Various micro and nano-manufacturing techniques were investigated to create controlled flaws for x-ray computed tomography (XCT) phantoms. We explored the use of focused ion beam, laser micromachining, and projection photolithography with deep reactive ion etching to generate controlled pores from 100s of micrometers to a few micrometers in size. Principles of each technique, fabrication results, and the calibration processes for the manufactured pores are discussed, as well as possible assembly techniques for building up larger pore-containing structure and initial results for such assemblies. Example scanning electron microscope and XCT measurements of the phantoms are shown.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.