

193-nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate

M. Dalil Rahman, Srivanisan Chakrapani, Clement Anyadiegwu, Guanyang Lin, Allen Timko, Frank Houlihan, David Rentkiewicz, Takanori Kudo, Douglas McKenzie, Ralph Dammel, Munirathna Padmanaban

Proceedings Volume 6153, 615327 (2006) https://doi.org/10.1117/12.658671

KEYWORDS: Polymers, Lithography, Line edge roughness, Semiconducting wafers, Photoresist processing, Critical dimension metrology, Polymer thin films, Etching, Lithographic illumination, Polymerization

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Proceedings Article | 29 March 2006 Paper

Study of the effect of amine additives on LWR and LER

Francis Houlihan, David Rentkiewicz, Guanyang Lin, Dalil Rahman, Douglas Mackenzie, Allen Timko, Takanori Kudo, Clement Anyadiegwu, Muthiah Thiyagarajan, Simon Chiu, Andrew Romano, Ralph Dammel, Munirathna Padmanaban

Proceedings Volume 6153, 615317 (2006) https://doi.org/10.1117/12.659465

KEYWORDS: Line edge roughness, Line width roughness, Polymers, Semiconducting wafers, Lithography, Transistors, Diffusion, Photoresist processing, Critical dimension metrology, Control systems

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Proceedings Article | 29 March 2006 Paper

Versatility in lithographic performance of advanced 193 nm contact hole resist

Takanori Kudo, Guanyang Lin, Dongkwan Lee, Dalil Rahman, Allen Timko, Douglas Mckenzie, Clement Anyadiegwu, Simon Chiu, Frank Houlihan, David Rentkiewicz, Ralph Dammel, Munirathna Padmanaban, John Biafore

Proceedings Volume 6153, 61532C (2006) https://doi.org/10.1117/12.659439

KEYWORDS: Polymers, Lithography, Semiconducting wafers, Photomasks, Resolution enhancement technologies, Photoresist processing, Electroluminescence, Critical dimension metrology, Scanning electron microscopy, Etching

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Proceedings Article | 14 May 2004 Paper

PEB sensitivity studies of ArF resists: II. Polymer and solvent effects

Chi-Sun Hong, Sang-Ho Lee, Woo-Kyu Kim, Takanori Kudo, Allen Timko, Douglas Mckenzie, Clement Anyadiegwu, Dalil Rahman, Guanyang Lin, Ralph Dammel, Munirathna Padmanaban

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.537931

KEYWORDS: Polymers, Critical dimension metrology, Photoresist processing, Etching, Resistance, Lithography, Semiconducting wafers, Resist chemistry, Line edge roughness, Dry etching

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Showing 5 of 28 publications

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