Prof. Yumei Zhou
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 20 September 2020 Poster + Paper
Proceedings Volume 11517, 115171B (2020) https://doi.org/10.1117/12.2573145
KEYWORDS: Extreme ultraviolet lithography, Lithography, Nanoimprint lithography, Computational lithography, Source mask optimization, Deep ultraviolet, Manufacturing, Photomasks, Optimization (mathematics)

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