Daniel A. Miller
Laser Design Engineer at Leonardo DRS
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 30 July 2002 Paper
Bruce Smith, Will Conley, Cesar Garza, Jeff Meute, Daniel Miller, Georgia Rich, Victoria Graffenberg, Kim Dean, Shashikant Patel, Arnie Ford, James Foster, Marco Moers, Kevin Cummings, James Webb, Paul Dewa, Azeddine Zerrade, Susan MacDonald, Greg Hughes, Peter Dirksen
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474551
KEYWORDS: Photomasks, Monochromatic aberrations, Scanning electron microscopy, Image processing, Lithography, Manufacturing, Imaging systems, Wavefronts, Zernike polynomials, Edge detection

Proceedings Article | 24 July 2002 Paper
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474174
KEYWORDS: Lithography, Photoresist materials, Data modeling, Absorption, Systems modeling, FT-IR spectroscopy, Metrology, Transparency, Scanning electron microscopy, Opacity

Proceedings Article | 24 July 2002 Paper
Will Conley, Daniel Miller, Charles Chambers, Brian Osborn, Raymond Hung, Hoang Tran, Brian Trinque, Matthew Pinnow, Takashi Chiba, Scott McDonald, Paul Zimmerman, Ralph Dammel, Andrew Romano, C. Grant Willson
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474282
KEYWORDS: Polymers, Absorbance, Photoresist materials, Imaging systems, Lithography, Semiconducting wafers, Transparency, Optical lithography, Vacuum ultraviolet, Phase measurement

Proceedings Article | 24 July 2002 Paper
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474187
KEYWORDS: Photoresist materials, Polymers, Absorbance, Semiconducting wafers, Spectroscopy, Transparency, Photomasks, Silicon, FT-IR spectroscopy, Optical lithography

Proceedings Article | 24 August 2001 Paper
Ralph Dammel, Raj Sakamuri, Andrew Romano, Richard Vicari, Cheryl Hacker, Will Conley, Daniel Miller
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436865
KEYWORDS: Polymers, Etching, Absorbance, Lithography, Dry etching, Photoresist materials, Fluorine, Absorption, Transparency, Photomasks

Showing 5 of 13 publications
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