KEYWORDS: Multilayers, Diffraction, Image processing, Scanning electron microscopy, Zone plates, Hard x-rays, Sputter deposition, Optical engineering, Error analysis, Binary data
The multilayer Laue lens (MLL) is a promising optical element with large numerical aperture and aspect ratio in synchrotron radiation facility to focus hard x-ray to 1 nm with ideal structure. We use a new method of combining actual film thickness and the coupled wave theory to calculate focusing performance. Here, a 17.2-μm-MLL with a focal spot size of 17 nm at 10 keV is designed and fabricated by dynamical diffraction theory and direct current magnetron sputtering technology. Based on a new rate calibration and symbol layer insertion method, we calculate d-spacing of multilayer instead of individual layer thickness and change the order of two layers as a symbol so as not to damage zone plate law. The scanning electron microscope image is smoothed and binary transformed to measure the actual thickness of each layer. The full-width at half-maximum of focus spot is 18 nm, which is close to the theoretical result of 17 nm.
In order to give a complete evaluation of the beamline’s performance, x-ray mirrors should be measured by advanced surface metrology technique. How to improve spatial resolution of the surface profilers with long trace is one of the important issues for metrology lab. In this paper, we present our newly developed surface slope profiler with focused beam to sample the surface under test. This system has capability to measure precision optics with both high accuracy and spatial resolution. The systematic error of the instrument is also improved for large aperture footprint in the focusing lens considering the lateral beam shift effect. The characterization experiments of the optical head and the scanning measurement of the sample have been carried out to verify the performance of the profiler with accuracy of sub-100 nrad.
The quality of X-ray optics on beamline is a key factor that limits the performance of the beam line to play. For X-ray mirror surface characterization with high accuracy, long trace profiler and NOM for flat or slight curved mirror have been developed. However, these two kind of instruments cannot measure the highly curved mirror since requirement of high precision and that of large range contradict each other. In this paper, we proposed a novel wavefront-coding-based surface slope metrology technique. Four-dimension information of the optics under test, including x-y position and sagittal/tangential angle, is provided. Due to the focused beam used and the high speed DMD (Digital Mirror Device), high spatial resolution of the measurement is obtained. In experiment, we demonstrated this technique by measuring bend-based high energy monochromator developed in BSRF.
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