Dr. Hyun-Su Kim Profile

Dr. Hyun-Su Kim

at Imec

SPIE Involvement:

Author

Profile Summary

Hyun-su Kim is a scientist in Experimental physics and computational optics. His research interests include nano fabrication (EUV lithography) and imaging (EUV microscope). He received his PhD in Experimental of EUV physics from RWTH Aachen university, Germany.

Publications (15)

SPIE Journal Paper | 20 September 2022

Photon flux dependent image resolution of reflective ptychographic microscope for extreme ultraviolet actinic mask metrology

Hyun-Su Kim, Ricarda Nebling, Atoosa Dejkameh, Tao Shen, Yasin Ekinci, Iacopo Mochi

JM3, Vol. 21, Issue 03, 034002, (September 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.3.034002

KEYWORDS: Extreme ultraviolet, Diffraction, Photomasks, Image resolution, Microscopes, Reflectivity, Image quality, Nanoimprint lithography, Sensors, High dynamic range imaging

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Proceedings Article | 26 May 2022 Paper

Paper

EUV mask defect material characterization through actinic lensless imaging

Tao Shen, Dimitrios Kazazis, Hyun-Su Kim, Atoosa Dejkameh, Ricarda Nebling, Yasin Ekinci, Iacopo Mochi

Proceedings Volume 12053, 120530H (2022) https://doi.org/10.1117/12.2613337

KEYWORDS: Photomasks, Extreme ultraviolet, Absorption, Inspection, Multilayers, Extreme ultraviolet lithography, Defect detection, Coherence imaging, Material characterization

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Proceedings Article | 12 October 2021 Presentation + Paper

Presentation + Paper

Resolution limit and photon flux dependency in EUV ptychography

H. Kim, R. Nebling, A. Dejkameh, S. Tao, I. Mochi, Y. Ekinci

Proceedings Volume 11855, 1185506 (2021) https://doi.org/10.1117/12.2601246

KEYWORDS: Photomasks, Extreme ultraviolet, Image quality, High dynamic range imaging, Diffraction, Linear filtering, Sensors, Inspection, Stars, Image resolution

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Proceedings Article | 14 September 2021 Presentation + Paper

Presentation + Paper

A priori information in ptychographic image reconstruction for EUV mask metrology

Ricarda Nebling, Iacopo Mochi, Hyun-Su Kim, Atoosa Dejkameh, Tao Shen, Yasin Ekinci

Proceedings Volume 11875, 118750M (2021) https://doi.org/10.1117/12.2600233

KEYWORDS: Reconstruction algorithms, Extreme ultraviolet, Photomasks, Metrology, Inspection, Computer simulations, Diffraction

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Proceedings Article | 12 September 2021 Presentation

Presentation

Missing frequency recovery through ptychography

Atoosa Dejkameh, Iacopo Mochi, Ricarda Nebling, Hyun-su Kim, Tao Shen, Yasin Ekinci

Proceedings Volume 11875, 118750J (2021) https://doi.org/10.1117/12.2597060

KEYWORDS: Reconstruction algorithms, Sensors, Diffraction, Detection and tracking algorithms, Signal attenuation, Optics manufacturing, Extreme ultraviolet, Coherence imaging, X-rays, X-ray astronomy

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High-resolution imaging at short wavelengths from extreme ultraviolet to hard X-rays has many applications in a plethora of fields from astronomy to biology and semiconductor metrology. Unfortunately, efficient optics for these wavelengths are difficult to manufacture or have limited resolution. For this reason, in the past few years, coherent diffraction imaging (CDI) applications become widely used. In CDI, the object is illuminated by a coherent beam and the diffraction intensity is collected by a 2D pixel detector. In this process, the phase information of the diffracted light is lost. A phase retrieval algorithm is then used to reconstruct the object’s complex amplitude. Ptychography is a scanning version of coherent diffraction imaging and it is based on an iterative reconstruction algorithm that relies on the quality of the recorded diffraction intensity to converge. To obtain diffraction patterns with a high signal-to-noise ratio, a beam stop is used in many ptychography setups to avoid over-saturation and blooming effects on the detector. While using a beam stop in a ptychography setup has become common practice, the limits of affordable data loss due to beam stop have not been systematically investigated. Pixel masking is the conventional method to recover the lost frequencies. In this method, when enforcing the Fourier domain constraint, the invalid pixels are ignored. In the missing data region, the algorithm is allowed to keep the guess from the previous iteration. The illumination conditions of the ptychography experiment play a critical role in the signal recovery procedure. The diffraction pattern on the detector is the convolution of the Fourier transform of the object and the illumination. An illumination with a finite numerical aperture encodes the object information over a larger detector area. This makes the reconstruction algorithm more robust to pixel loss. We provide simulation and experimental results to demonstrate this theory.

