Mr. Hien T. Vu Profile

Hien T. Vu

Software Engineer at Siemens EDA

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Author

Publications (6)

Proceedings Article | 16 September 2022 Paper

Checkpointing in EDA application for tapeout operation

Kuang Han Chen, Soohong Kim, Hien Vu, Stephen Kim, Ming Feng Shen

Proceedings Volume 12325, 1232507 (2022) https://doi.org/10.1117/12.2641214

KEYWORDS: Optical proximity correction, Photomasks, Electronic design automation, Resolution enhancement technologies, SRAF, Data storage, Semiconducting wafers, Scattering

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Proceedings Article | 20 March 2018 Presentation + Paper

A novel processing platform for post tape out flows

Hien Vu, Soohong Kim, James Word, Lynn Cai

Proceedings Volume 10587, 105870R (2018) https://doi.org/10.1117/12.2297240

KEYWORDS: Optical proximity correction, Photomasks, Data processing, Resolution enhancement technologies, SRAF, Computing systems, Parallel processing, Integrated circuits, Design for manufacturability

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Proceedings Article | 13 July 2017 Paper

Cycle time reduction by Html report in mask checking flow

Jian-Cheng Chen, Min-Ying Lu, Xiang Fang, Ming-Feng Shen, Shou-Yuan Ma, Chuen-Huei Yang, Joe Tsai, Rachel Lee, Erwin Deng, Ling-Chieh Lin, Hung-Yueh Liao, Jenny Tsai, Amanda Bowhill, Hien Vu, Gordon Russell

Proceedings Volume 10454, 104540G (2017) https://doi.org/10.1117/12.2278691

KEYWORDS: Reticles, Databases

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Proceedings Article | 10 May 2016 Paper

Production mask composition checking flow

Shou-Yuan Ma, Chuen-Huei Yang, Joe Tsai, Alice Wang, Roger Lin, Rachel Lee, Erwin Deng, Ling-Chieh Lin, Hung-Yueh Liao, Jenny Tsai, Amanda Bowhill, Hien Vu, Gordon Russell

Proceedings Volume 9984, 99840D (2016) https://doi.org/10.1117/12.2240292

KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Data conversion, Acquisition tracking and pointing, Neodymium, Radon, Databases, Visualization, Etching

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Proceedings Article | 23 March 2009 Paper

Compute resource management and TAT control in mask data prep

Ahmed Nouh, Kenneth Jantzen, Minyoung Park, Hien Vu

Proceedings Volume 7272, 727216 (2009) https://doi.org/10.1117/12.814236

KEYWORDS: Data centers, Optical proximity correction, Control systems, Resolution enhancement technologies, Solids, Visualization, Optical components, Optical resolution, Optical calibration, Computing systems

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Proceedings Article | 16 November 2007 Paper

Reduction of layout complexity for shorter mask write-time

Sean Hannon, Travis Lewis, Scott Goad, Kenneth Jantzen, Jianlin Wang, Hien Vu, Emile Sahouria, Steffen Schulze

Proceedings Volume 6730, 67303K (2007) https://doi.org/10.1117/12.746986

KEYWORDS: Source mask optimization, Photomasks, Optical proximity correction, Reticles, Manufacturing, Optical alignment, Tolerancing, Lithography, Data processing, Semiconducting wafers

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Showing 5 of 6 publications

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