Dr. John L. Nistler Profile

Dr. John L. Nistler

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Publications (15)

Proceedings Article | 19 March 2007 Paper

Photonic band-gap masks to enhance resolution and depth of focus

John Nistler, Koby Duckworth, Jiri Chaloupka, Matt Brock

Proceedings Volume 6517, 65171F (2007) https://doi.org/10.1117/12.712295

KEYWORDS: Photomasks, Resolution enhancement technologies, Reticles, Manufacturing, Lithography, Stereolithography, Immersion lithography

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Proceedings Article | 20 October 2006 Paper

Influence of design shrinks and proximity influence distance on flattening of optical hierarchy during RET

John Nistler, Koby Duckworth

Proceedings Volume 6349, 634925 (2006) https://doi.org/10.1117/12.686359

KEYWORDS: Resolution enhancement technologies, Databases, Computer aided design, Metals, Computer simulations, Optical proximity correction, Electronic design automation, Photomasks, Optical simulations, Lithography

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Proceedings Article | 6 December 2004 Paper

E-beam lithography experimental results and simulation for the 45-nm node

John Nistler, Chia-Jen Chen, Sergey Vychub, Hsin-Chang Lee, Lee-Chih Yeh, Hung-Chang Hsieh, Christoph Sambale, Ulrich Hofmann

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.570022

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Electron beam lithography, Lithography, Monte Carlo methods, Oxides, Error analysis, Mask making, Etching

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Proceedings Article | 18 December 1998 Paper

In the year 2525, if x ray is still alive, if lithography can survive, they may find...

John Nistler, Mark Michael, Fred Hause, Richard Edwards

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332840

KEYWORDS: Photomasks, Transistors, Semiconducting wafers, Etching, Optical proximity correction, Critical dimension metrology, Lithography, Reticles, Plasma, Reactive ion etching

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Proceedings Article | 27 August 1997 Paper

Device performance and optimization for 5th- and 6th-generation microprocessors

Bijnan Bandyopadhyay, Jon Cheek, Robert Dawson, Michael Duane, Jim Fulford, Mark Gardner, Fred Hause, Bernard Ho, Daniel Kadoch, Raymond Lee, Ming-Yin Hao, Chuck May, Mark Michael, Brad Moore, Deepak Nayak, John Nistler, Dirk Wristers

Proceedings Volume 3212, (1997) https://doi.org/10.1117/12.284617

KEYWORDS: Oxides, Transistors, Manufacturing, Reliability, Metals, Boron, CMOS technology, Semiconducting wafers, Printing, Capacitance

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Proceedings Article | 7 July 1997 Paper

Phase shifting and optical proximity corrections to improve CD control on logic devices in manufacturing for sub-0.35-um i-line

Paul Ackmann, Stuart Brown, John Nistler, Chris Spence

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276034

KEYWORDS: Manufacturing, Critical dimension metrology, Phase shifting, Optical proximity correction, Control systems, Logic devices, Optics manufacturing, Binary data, Phase shifts, Switches

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Proceedings Article | 7 July 1997 Paper

Use of exposure compensation to improve device performance for speed and binning based on electrical parametric feedback into fabrication design

Paul Ackmann, Stuart Brown, Richard Edwards, Doug Downey, Mark Michael, Karen Turnquest, John Nistler

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275998

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Yield improvement, Manufacturing, Etching, Transistors

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Proceedings Article | 12 February 1997 Open Access

Detection of submicron phase defects on multiphase random logic reticles

Chris Spence, John Nistler, William Arnold, David Emery, Larry Zurbrick, Durai Prakash, X. Chang, Steve Khanna, Brent Leback, Eiji Tsujimoto, Greg Hughes

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301195

KEYWORDS: Inspection, Reticles, Detection and tracking algorithms, Photomasks, Deep ultraviolet, Etching, Phase shift keying, Algorithm development, Defect detection, Phase shifts

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Proceedings Article | 7 December 1994 Paper

Metrology test reticles for advanced optical lithography

Herschel Marchman, Christophe Pierrat, Joseph Griffith, John Nistler, Alvina Williams

Proceedings Volume 2322, (1994) https://doi.org/10.1117/12.195832

KEYWORDS: Photomasks, Metrology, Quartz, Reticles, Chromium, Calibration, Phase shifts, Scanning electron microscopy, Critical dimension metrology, Lithography

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Proceedings Article | 3 November 1994 Paper

Large-area optical design rule checker for logic PSM application

John Nistler, Chris Spence, Eytan Barouch, Uwe Hollerbach

Proceedings Volume 2254, (1994) https://doi.org/10.1117/12.191965

KEYWORDS: Photomasks, Computer aided design, Optical design, Image processing, Logic, Databases, X-ray technology, Logic devices, Algorithm development, Computing systems

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Proceedings Article | 17 May 1994 Paper

Automated determination of CAD layout failures through focus: experiment and simulation

Chris Spence, John Nistler, Eytan Barouch, Uwe Hollerbach, Steven Orszag

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175424

KEYWORDS: Computer aided design, Tolerancing, Deep ultraviolet, Computer simulations, Scanning electron microscopy, Photomasks, Optical design, Image enhancement, Optical proximity correction, Lithography

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Proceedings Article | 1 January 1994 Paper

Reticle variation influence on manufacturing line and wafer device performance

John Nistler, Kyle Spurlock

Proceedings Volume 10273, 1027308 (1994) https://doi.org/10.1117/12.177440

KEYWORDS: Reticles, Manufacturing, Semiconducting wafers, Wafer manufacturing, Silicon

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Proceedings Article | 1 January 1992 Paper

Issues associated with the commercialization of phase-shift masks

John Nistler, Greg Hughes, Andrew Muray, James Wiley

Proceedings Volume 1604, (1992) https://doi.org/10.1117/12.56947

KEYWORDS: Photomasks, Phase shifts, Etching, Quartz, Reticles, Semiconducting wafers, Scanning electron microscopy, Inspection, Manufacturing, Gallium

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Proceedings Article | 1 July 1991 Open Access

Phase-shift mask technology: requirements for e-beam mask lithography

Steven Dunbrack, Andrew Muray, Charles Sauer, Richard Lozes, John Nistler, William Arnold, David Kyser, Anna Maria Minvielle, Moshe Preil, Bhanwar Singh, Michael Templeton

Proceedings Volume 1464, (1991) https://doi.org/10.1117/12.44444

KEYWORDS: Photomasks, Inspection, Reticles, Integrated circuits, Process control, Metrology, Electron beam lithography, Phase shifts, Overlay metrology, Photomicroscopy

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Proceedings Article | 1 July 1991 Paper

Metrology issues associated with submicron linewidths

Khoi Phan, John Nistler, Bhanwar Singh

Proceedings Volume 1464, (1991) https://doi.org/10.1117/12.44455

KEYWORDS: Scanning electron microscopy, Calibration, Metrology, Integrated optics, Integrated circuits, Inspection, Process control, Critical dimension metrology, Optical testing, Photomasks

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Showing 5 of 15 publications

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