Mr. Keun Hee Bai Profile

Keun Hee Bai

Principal Engineer at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Conference Program Committee | Author

Publications (4)

Proceedings Article | 10 April 2024 Presentation

Presentation

Patterning-induced metal damage reduction using low energy radical source

Minbok Jung, Yong Hee Choi, Seung Park, Se Myoung Oh, Sanghak Kim, Jongjin Park, Sangjun Cho, Jeongyeon Seo, Chul Woong Lee, David Lo, Keun Hee Bai

Proceedings Volume 12958, 1295803 (2024) https://doi.org/10.1117/12.3009115

KEYWORDS: Metals, Resistance, Optical lithography, Ions, Transmission electron microscopy, Plasma, Oxygen, Oxides, Oxidation, Nanostructures

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Proceedings Article | 1 May 2023 Presentation + Paper

Presentation + Paper

AppliedPRO: process recipe optimizer for R&D acceleration and beyond

Deepak Gupta, Sravan Nandakumar, Takemasa Miyagi, Oliver Jan, Waheb Bishara, Steven Chiou, Kyeong-tae Lee, Andre Kim, Sangdoo Kim, Youngje Um, Ki-il Kim, Changbae Park, Myeonggil Shin, Keun Hee Bai

Proceedings Volume 12499, 1249903 (2023) https://doi.org/10.1117/12.2661320

KEYWORDS: Diffractive optical elements, Etching, Visualization, Algorithm development, Logic, Process engineering, Mathematical optimization, Design and modelling, Semiconductors, Semiconducting wafers

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Proceedings Article | 1 May 2023 Poster + Paper

Poster + Paper

The damage control of sub layer while ion-driven etching with vertical carbon profile implemented

SeungJin Mun, Lina Yoo, Jongdeok Hong, Junyeong Ahn, Kyung-yub Jeon, Keunhee Bai

Proceedings Volume 12499, 124990J (2023) https://doi.org/10.1117/12.2657249

KEYWORDS: Etching, Ions, Optical lithography, Metals, Carbon, Logic, Polymers, Passivation, Transmission electron microscopy, Statistical analysis

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Proceedings Article | 13 June 2022 Presentation

Presentation

Pattern shape engineering

Shurong Liang, Amol Gupta, Steven Sherman, Kevin Anglin, Keun Hee Bai, Jong Chul Park

Proceedings Volume PC12056, PC1205602 (2022) https://doi.org/10.1117/12.2615043

KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Stochastic processes, Chemistry

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Conference Committee Involvement (7)

Advanced Etch Technology and Process Integration for Nanopatterning XIV

23 February 2025 | San Jose, California, United States

Advanced Etch Technology and Process Integration for Nanopatterning XIII

26 February 2024 | San Jose, California, United States

Advanced Etch Technology and Process Integration for Nanopatterning XII

28 February 2023 | San Jose, California, United States

Advanced Etch Technology and Process Integration for Nanopatterning XI

26 April 2022 | San Jose, California, United States

Advanced Etch Technology and Process Integration for Nanopatterning X

22 February 2021 | Online Only, California, United States

Showing 5 of 7 Conference Committees

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