A holistic approach to high precision patterning science

Ricardo Ruiz; Stacey F. Bent; Samuel M. Blau; Brett A. Helms; Frances A. Houle; Oleg Kostko; Patrick P. Naulleau; Paul F. Nealey; Christopher K. Ober; Dahyun Oh; Rachel A. Segalman; Cheng Wang

doi:10.1117/12.2662699

30 April 2023 A holistic approach to high precision patterning science

Ricardo Ruiz, Stacey F. Bent, Samuel M. Blau, Brett A. Helms, Frances A. Houle, Oleg Kostko, Patrick P. Naulleau, Paul F. Nealey, Christopher K. Ober, Dahyun Oh, Rachel A. Segalman, Cheng Wang

Author Affiliations +

Proceedings Volume PC12497, Novel Patterning Technologies 2023; PC124970J (2023) https://doi.org/10.1117/12.2662699
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

The newly formed Center for High Precision Patterning Science (CHiPPS) pursues a holistic approach to patterning science by studying the fundamentals of relevant interactions of light and matter and proposing co-designed materials and processes for precision patterning such as sequence defined and/or structured hybrid photoresists, molecular-level control of solvation steps, self-assembling materials for low-impact stochastics and molecularly precise and selective pattern transfer. The center leverages a world class EUV patterning research facility together with unique X-ray characterization built at the Advanced Light Source (ALS). In this presentation we will introduce the center’s overall efforts in high precision patterning science and, in particular, we will put emphasis on an approach that employs novel self-assembling, hierarchical materials to heal the adverse stochastic effects on EUV photoresists and to enable pattern transfer methods with atomic or molecular precision.

Conference Presentation

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Ricardo Ruiz, Stacey F. Bent, Samuel M. Blau, Brett A. Helms, Frances A. Houle, Oleg Kostko, Patrick P. Naulleau, Paul F. Nealey, Christopher K. Ober, Dahyun Oh, Rachel A. Segalman, and Cheng Wang "A holistic approach to high precision patterning science", Proc. SPIE PC12497, Novel Patterning Technologies 2023, PC124970J (30 April 2023); https://doi.org/10.1117/12.2662699

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