Dr. Indira Seshadri Profile

Dr. Indira Seshadri

Research Scientist at IBM Thomas J Watson Research Ctr

SPIE Involvement:

Author

Area of Expertise:

Lithography , Materials , Semiconductors , DTCO , Device Patterning

Publications (23)

Proceedings Article | 10 April 2024 Presentation

Dry resist patterning development towards high-NA EUV lithography

Indira Seshadri

Proceedings Volume PC12953, PC129530L (2024) https://doi.org/10.1117/12.3012501

KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Stochastic processes, Photoresist processing, Metrology, Metals, Lithography, Back end of line

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Proceedings Article | 10 April 2024 Presentation + Paper

EUV patterned gate variation reduction in next generation transistor architectures

Gopal Sankar Kenath, Martin Burkhardt, Nikhil Jain, Anna Lin, Jennifer Church, Gen Tsutsui, Stephanie Reynoso, Xuan Liu, Chris Sheraw, Pietro Montanini, Eric Miller, Indira Seshadri, Luciana Meli, Nelson Felix

Proceedings Volume 12953, 1295305 (2024) https://doi.org/10.1117/12.3012023

KEYWORDS: Line width roughness, Light sources and illumination, Nanoimprint lithography, Optical lithography, Line edge roughness, Etching, Transistors, Extreme ultraviolet, Reactive ion etching, Extreme ultraviolet lithography

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Proceedings Article | 10 April 2024 Poster

Coater/developer-based patterning techniques to improve tight pitches towards high-NA EUV

Kanzo Kato, Lior Huli, Steven Grzeskowiak, Alexandra Krawicz, Eric Liu, Akiteru Ko, Satoru Shimura, Shinichiro Kawakami, Cong Dinh, Takahiro Kitano, Seiji Nagahara, Luciana Meli, Indira Seshadri, Martin Burkhardt, Karen Petrillo

Proceedings Volume PC12953, PC129530Y (2024) https://doi.org/10.1117/12.3010880

KEYWORDS: Yield improvement, Optical lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Etching, Lithography, Tin, Semiconductors, Integrated circuits, Inspection

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Proceedings Article | 28 November 2023 Presentation + Paper

Coater/developer-based patterning techniques to achieve tight pitches with 0.33 NA single exposure

Kanzo Kato, Seiji Nagahara, Lior Huli, Nathan Antonovich, David Hetzer, Steven Grzeskowiak, Alexandra Krawicz, Eric Liu, Nayoung Bae, Akiteru Ko, Satoru Shimura, Shinichiro Kawakami, Dinh Conque, Takahiro Kitano, Luciana Meli, Indira Seshadri, Martin Burkhardt, Karen Petrillo

Proceedings Volume PC12750, PC127500G (2023) https://doi.org/10.1117/12.2687901

KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Lithography, Semiconductors, Integrated circuits, Industry, Fiber optic illuminators, Fabrication, Etching

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Proceedings Article | 1 May 2023 Poster + Paper

Coater/developer-based techniques to achieve tight pitches towards high-NA EUV

Kanzo Kato, Lior Huli, Nathan Antonovich, David Hetzer, Steven Grzeskowiak, Eric Liu, Akiteru Ko, Satoru Shimura, Shinichiro Kawakami, Takahiro Kitano, Seiji Nagahara, Luciana Meli, Indira Seshadri, Martin Burkhardt, Karen Petrillo

Proceedings Volume 12498, 1249821 (2023) https://doi.org/10.1117/12.2657290

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Light sources and illumination, Etching, Coating thickness, Optical lithography, Printing, Lithography

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Proceedings Article | 27 April 2023 Presentation + Paper

Overlay performance in permanent bonded wafer integration schemes

Nathan Ip, Michael Belyansky, Christopher Netzband, Norifumi Kohama, Richard Johnson, Shobha Hosadurga, Jack Wong, John Arnold, Kisik Choi, Wai Kin Li, Indira Seshadri, Luciana Meli, Ilseok Son

