Dr. Michael C. Smayling
Consultant
SPIE Involvement:
Author
Publications (38)

Proceedings Article | 22 March 2016 Open Access Paper
Proceedings Volume 9777, 977702 (2016) https://doi.org/10.1117/12.2224685
KEYWORDS: Directed self assembly, Lithography, Optical lithography, Source mask optimization, Optical resolution, Logic, Electron beam lithography, Transistors, Electronics, Photomasks, Optics manufacturing

Proceedings Article | 9 July 2015 Paper
Proceedings Volume 9658, 96580A (2015) https://doi.org/10.1117/12.2192529
KEYWORDS: Optical lithography, Photomasks, Source mask optimization, Lithography, Etching, Scanning electron microscopy, Logic devices, Computer programming, Photovoltaics, Metals

Proceedings Article | 18 March 2015 Paper
Proceedings Volume 9426, 94261U (2015) https://doi.org/10.1117/12.2084846
KEYWORDS: Optical lithography, Logic, Double patterning technology, Etching, Optical proximity correction, Photomasks, Source mask optimization, Neodymium, Fiber optic illuminators, Picosecond phenomena

Proceedings Article | 16 September 2014 Paper
Proceedings Volume 9235, 92350C (2014) https://doi.org/10.1117/12.2069353
KEYWORDS: Optical proximity correction, Lithography, Double patterning technology, Critical dimension metrology, Manufacturing, Photomasks, Optics manufacturing, Scanning electron microscopy, Databases, Image processing

Proceedings Article | 31 March 2014 Paper
Proceedings Volume 9052, 905213 (2014) https://doi.org/10.1117/12.2046120
KEYWORDS: Field effect transistors, Optical lithography, Lithography, Manufacturing, Double patterning technology, Device simulation, Photomasks, Calibration, Image processing, Photovoltaics

Proceedings Article | 31 March 2014 Paper
Proceedings Volume 9052, 90520M (2014) https://doi.org/10.1117/12.2045667
KEYWORDS: Logic, Photomasks, Semiconducting wafers, Optical proximity correction, Source mask optimization, Fiber optic illuminators, Lithography, Double patterning technology, Etching, Convolution

Proceedings Article | 9 September 2013 Paper
Proceedings Volume 8880, 888012 (2013) https://doi.org/10.1117/12.2030684
KEYWORDS: Photomasks, Optical proximity correction, Electron beam lithography, Mask making, Semiconducting wafers, Logic, Optical lithography, Line edge roughness, Lithography, Electron beam direct write lithography

Proceedings Article | 12 April 2013 Paper
Proceedings Volume 8683, 868305 (2013) https://doi.org/10.1117/12.2011329
KEYWORDS: Optical lithography, Photomasks, Logic, Optical proximity correction, Double patterning technology, Semiconducting wafers, Transmission electron microscopy, Source mask optimization, Neodymium, Etching

Proceedings Article | 8 November 2012 Paper
Proceedings Volume 8522, 852209 (2012) https://doi.org/10.1117/12.961118
KEYWORDS: Photomasks, Optical proximity correction, Source mask optimization, Metals, Lithography, Photovoltaics, Semiconducting wafers, Scanning electron microscopy, SRAF, Inspection

Proceedings Article | 21 March 2012 Paper
Proceedings Volume 8323, 83230F (2012) https://doi.org/10.1117/12.916486
KEYWORDS: Electron beam lithography, Photomasks, Lithography, Optical lithography, Logic, Optics manufacturing, Semiconducting wafers, Double patterning technology, Neodymium, Scanning electron microscopy

Proceedings Article | 13 March 2012 Paper
Proceedings Volume 8326, 832613 (2012) https://doi.org/10.1117/12.914916
KEYWORDS: Optical proximity correction, Logic, Photomasks, Optical lithography, Etching, Lithography, Acquisition tracking and pointing, Photovoltaics, Semiconducting wafers, Scanning electron microscopy

Proceedings Article | 4 April 2011 Paper
Proceedings Volume 7970, 797011 (2011) https://doi.org/10.1117/12.879479
KEYWORDS: Electron beam lithography, Lithography, Optical lithography, Semiconducting wafers, Photomasks, Logic, 193nm lithography, Optical alignment, Semiconductors, Metals

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79730D (2011) https://doi.org/10.1117/12.878663
KEYWORDS: Photomasks, Lithography, Optical proximity correction, SRAF, Lithographic illumination, Source mask optimization, Binary data, Double patterning technology, Computer programming, Nanoimprint lithography

