Dr. Martin Glodde Profile

Dr. Martin Glodde

Researcher at IBM Thomas J Watson Research Ctr

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Author

Publications (15)

Proceedings Article | 17 May 2019 Presentation + Paper

Monolithically integrated silicon photonic chip sensor for near-infrared trace-gas spectroscopy

Eric Zhang, Yves Martin, Jason Orcutt, Chi Xiong, Martin Glodde, Nathan Marchack, Elizabeth Duch, Tymon Barwicz, Laurent Schares, William M. Green

Proceedings Volume 11010, 110100B (2019) https://doi.org/10.1117/12.2519206

KEYWORDS: Sensors, Waveguides, Photonic integrated circuits, Spectroscopy, Silicon, Semiconductor lasers, Silicon photonics, Integrated photonics, Sensor networks, Fabry–Perot interferometers

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Proceedings Article | 4 March 2019 Paper

Silicon photonic integrated circuit for on-chip spectroscopic gas sensing

Chi Xiong, Yves Martin, Eric Zhang, Jason Orcutt, Martin Glodde, Laurent Schares, Tymon Barwicz, Chu Teng, Gerard Wysocki, William M. Green

Proceedings Volume 10923, 109230G (2019) https://doi.org/10.1117/12.2511793

KEYWORDS: Waveguides, Sensors, Methane, Silicon photonics, Silicon, Spectroscopy, Absorption, Photodetectors, Tunable lasers

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Proceedings Article | 28 March 2018 Paper

The integration of 193i and DSA for BEOL metal cuts/blocks targeting sub-20nm tip-to-tip CD

Chi-Chun Liu, Yann Mignot, Cheng Chi, Richard Farrell, Kafai Lai, Jing Guo, Jing Sha, Martin Glodde, Makoto Muramatsu, Yasuyuki Ido, Nelson Felix, David Hetzer, Andrew Metz, Daniel Corliss

Proceedings Volume 10584, 105840L (2018) https://doi.org/10.1117/12.2297365

KEYWORDS: Etching, Critical dimension metrology, Metals, Directed self assembly, Oxides, Back end of line, Dielectrics, Scanning electron microscopy, Tin, Lithography

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Proceedings Article | 27 March 2017 Presentation + Paper

Unexpected impact of RIE gases on lithographic films

M. Glodde, R. Bruce, M. J. Hopstaken, M. Saccomanno, N. Felix, K. Petrillo, B. Price

Proceedings Volume 10146, 101460J (2017) https://doi.org/10.1117/12.2258012

KEYWORDS: Reactive ion etching, Semiconducting wafers, Polymers, Carbon

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Proceedings Article | 27 March 2017 Paper

Fundamentals of EUV resist-inorganic hardmask interactions

Dario Goldfarb, Martin Glodde, Anuja De Silva, Indira Sheshadri, Nelson Felix, Krystelle Lionti, Teddie Magbitang

Proceedings Volume 10146, 1014607 (2017) https://doi.org/10.1117/12.2257933

KEYWORDS: Extreme ultraviolet, Etching, Image resolution, Line width roughness, Interfaces, Semiconducting wafers, Materials processing, Photoresist processing, Silicon, Head-mounted displays, Extreme ultraviolet lithography, Systems modeling, Oxides

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Proceedings Article | 25 March 2016 Paper

Acid generation efficiency: EUV photons versus photoelectrons

Dario Goldfarb, Ali Afzali-Ardakani, Martin Glodde

Proceedings Volume 9779, 97790A (2016) https://doi.org/10.1117/12.2218457

KEYWORDS: Extreme ultraviolet, Photons, Quantum efficiency, Absorption, Extreme ultraviolet lithography, Semiconductor manufacturing, Chemically amplified resists, Image quality, Iodine, Hydrogen, Photoresist materials, Contamination, Deep ultraviolet

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Proceedings Article | 27 March 2014 Paper

Spin-on organic hardmask for topo-patterned substrate

Kazuhiko Komura, Yoshi Hishiro, Goji Wakamatsu, Yoshio Takimoto, Tomoki Nagai, Tooru Kimura, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Greg Breyta, Noel Arellano, Srinivasan Balakrishnan, Luisa Bozano, Ananthakrishnan Sankaranarayanan, Krishna Bajjuri, Daniel Sanders, Carl Larson, Anuja DeSilva, Martin Glodde

Proceedings Volume 9051, 905115 (2014) https://doi.org/10.1117/12.2046357

KEYWORDS: Fourier transforms, Chemical vapor deposition, Photoresist materials, Resistance, Carbon, Photomasks, Optical lithography, Lithography, Glasses

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Proceedings Article | 20 March 2012 Paper

Investigation of pattern wiggling for spin-on organic hardmask materials

Goji Wakamatsu, Kentaro Goto, Yoshi Hishiro, Taiichi Furukawa, Satoru Murakami, Masayuki Motonari, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Greg Breyta, Anuja DeSilva, Noel Arellano, Luisa Bozano, Carl Larson, Martin Glodde, Ratnam Sooriyakumaran

Proceedings Volume 8325, 83250T (2012) https://doi.org/10.1117/12.915698

KEYWORDS: Etching, Resistance, Hydrogen, Chemical vapor deposition, Fluorine, Fourier transforms, Optical lithography, Critical dimension metrology, Double patterning technology, Extreme ultraviolet