Proceedings Volume 12496, 1249618 (2023) https://doi.org/10.1117/12.2654679

KEYWORDS: Wafer bonding, Semiconducting wafers, Distortion, Overlay metrology, Metrology, Scanners, Optical alignment, Silicon, Interfaces, Data modeling

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Proceedings Article | 13 June 2022 Presentation

Etch and patterning development for 2nm node nanosheet devices

Eric Miller, Indira Seshadri, Tsung-Sheng Kang, Dominik Metzler, Joe Lee, Stuart Sieg, Sebastian Engelmann, Jeff Shearer, John Arnold, Nelson Felix

Proceedings Volume PC12056, PC120560A (2022) https://doi.org/10.1117/12.2614316

KEYWORDS: Optical lithography, Etching, Plasma etching, Plasma, Nanotechnology, Extreme ultraviolet, Line width roughness, Ions, Fin field effect transistors, Extreme ultraviolet lithography

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Proceedings Article | 22 February 2021 Presentation

Nanosheet metrology opportunities for technology readiness

Mary Breton, Daniel Schmidt, Andrew Greene, Julien Frougier, Curtis Durfee, Indira Seshadri, Jennifer Church, Veeraraghavan Basker, Nelson Felix

Proceedings Volume 11611, 116111R (2021) https://doi.org/10.1117/12.2583636

KEYWORDS: Metrology, Line edge roughness, Gallium arsenide, Transistors, Semiconductors, Nondestructive evaluation, Nanotechnology, Manufacturing, Machine learning, Logic

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Proceedings Article | 22 February 2021 Presentation

Performance of stacked nanosheet gate all around FET’s with EUV patterned gate and sheets

Indira Seshadri, Jennifer Church, Prateek Hundekar, Mary Breton, Jingyun Zhang, Eric Miller, Andrew Greene, Julien Frougier, Chris Waskiewicz, Tao Li, Tsung-Sheng Kang, Daniel Dechene, Carl Radens, Stuart Sieg, Veeraraghavan Basker, Nelson Felix, Chris Mack

Proceedings Volume 11609, 116090S (2021) https://doi.org/10.1117/12.2583897

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Proceedings Article | 22 February 2021 Presentation

Quasi-atomic layer etching of Si and nitride hard mask with Cl2 based chemistry

Tao Li, Stefan Schmitz, Phil Friddle, Samantha Tan, Wenbing Yang, Indira Seshadri

Proceedings Volume 11615, 116150E (2021) https://doi.org/10.1117/12.2583647

KEYWORDS: Etching, Silicon, Ions, Chemistry, Control systems, Plasma, Optical lithography, Modulation, Manufacturing, Chlorine

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Proceedings Article | 25 March 2020 Presentation

A comparative analysis of EUV sheet and gate patterning for beyond 7nm gate all around stacked nanosheet FET’s (Conference Presentation)

Indira Seshadri, Praveen Joseph, Stuart Sieg, Tao Li, Wenyu Xu, Eric Miller, Dan Dechene, Andrew Greene, Carl Radens, Jingyun Zhang, Yann Mignot, Pietro Montanini, Mary Breton, Veeraraghavan Basker, Nelson Felix

Proceedings Volume 11328, 113280B (2020) https://doi.org/10.1117/12.2552159

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Proceedings Article | 9 April 2018 Presentation + Paper

Polymer brush as adhesion promoter for EUV patterning

Jing Guo, Anuja De Silva, Yann Mignot, Yongan Xu, Abraham Arceo de la Pena, Luciana Meli, Indira Seshadri, Dominik Metzler, Lovejeet Singh, Tsuyoshi Furukawa, Ramakrishnan Ayothi, Nelson Felix, Dan Corliss

Proceedings Volume 10586, 105860I (2018) https://doi.org/10.1117/12.2297113

KEYWORDS: Chemistry, Polymers, Printing, Etching, Optical lithography, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Dielectrics, Semiconducting wafers

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Proceedings Article | 16 October 2017 Presentation + Paper

Development of amorphous silicon based EUV hardmasks through physical vapor deposition