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79731W (2011) https://doi.org/10.1117/12.881662
KEYWORDS: Logic, Source mask optimization, Fiber optic illuminators, Optical lithography, Photomasks, Double patterning technology, Metals, Lithography, Nanoimprint lithography, System on a chip

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79730B (2011) https://doi.org/10.1117/12.881688
KEYWORDS: Logic, Lithium, Source mask optimization, Optical lithography, Double patterning technology, Surface plasmons, Transistors, Photovoltaics, Photomasks, Semiconducting wafers

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 797314 (2011) https://doi.org/10.1117/12.879522
KEYWORDS: Logic, Scanners, Source mask optimization, Optical lithography, Lithography, Transistors, 193nm lithography, Lithographic illumination, Cadmium, Double patterning technology

Proceedings Article | 3 April 2010 Paper
Proceedings Volume 7641, 764109 (2010) https://doi.org/10.1117/12.846677
KEYWORDS: Scanners, Lithography, Lithium, Image quality, Manufacturing, Immersion lithography, Lithographic illumination, Double patterning technology, 193nm lithography, Optical proximity correction

Proceedings Article | 11 March 2010 Paper
Proceedings Volume 7641, 764107 (2010) https://doi.org/10.1117/12.846595
KEYWORDS: Logic, Lithography, Optical lithography, Double patterning technology, Electroluminescence, Fiber optic illuminators, Transistors, Photomasks, Source mask optimization, Lithium

Proceedings Article | 4 March 2010 Paper
Proceedings Volume 7640, 76401V (2010) https://doi.org/10.1117/12.846562
KEYWORDS: Logic, Semiconducting wafers, Aluminum, Photomasks, Photoresist materials, Optical alignment, Optical lithography, Scanning electron microscopy, Metals, Diffusion

Proceedings Article | 4 March 2010 Paper
Proceedings Volume 7640, 764019 (2010) https://doi.org/10.1117/12.846580
KEYWORDS: Photomasks, Metals, Lithography, Optical lithography, Logic, Source mask optimization, Photovoltaics, Optical proximity correction, Lithium, SRAF

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 72712U (2009) https://doi.org/10.1117/12.812033
KEYWORDS: Lithography, Diffusion, Photomasks, Critical dimension metrology, Optical lithography, 193nm lithography, Double patterning technology, Logic, Metals, Electron beam lithography

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 72740K (2009) https://doi.org/10.1117/12.814258
KEYWORDS: Logic, Optical lithography, Double patterning technology, Fiber optic illuminators, Lithography, Photomasks, Optical proximity correction, Nanoimprint lithography, Diffusion, Photoresist materials

Proceedings Article | 12 March 2008 Paper
Proceedings Volume 6925, 69250B (2008) https://doi.org/10.1117/12.772875
KEYWORDS: Logic, Optical proximity correction, Critical dimension metrology, Scanners, Semiconducting wafers, Optical lithography, Etching, Photomasks, Resolution enhancement technologies, Fiber optic illuminators

Proceedings Article | 4 March 2008 Paper
Proceedings Volume 6925, 69251E (2008) https://doi.org/10.1117/12.772905
KEYWORDS: Logic, Photomasks, Optical lithography, Etching, Transistors, Double patterning technology, Chemical vapor deposition, Semiconducting wafers, Dielectrics, Image processing

Proceedings Article | 28 December 2007 Paper
Proceedings Volume 6798, 67980I (2007) https://doi.org/10.1117/12.758782
KEYWORDS: Computer aided design, Optical proximity correction, Design for manufacturing, Manufacturing, System on a chip, Field effect transistors, Calibration, Etching, Lithography, Analog electronics

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.572591
KEYWORDS: Photomasks, Semiconducting wafers, Manufacturing, Design for manufacturability, Reticles, Vestigial sideband modulation, Diagnostics, Failure analysis, Optical proximity correction, Resolution enhancement technologies

Proceedings Article | 3 May 2004 Paper
Michael Smayling, Robin Sarma, Toshiyuki Nagata, Narain Arora, Michael Duane, Shiany Oemardani, Santosh Shah
Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.536027
KEYWORDS: Optical proximity correction, Resistance, Manufacturing, Semiconducting wafers, Resistors, Metals, Lithography, Scanners, Metrology, Photomasks

Proceedings Article | 3 May 2004 Paper
Robin Sarma, Michael Smayling, Narain Arora, Toshiyuki Nagata, Michael Duane, Santosh Shah, Harris Keston, Shiany Oemardani
Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.536130
KEYWORDS: Photomasks, Manufacturing, Metals, Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Resistance, Lithography, Dielectrics, Copper