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Proceedings Article | 20 March 2012 Paper

Focus improvement with NIR absorbing underlayer attenuating substructure reflectivity

Wu-Song Huang, Dario Goldfarb, Wai-kin Li, Martin Glodde, Kazumi Noda, Seiichiro Tachibana, Masaki Ohashi, Dah-Chung Owe-Yang, Takeshi Kinsho

Proceedings Volume 8325, 83251A (2012) https://doi.org/10.1117/12.916240

KEYWORDS: Near infrared, Sensors, Semiconducting wafers, Reflectivity, Back end of line, Metals, Optical sensors, Polymers, Coating, Absorption

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Proceedings Article | 20 March 2012 Paper

Assessment of negative tone development challenges

Sohan Mehta, Yongan Xu, Guillaume Landie, Vikrant Chauhan, Sean Burns, Peggy Lawson, Bassem Hamieh, Jerome Wandell, Martin Glodde, Yu Yang Sun, Mark Kelling, Alan Thomas, Jeong Soo Kim, James Chen, Hirokazu Kato, Chiahsun Tseng, Chiew-Seng Koay, Yoshinori Matsui, Martin Burkhardt, Yunpeng Yin, David Horak, Shyng-Tsong Chen, Yann Mignot, Yannick Loquet, Matthew Colburn, John Arnold, Terry Spooner, Lior Huli, Dave Hetzer, Jason Cantone, Shinichiro Kawakami, Shannon Dunn

Proceedings Volume 8325, 832506 (2012) https://doi.org/10.1117/12.917560

KEYWORDS: Semiconducting wafers, Polymers, Optical proximity correction, Reactive ion etching, Etching, Scanning electron microscopy, Neodymium, Photoresist developing, Image processing, Roads

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Proceedings Article | 17 March 2012 Paper

Patterning of CMOS device structures for 40-80nm pitches and beyond

S. Engelmann, R. Martin, R. Bruce, H. Miyazoe, N. C. Fuller, W. Graham, E. Sikorski, M. Glodde, M. Brink, H. Tsai, J. Bucchignano, D. Klaus, E. Kratschmer, M. Guillorn

Proceedings Volume 8328, 83280B (2012) https://doi.org/10.1117/12.916447

KEYWORDS: Etching, Optical lithography, Plasma, Line edge roughness, Polymers, Silicon, Polymethylmethacrylate, Oxides, Vacuum ultraviolet, Lithography

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Proceedings Article | 16 April 2011 Paper

Performance of tri-layer process required for 22 nm and beyond

Yayi Wei, Martin Glodde, Hakeem Yusuff, Margaret Lawson, Sang Yil Chang, Kwang Sub Yoon, Chung-Hsi Wu, Mark Kelling

Proceedings Volume 7972, 79722L (2011) https://doi.org/10.1117/12.879301

KEYWORDS: System on a chip, Etching, Silicon, Dielectrics, Semiconducting wafers, Particles, Coating, Reflectivity, Plasma etching, Plasma

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Proceedings Article | 16 April 2011 Paper

Fundamental investigation of negative tone development (NTD) for the 22nm node (and beyond)

Guillaume Landie, Yongan Xu, Sean Burns, Kenji Yoshimoto, Martin Burkhardt, Larry Zhuang, Karen Petrillo, Jason Meiring, Dario Goldfarb, Martin Glodde, Anthony Scaduto, Matthew Colburn, Jason Desisto, Young Bae, Michael Reilly, Cecily Andes, Vaishali Vohra

Proceedings Volume 7972, 797206 (2011) https://doi.org/10.1117/12.882843

KEYWORDS: Photoresist developing, Photoresist materials, Polymers, Systems modeling, Semiconducting wafers, Optical lithography, Optical proximity correction, Photomasks, Etching, Nanoimprint lithography

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Proceedings Article | 16 April 2011 Paper

Systematic studies on reactive ion etch-induced deformations of organic underlayers

Martin Glodde, Sebastian Engelmann, Michael Guillorn, Sivananda Kanakasabapathy, Erin Mclellan, Chiew-Seng Koay, Yunpeng Yin, Muthumanickam Sankarapandian, John Arnold, Karen Petrillo, Markus Brink, Hiroyuki Miyazoe, E. Anuja de Silva, Hakeem Yusuff, Kwang-sub Yoon, Yayi Wei, Chung-hsi Wu, P. Rao Varanasi

Proceedings Volume 7972, 797216 (2011) https://doi.org/10.1117/12.879442

KEYWORDS: Reactive ion etching, Etching, Ions, Plasma, Hydrogen, Gases, Plasma etching, Silicon, Oxides, Electron beam lithography

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Proceedings Article | 26 March 2010 Paper

Design, synthesis, and characterization of fluorine-free PAGs for 193-nm lithography

Sen Liu, Martin Glodde, Pushkara Varanasi

Proceedings Volume 7639, 76390D (2010) https://doi.org/10.1117/12.846600

KEYWORDS: Lithography, Polymers, Photoresist materials, Semiconducting wafers, Fluorine, Silver, Scanning electron microscopy, Silicon films, NOx, Solids

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Showing 5 of 15 publications

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