Xi Chen
at Beijing Univ of Posts and Telecommunications
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 26 September 2019 Paper
Proceedings Volume 11147, 111471B (2019) https://doi.org/10.1117/12.2536707
KEYWORDS: Photomasks, Extreme ultraviolet, Lithography, Deep ultraviolet, Reflectivity, Manufacturing, Polishing, Plasma etching, Optical proximity correction, Extreme ultraviolet lithography

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