Mr. Paul C. Knutrud Profile

Paul C. Knutrud

at Valhalla Technology

SPIE Involvement:

Author

Area of Expertise:

Metrology , Microscopy , Overlay , Critical Dimension , CD SEM , Product Management

Websites:

Company Website

Expertise in Systems Application, Engineering and Product Management of Semiconductor Optical Metrology Systems.

US Patent # 6,612,159 B1, Taiwan Patent NI-163761, Sole Author, “Overlay registration error measurement made simultaneously for more than two semiconductor wafer layers.”

US Patent #10,445,889 b2, Sole Author, “Method of measuring offset in an integrated circuit and related technology” (Diamond Algorithm) to provide better repeatability and TIS on Box in Box overlay structures

Proceedings Article | 5 April 2007 Paper

Critical dimension: MEMS road map

Marc Poulingue, Paul Knutrud

Proceedings Volume 6518, 65184W (2007) https://doi.org/10.1117/12.716690

KEYWORDS: Microelectromechanical systems, Scanning electron microscopy, Critical dimension metrology, Optical metrology, Metrology, Roads, Telecommunications, Semiconducting wafers, Nondestructive evaluation, Silicon

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Proceedings Article | 10 May 2005 Paper

Characterization of E-beam induced resist slimming using etched feature measurements

Colin Yates, Galen Sapp, Paul Knutrud

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.601155

KEYWORDS: Etching, Process control, Image processing, Image acquisition, Metrology, Photoresist processing, Lithography, Semiconducting wafers, Logic, Scanning electron microscopy

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Proceedings Article | 2 June 2003 Paper

193-nm resist: ultralow voltage CD-SEM performance for sub-130-nm contact hole process

John Ferri, Marco Vieira, Mario Reybrouck, Martin Mastovich, Scott Bowdoin, Robert Brandom, Paul Knutrud

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.487597

KEYWORDS: Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, Photoresist processing, Metrology, Lithography, Electron beams, Chemical analysis, 193nm lithography, Temperature metrology

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Proceedings Article | 2 June 2003 Paper

Electron beam metrology of 193-nm resists at ultralow voltage

Neal Sullivan, Ron Dixson, Benjamin Bunday, Martin Mastovich, Paul Knutrud, Pascal Fabre, Robert Brandom

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.487598

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Atomic force microscopy, Metrology, Electron beams, Data modeling, Contamination, Semiconducting wafers, Systems modeling, Process control

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Proceedings Article | 16 July 2002 Paper

Productivity enhancements in recipe creation for overlay metrology measurements

Vincent Vachellerie, Delia Ristoiu, Alain Deleporte, Marc Poulingue, Yannick Bedin, Rolf Arendt, Ganesh Sundaram, Paul Knutrud

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473492

KEYWORDS: Semiconducting wafers, Overlay metrology, Metrology, Time metrology, Optical alignment, Process control, Prototyping, Metals, Niobium, Semiconductors

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Proceedings Article | 16 July 2002 Paper

Overlay metrology results on leading-edge Cu processes

Vincent Vachellerie, Delia Ristoiu, Alain Deleporte, Pierre-Olivier Sassoulas, Philippe Spinelli, Marc Poulingue, Pascal Fabre, Rolf Arendt, Ganesh Sundaram, Paul Knutrud

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473461

KEYWORDS: Overlay metrology, Semiconducting wafers, Copper, Image processing, Metals, Precision measurement, Pattern recognition, Detection and tracking algorithms, Metrology, Optical alignment

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Proceedings Article | 2 June 2000 Paper

Tighter process control of poly- and active-to-contact overlay registration via multilayer analysis

Peter Lee, Paul Knutrud

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386453

KEYWORDS: Overlay metrology, Process control, Detection and tracking algorithms, Scanners, Metrology, Data corrections, Tolerancing, Statistical analysis, Data modeling, Semiconducting wafers

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Proceedings Article | 14 June 1999 Paper

Efficiency improvements of offline metrology job creation

Victor Zuniga, Alan Carlson, John Podlesny, Paul Knutrud

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350876

KEYWORDS: Metrology, Time metrology, Semiconducting wafers, Manufacturing, Measurement devices, Overlay metrology, Databases, Process control, Control systems, Projection devices

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Proceedings Article | 14 June 1999 Paper

Algorithm implementation and techniques for providing more-reliable overlay measurements and better tracking of the shallow-trench isolation (STI) process

Doug Schramm, Dale Bowles, Martin Mastovich, Paul Knutrud, Anastasia Tyurina

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350798

KEYWORDS: Detection and tracking algorithms, Semiconducting wafers, Chemical mechanical planarization, Oxides, Overlay metrology, Silicon, Wafer-level optics, Image registration, Edge detection, Opacity

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Proceedings Article | 21 May 1996 Paper

Process improvement and cost reduction utilizing a fully automated CD SEM for thin film head pole 2 resist measurements

Paul Knutrud, Robert Newcomb

Proceedings Volume 2725, (1996) https://doi.org/10.1117/12.240132

KEYWORDS: Scanning electron microscopy, Manufacturing, Photoresist processing, Metrology, Throat, Head, Thin films, Critical dimension metrology, Algorithm development, Optical metrology

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Showing 5 of 10 publications

Conference Committee Involvement (1)

SEMI NE Chapter Committee

1 January 1998 |

Course Instructor

NON-SPIE: CLTP

Coaching business students

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NON-SPIE: Optical Microscopy & Imaging in the Biomedical Sciences

Commercial faculty for 3 years: Marine Biological Laboratory, Woods Hole, MA

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