Zoi Dardani
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 10 April 2024 Poster + Paper
Proceedings Volume 12955, 129551Y (2024) https://doi.org/10.1117/12.3006277
KEYWORDS: Line edge roughness, Line width roughness, Semiconducting wafers, Scanning electron microscopy, Distortion, Stochastic processes, Metrology, Bias correction, Error analysis

Proceedings Article | 12 May 2020 Presentation + Paper
Proceedings Volume 11323, 113230U (2020) https://doi.org/10.1117/12.2552067
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Nanoimprint lithography, Extreme ultraviolet lithography, Finite element methods, Optical lithography, Photomasks, Extreme ultraviolet, Stochastic processes, Inspection

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