Mr. Toru Umeda Profile

Toru Umeda

Principal Scientist at Nihon Pall Ltd

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Author

Publications (21)

Proceedings Article | 9 April 2024 Poster + Paper

Filter start-up study on HDPE membrane point-of-use filter for lithography application

Toru Umeda

Proceedings Volume 12957, 1295725 (2024) https://doi.org/10.1117/12.3014583

KEYWORDS: Viscosity, Solubility, Lithography, Mixtures, Error analysis, Polyethylene, Photoresist materials, Molecular interactions

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Proceedings Article | 9 April 2024 Poster + Paper

Filtration study with nylon membrane for metal removal performance improvement

Hirokazu Sakakibara, Ryouichi Sugita, Toru Umeda

Proceedings Volume 12957, 129572E (2024) https://doi.org/10.1117/12.3024911

KEYWORDS: Metals, Tunable filters, Diffractive optical elements, Particles, Magnesium, Liquids, Ions, Materials properties, Statistical analysis, Lithography

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Proceedings Article | 1 May 2023 Poster + Paper

Defectivity reduction in EUV resists through novel high-performance Point-Of-Use (POU) filters

Yiren Zhang, Toru Umeda, Hirokazu Sakakibara, Sheik Ansar Usman Ibrahim, Atsushi Sakamoto, Amarnauth Singh, Robert Shick, Karl Skjonnemand, Philippe Foubert, Waut Drent

Proceedings Volume 12498, 124981Y (2023) https://doi.org/10.1117/12.2660389

KEYWORDS: Tunable filters, Extreme ultraviolet lithography, Particles, Photoresist materials, Contamination

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Proceedings Article | 22 February 2021 Presentation + Paper

High performance filtration for bulk materials: a novel HDPE membrane filter designed for EUV lithography

Lucia D'Urzo, Toru Umeda, Takehito Mizuno, Atsushi Hattori, Amarnauth Singh, Rajan Beera, Philippe Foubert, Waut Drent

Proceedings Volume 11612, 116120H (2021) https://doi.org/10.1117/12.2584064

KEYWORDS: Extreme ultraviolet lithography, Particles, Molecules, Lithography, Extreme ultraviolet, Semiconducting wafers, Metals, Liquids, Linear filtering, Coating

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Proceedings Article | 22 February 2021 Poster + Presentation

Novel functionalized membrane approaches to metal contamination control in advanced lithography filtration

Hassan Ait-Haddou, James Belmont, Frank Onyemauwa, Takehito Mizuno, Atsushi Hattori, Toru Umeda, Yiren Zhang, Timothy McKeon, Rajan Beera

Proceedings Volume 11612, 116120Z (2021) https://doi.org/10.1117/12.2584752

KEYWORDS: Metals, Lithography, Contamination control, Chemistry, Yield improvement, Semiconductors, Semiconducting wafers, Photoresist materials, Oxides, Nanoparticles

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Proceedings Article | 23 March 2020 Presentation + Paper

Defectivity modulation in EUV resists through advanced filtration technologies

Lucia D'Urzo, Toru Umeda, Takehito Mizuno, Atsushi Hattori, Rao Varanasi, Amarnauth Singh, Rajan Beera, Philippe Foubert, Jelle Vandereyken, Waut Drent

Proceedings Volume 11326, 113260K (2020) https://doi.org/10.1117/12.2560144

KEYWORDS: Semiconducting wafers, Particles, Extreme ultraviolet lithography, Extreme ultraviolet, Inspection, Bridges, Defect inspection

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Proceedings Article | 27 March 2019 Presentation + Paper

Start-up performance and pattern defectivity improvement using 2nm rated nylon filter developed with lithography filtration expertise

Toru Umeda, Eric Shiu, Takehito Mizuno, Hisashi Nakagawa, Tetsuya Murakami, Shuichi Tsuzuki

Proceedings Volume 10960, 1096018 (2019) https://doi.org/10.1117/12.2515163

KEYWORDS: Coating, Metals, Bridges, Inspection, Semiconducting wafers, Particles, Silicon, Photoresist materials, Lithography, Adsorption

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Proceedings Article | 13 March 2018 Paper

Application specific ratings of filters for negative-tone developer

Toru Umeda, Yukihisa Kawada, Kazushi Masuda, Naoya Iguchi, Tetsuya Murakami, Shuichi Tsuzuki

Proceedings Volume 10586, 1058616 (2018) https://doi.org/10.1117/12.2297164

KEYWORDS: Nanoparticles, Particles, Palladium, Inspection, Adsorption, Semiconducting wafers, Metrology, Defect inspection, Extreme ultraviolet lithography, Photoresist developing

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Proceedings Article | 27 March 2017 Paper

Metal reduction at bulk chemical filtration

Toru Umeda, Shusaku Daikoku, Shuichi Tsuzuki, Tetsuya Murakami

Proceedings Volume 10146, 1014629 (2017) https://doi.org/10.1117/12.2257937

KEYWORDS: Metals, Sodium, Iron, Semiconductors, Calcium, Chromium, Lithium, Silicon, Semiconducting wafers, Coating, Nickel, Manganese, Chemical analysis

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Proceedings Article | 25 March 2016 Paper

Filtration on block copolymer solution used in directed self assembly lithography

Toru Umeda, Tomoyuki Takakura, Shuichi Tsuzuki

Proceedings Volume 9779, 977921 (2016) https://doi.org/10.1117/12.2219423

KEYWORDS: Lithography, Directed self assembly, Polymers, Molecular aggregates, Adsorption, Ion exchange, Molecules, Particles, Metals, Lithium, Magnesium, Aluminum, Etching

