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Justin Ducotè
at Univ of California Irvine
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Publications (1)
Proceedings Article | 17 October 2014 Paper
How holistic process control translates into high mix logic fab APC?
B. Le-Gratiet, M. Gatefait, J. Ducotè, J. Decaunes, A. Lam, B. Beraud, M. Mikolajczak, A. Pelletier, B. Orlando, F. Sundermann, A. Ostrovsky, C. Lapeyre
Proceedings Volume 9231, 92310V (2014) https://doi.org/10.1117/12.2064795
KEYWORDS: Semiconducting wafers, Photomasks, Process control, Scanners, Metrology, Etching, Databases, Logic, Data modeling, Control systems
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