Kuniharu Nagashima
at Toshiba Materials Co Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 2 April 2014 Paper
Proceedings Volume 9050, 905034 (2014) https://doi.org/10.1117/12.2048759
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Calibration, Optical testing, Image processing, Metrology, Scatterometry, Image analysis, Data processing, Polarizers

Proceedings Article | 2 April 2010 Paper
Proceedings Volume 7638, 76380E (2010) https://doi.org/10.1117/12.846336
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Wafer-level optics, Birefringence, Reflectivity, Photoresist materials, Polarization, Objectives, Astronomical imaging, Semiconductors

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