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Proceedings Article | 25 March 2016 Paper

Metal reduction at point-of-use filtration

Toru Umeda, Shusaku Daikoku, Rao Varanasi, Shuichi Tsuzuki

Proceedings Volume 9779, 97791R (2016) https://doi.org/10.1117/12.2218400

KEYWORDS: Metals, Lithography, Semiconductors, Semiconducting wafers, Ion exchange, Semiconductor manufacturing, Head, Photoresist materials, Particle contamination, Thin film coatings, Chromatography, Adsorption, Ions, Sodium, Silicon

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Proceedings Article | 20 March 2015 Paper

Microbridge reduction in negative-tone imaging at photoresist point-of-use filtration

Toru Umeda, Tsukasa Yamanaka, Naoya Iguchi, Shuichi Tsuzuki

Proceedings Volume 9425, 942521 (2015) https://doi.org/10.1117/12.2085710

KEYWORDS: Bridges, Photoresist materials, Image processing, Image filtering, Lithography, Semiconducting wafers, Adsorption, Modulation, Photoresist processing, Particles

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Proceedings Article | 27 March 2014 Paper

Wet particle source identification and reduction using a new filter cleaning process

Toru Umeda, Akihiko Morita, Hideki Shimizu, Shuichi Tsuzuki

Proceedings Volume 9051, 90511F (2014) https://doi.org/10.1117/12.2046560

KEYWORDS: Particles, Particle filters, Semiconducting wafers, Lithography, Metrology, Silicon, Inspection, Liquids, Metals, Mass spectrometry

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Proceedings Article | 27 March 2014 Paper

Adsorption characteristics of lithography filters in various solvents using application-specific ratings

Toru Umeda, Shuichi Tsuzuki

Proceedings Volume 9051, 90511G (2014) https://doi.org/10.1117/12.2046588

KEYWORDS: Adsorption, Lithography, Nanoparticles, Palladium, Metals, Particles, Deep ultraviolet, Photoresist processing, Digital filtering, Metrology

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Proceedings Article | 29 March 2013 Paper

Application specific ratings for lithography process filters

Toru Umeda, Shuichi Tsuzuki

Proceedings Volume 8682, 868208 (2013) https://doi.org/10.1117/12.2010735

KEYWORDS: Adsorption, Nanoparticles, Particles, Metals, Lithography, Palladium, Deep ultraviolet, Extreme ultraviolet, Photoresist processing, Semiconducting wafers

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Proceedings Article | 19 March 2012 Paper

Solvent pre-wetting as an effective start-up method for point-of-use filter

Toru Umeda, Shinichi Sugiyama, Takashi Nakamura, Makoto Momota, Michael Sevegney, Shuichi Tsuzuki, Toru Numaguchi

Proceedings Volume 8325, 83252H (2012) https://doi.org/10.1117/12.916026

KEYWORDS: Lithography, Radium, Manufacturing, Semiconducting wafers, Error analysis, Electronic filtering, Transducers, Inspection, Molecular interactions, Hydrogen

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Proceedings Article | 31 March 2010 Paper

New filter rating method in practice for sub-30-nm lithography process filter

Toru Umeda, Takehito Mizuno, Shuichi Tsuzuki, Toru Numaguchi

Proceedings Volume 7639, 76391F (2010) https://doi.org/10.1117/12.859457

KEYWORDS: Particles, Gold, Nanoparticles, Lithography, Sensors, Liquids, Dynamic light scattering, Standards development, Optical spheres, Plasma

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Proceedings Article | 12 December 2009 Paper

Filtration condition study for enhanced microbridge reduction

Toru Umeda, Fumitake Watanabe, Shuichi Tsuzuki, Toru Numaguchi

Proceedings Volume 7520, 75201K (2009) https://doi.org/10.1117/12.837664

KEYWORDS: Adsorption, Magnesium, Photoresist materials, Polymers, Microfluidics, Lithography, Digital filtering, Deep ultraviolet, Ions, Optical filters

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Proceedings Article | 1 April 2009 Paper

Defect reduction by using point-of-use filtration in a new coater/developer

Toru Umeda, Shuichi Tsuzuki, Toru Numaguchi

Proceedings Volume 7273, 72734B (2009) https://doi.org/10.1117/12.813662

KEYWORDS: Adsorption, Metals, Iron, Systems modeling, Molecules, Polymers, Molecular aggregates, Photoresist materials, Scanning electron microscopy, Semiconducting wafers

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Proceedings Article | 4 December 2008 Paper

The first on-site evaluation of a new filter optimized for TARC and developer

Toru Umeda, Takeo Ishibashi, Atsushi Nakamura, Junichi Ide, Masaru Nagano, Koichi Omura, Shuichi Tsuzuki, Toru Numaguchi

Proceedings Volume 7140, 71402Z (2008) https://doi.org/10.1117/12.804672

KEYWORDS: Semiconducting wafers, Particles, Microfluidics, Scanning electron microscopy, Liquids, Photoresist processing, Semiconductors, Manufacturing, Optical filters, Standards development

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Proceedings Article | 29 March 2006 Paper

Development of optimized filter for TARC and developer with the goal of having small pore size and minimizing microbubble reduction

Toru Umeda, Shuichi Tsuzuki, Mikal Boucher, Hung Dinh, L. Ma, Russell Boten

Proceedings Volume 6153, 61534L (2006) https://doi.org/10.1117/12.656399

KEYWORDS: Phase modulation, Particles, Optical filters, Semiconducting wafers, Photoresist materials, Photoresist processing, Adsorption, Resistance, Photoresist developing, Interfaces

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Showing 5 of 21 publications

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