Dr. Kevin D. Cummings
Sr. Manager, Electron Optics at KLA Corp
SPIE Involvement:
Author
Publications (39)

Proceedings Article | 6 April 2015 Paper
Proceedings Volume 9422, 94221E (2015) https://doi.org/10.1117/12.2085945
KEYWORDS: Extreme ultraviolet, Inspection, Phase contrast, Photomasks, Extreme ultraviolet lithography, Defect inspection, Computer simulations, Infrared imaging, Phase shift keying, Defect detection

Proceedings Article | 6 April 2015 Paper
Proceedings Volume 9422, 94221B (2015) https://doi.org/10.1117/12.2176126
KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Extreme ultraviolet lithography, Silica, Deposition processes, Standards development, Manufacturing, Ruthenium, Reflectivity

Proceedings Article | 20 March 2015 Paper
Proceedings Volume 9425, 942526 (2015) https://doi.org/10.1117/12.2086982
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Etching, Photoresist processing, Line width roughness, Photoresist materials, Lithography, Optical lithography, Critical dimension metrology, Double patterning technology

Proceedings Article | 16 March 2015 Paper
Proceedings Volume 9422, 94220L (2015) https://doi.org/10.1117/12.2086307
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Absorbance, Chemically amplified resists, Line width roughness, Electrons, Photons, Molecules, Photoresist materials, Metals

Proceedings Article | 16 March 2015 Paper
Proceedings Volume 9422, 942211 (2015) https://doi.org/10.1117/12.2087424
KEYWORDS: Extreme ultraviolet, Contamination, Extreme ultraviolet lithography, Chemically amplified resists, Line edge roughness, Semiconducting wafers, Line width roughness, Reflectivity, Hydrogen, Critical dimension metrology

Showing 5 of 39 publications
Conference Committee Involvement (5)
Extreme Ultraviolet (EUV) Lithography III
13 February 2012 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography II
28 February 2011 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography
22 February 2010 | San Jose, California, United States
Alternative Lithographic Technologies
24 February 2009 | San Jose, California, United States
Photomask Technology
9 September 2003 | Monterey, California, United States
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