Proceedings Article | 26 July 1999 Paper
Miklos Erdelyi, Armen Kroyan, Karoly Osvay, Zsolt Bor, William Wilson, Michael Smayling, Frank Tittel
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354393
KEYWORDS: Fabry–Perot interferometers, Image filtering, Coherence imaging, Optical filters, Photomasks, Resolution enhancement technologies, Spatial coherence, Image enhancement, Phase shifts, Image resolution

Proceedings Article | 28 April 1999 Paper
Miklos Erdelyi, Karoly Osvay, Zsolt Bor, William Wilson, Michael Smayling, Frank Tittel
Proceedings Volume 3741, (1999) https://doi.org/10.1117/12.346891
KEYWORDS: Fabry–Perot interferometers, Diffraction, Photomasks, Image filtering, Coherence imaging, Optical filters, Optical lithography, Image processing, Mirrors, Image quality

Proceedings Article | 29 June 1998 Paper
Frank Tittel, Miklos Erdelyi, Zoltan Horvath, Armen Kroyan, William Wilson, Michael Smayling, Zsolt Bor, Gabor Szabo
Proceedings Volume 3403, (1998) https://doi.org/10.1117/12.311947
KEYWORDS: Fabry–Perot interferometers, Objectives, Optical lithography, Wafer-level optics, Excimer lasers, Resolution enhancement technologies, Semiconducting wafers, Integrated optics, Microscopes, Mirrors

Proceedings Article | 7 July 1997 Paper
Miklos Erdelyi, Zoltan Horvath, Zsolt Bor, Gabor Szabo, Joseph Cavallaro, Michael Smayling, Frank Tittel
Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276053
KEYWORDS: Optical lithography, Nondiffracting beams, Fabry–Perot interferometry, Bessel beams, Image resolution, Diffraction, Phase shifting

Proceedings Article | 4 April 1997 Paper
Frank Tittel, Joseph Cavallaro, Miklos Erdelyi, Gabor Szabo, Zsolt Bor, Michael Smayling
Proceedings Volume 3092, (1997) https://doi.org/10.1117/12.270108
KEYWORDS: Optical lithography, Deep ultraviolet, Objectives, Excimer lasers, Fabry–Perot interferometers, Mirrors, Bessel beams, Fabry–Perot interferometry, Image resolution, Interferometers

Proceedings Article | 7 June 1996 Paper
Chaitali Sengupta, Miklos Erdelyi, Zsolt Bor, Joseph Cavallaro, Michael Smayling, Gabor Szabo, Frank Tittel, William Wilson
Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240955
KEYWORDS: Computer aided design, Phase shifts, Photomasks, Phase shifting, Binary data, Very large scale integration, Lithographic illumination, Photoresist materials, Interferometry, Silicon

Proceedings Article | 7 June 1996 Paper
Miklos Erdelyi, Zsolt Bor, Gabor Szabo, Joseph Cavallaro, Michael Smayling, Frank Tittel, William Wilson
Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240953
KEYWORDS: Photoresist materials, Imaging systems, Diffraction, Spatial filters, Spectral resolution, Fabrication, Excimer lasers, Silica, Optical lithography, Resolution enhancement technologies

Proceedings Article | 26 May 1995 Paper
Miklos Erdelyi, Chaitali Sengupta, Zsolt Bor, Joseph Cavallaro, Motoi Kido, Michael Smayling, Frank Tittel, William Wilson, Gabor Szabo
Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209308
KEYWORDS: Computer aided design, Phase shifting, Photomasks, Interferometry, Phase shifts, Photoresist materials, Optical lithography, Lithography, Semiconducting wafers, Binary data

Proceedings Article | 17 April 1995 Paper
Zsolt Bor, Joseph Cavallaro, Miklos Erdelyi, Motoi Kido, Chaitali Sengupta, Michael Smayling, Gabor Szabo, Frank Tittel, William Wilson
Proceedings Volume 2380, (1995) https://doi.org/10.1117/12.206950
KEYWORDS: Phase shifts, Photomasks, Phase shifting, Optical lithography, Excimer lasers, Semiconducting wafers, Reflectivity, Lithography, Optical simulations, Beam splitters

Proceedings Article | 31 March 1995 Paper
Frank Tittel, Joseph Cavallaro, Motoi Kido, Michael Smayling, Gabor Szabo, William Wilson
Proceedings Volume 2502, (1995) https://doi.org/10.1117/12.204981
KEYWORDS: Phase shifting, Photomasks, Phase shifts, Photoresist materials, Ultraviolet radiation, Interferometry, Optical lithography, Superposition, Deep ultraviolet, CCD cameras

Showing 5 of 38 publications
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