Proceedings Article | 12 March 2021 Presentation + Paper

Presentation + Paper

Lensless EUV mask inspection for anamorphic patterns

Iacopo Mochi, Hyun-Su Kim, Atoosa Dejkameh, Ricarda Nebling, Dimitrios Kazazis, Uldis Locans, Tao Shen, Yasin Ekinci

Proceedings Volume 11609, 116090M (2021) https://doi.org/10.1117/12.2584518

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Reticles, Reflectivity, Microscopes, Lithography, Light sources, Image restoration, Diffraction

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Proceedings Article | 19 October 2020 Presentation + Paper

Presentation + Paper

High resolution and uniform image reconstruction in a large field-of-view for EUV actinic mask review

H. Kim, U. Locans, R. Nebling, A. Dejkameh, D. Kazazis, Y. Ekinci, I. Mochi

Proceedings Volume 11518, 115180X (2020) https://doi.org/10.1117/12.2573240

KEYWORDS: Diffraction, Extreme ultraviolet, Sensors, Image processing, Reconstruction algorithms, Photomasks, Image resolution, Image quality, Extreme ultraviolet lithography, Inspection

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Proceedings Article | 12 October 2020 Presentation + Paper

Presentation + Paper

Effects of the illumination NA on EUV mask inspection with coherent diffraction imaging

Ricarda Nebling, Hyun-su Kim, Uldis Locans, Atoosa Dejkameh, Yasin Ekinci, Iacopo Mochi

Proceedings Volume 11517, 115170W (2020) https://doi.org/10.1117/12.2573181

KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Coherence imaging, Lithographic illumination, Extreme ultraviolet lithography, Defect detection, Reconstruction algorithms, Diffraction, Image quality

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Proceedings Article | 23 March 2020 Presentation + Paper

Presentation + Paper

Illumination control in lensless imaging for EUV mask inspection and review

Iacopo Mochi, Hyun-Su Kim, Uldis Locans, Atoosa Dejkameh, Ricarda Nebling, Dimitrios Kazazis, Yasin Ekinici

Proceedings Volume 11323, 113231I (2020) https://doi.org/10.1117/12.2552014

KEYWORDS: Extreme ultraviolet, Photomasks, Microscopes, Inspection, Reflectivity, Imaging systems, Sensors, Coherence imaging

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Proceedings Article | 18 March 2016 Paper

Paper

Enabling laboratory EUV research with a compact exposure tool

Sascha Brose, Serhiy Danylyuk, Jenny Tempeler, Hyun-su Kim, Peter Loosen, Larissa Juschkin

Proceedings Volume 9776, 97760R (2016) https://doi.org/10.1117/12.2219164

KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Extreme ultraviolet, Electron beam lithography, Lithography, Spatial coherence, Modulation transfer functions, Photoresist materials, Electron beams

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Proceedings Article | 22 September 2015 Paper

Paper

Ultra-broadband ptychography with self-consistent coherence estimation from a high harmonic source

M. Odstrčil, P. Baksh, H. Kim, S. Boden, W. Brocklesby, J. Frey

Proceedings Volume 9589, 958912 (2015) https://doi.org/10.1117/12.2188166

KEYWORDS: Extreme ultraviolet, Diffraction, Mirrors, Visibility, Coherence (optics), Cameras, Coherence imaging, Microscopy, Signal attenuation, Aluminum

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Proceedings Article | 12 December 2009 Paper

Paper

Possible line edge roughness reduction by anisotropic molecular resist

Hyunsu Kim, In Wook Cho, Hakjin Jang, Mihwa Kang, Seong Wook Kim, Hye-Keun Oh

Proceedings Volume 7520, 75201L (2009) https://doi.org/10.1117/12.837234

KEYWORDS: Line edge roughness, Polymers, Monte Carlo methods, Diffusion, Line width roughness, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Edge roughness, Computer simulations

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Proceedings Article | 1 April 2009 Paper

Paper

Line edge and width roughness dependency on each ingredient of extreme ultraviolet molecular resist

Hyunsu Kim, In Wook Cho, Seong-Sue Kim, Han-Ku Cho, Hye-Keun Oh

Proceedings Volume 7273, 72732E (2009) https://doi.org/10.1117/12.814055

KEYWORDS: Line edge roughness, Monte Carlo methods, Extreme ultraviolet lithography, Diffusion, Molecules, Extreme ultraviolet, Image processing, Lithography, Polymers, Line width roughness

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Proceedings Article | 1 April 2009 Paper

Paper

Temperature and critical dimension variation in a single wafer on hot plate due to non-uniform heat source

Bobae Kim, Joon-Min Park, Hyunsu Kim, Ilsin An, Seung-Wook Park, Hye-Keun Oh

Proceedings Volume 7273, 72732Z (2009) https://doi.org/10.1117/12.814009

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Photoresist materials, Process control, Lithography, Semiconductors, Etching, Photoresist processing, Chemically amplified resists, Polymers

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Proceedings Article | 1 April 2009 Paper

Paper

Reduction of line width and edge roughness by resist reflow process for extreme ultra-violet lithography

In Wook Cho, Joon-Min Park, Hyunsu Kim, Joo-Yoo Hong, Seong-Sue Kim, Han-Ku Cho, Hye-Keun Oh

Proceedings Volume 7273, 72732D (2009) https://doi.org/10.1117/12.814108

KEYWORDS: Line edge roughness, Line width roughness, Photoresist processing, Lithography, Polymers, Surface roughness, Diffusion, Glasses, Extreme ultraviolet lithography, Monte Carlo methods

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Showing 5 of 15 publications

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