Anuja De Silva, Yann Mignot, Luciana Meli, Scott DeVries, Yongan Xu, Indira Seshadri, Nelson Felix, Wilson Zeng, Yong Cao, Khoi Phan, Huixiong Dai, Christopher Ngai, Michael Stolfi, Daniel Diehl

Proceedings Volume 10450, 104501A (2017) https://doi.org/10.1117/12.2280607

KEYWORDS: Amorphous silicon, Optical lithography, Etching, Photoresist materials, Silicon, Head-mounted displays, Silicon films, Chemical vapor deposition, Extreme ultraviolet, Physical vapor deposition

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SPIE Journal Paper | 28 August 2017

Ultrathin extreme ultraviolet patterning stack using polymer brush as an adhesion promotion layer

Indira Seshadri, Anuja De Silva, Luciana Meli, Chi-Chun Charlie Liu, Cheng Chi, Jing Guo, Hoa Truong, Kristin Schmidt, John Arnold, Nelson Felix, Lovejeet Singh, Tsuyoshi Furukawa, Ramakrishnan Ayothi, Angelique Raley, Richard Farrell

JM3, Vol. 16, Issue 03, 033506, (August 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.3.033506

KEYWORDS: Oxides, Polymers, Extreme ultraviolet, Optical lithography, Head-mounted displays, Etching, Atomic layer deposition, Chemistry, Plasma enhanced chemical vapor deposition, Printing

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SPIE Journal Paper | 23 May 2017

Development of TiO₂ containing hardmasks through plasma-enhanced atomic layer deposition

Anuja De Silva, Indira Seshadri, Kisup Chung, Abraham Arceo, Luciana Meli, Brock Mendoza, Yasir Sulehria, Yiping Yao, Madhana Sunder, Hoa Truong, Shravan Matham, Ruqiang Bao, Heng Wu, Nelson Felix, Sivananda Kanakasabapathy

JM3, Vol. 16, Issue 02, 023504, (May 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.2.023504

KEYWORDS: Titanium dioxide, Metals, Atomic layer deposition, Optical lithography, Etching, Dry etching, Contamination, Modulation, Wet etching, Lithography

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Proceedings Article | 28 March 2017 Paper

An OCD perspective of line edge and line width roughness metrology

Ravi Bonam, Raja Muthinti, Mary Breton, Chi-Chun Liu, Stuart Sieg, Indira Seshadri, Nicole Saulnier, Jeffrey Shearer, Raghuveer Patlolla, Huai Huang

Proceedings Volume 10145, 1014511 (2017) https://doi.org/10.1117/12.2258196

KEYWORDS: Line width roughness, Metrology, Edge roughness, Optical metrology, Process control, Line edge roughness, Semiconductors, Modeling, Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, Photomasks, 3D modeling, Extreme ultraviolet, Modulation

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Proceedings Article | 27 March 2017 Paper

DSA patterning options for logics and memory applications

Chi-Chun Liu, Elliott Franke, Yann Mignot, Scott LeFevre, Stuart Sieg, Cheng Chi, Luciana Meli, Doni Parnell, Kristin Schmidt, Martha Sanchez, Lovejeet Singh, Tsuyoshi Furukawa, Indira Seshadri, Ekmini Anuja De Silva, Hsinyu Tsai, Kafai Lai, Hoa Truong, Richard Farrell, Robert Bruce, Mark Somervell, Daniel Sanders, Nelson Felix, John Arnold, David Hetzer, Akiteru Ko, Andrew Metz, Matthew Colburn, Daniel Corliss

Proceedings Volume 10146, 1014603 (2017) https://doi.org/10.1117/12.2260479

KEYWORDS: Directed self assembly, Plasma etching, Optical lithography, Etching, Logic, Lithography, Manufacturing, Nanofabrication, Silicon, Metals, Extreme ultraviolet, Line edge roughness, Optical alignment, Critical dimension metrology

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Proceedings Article | 27 March 2017 Presentation + Paper

Development of TiO2 containing hardmasks through PEALD deposition

Anuja De Silva, Indira Seshadri, Kisup Chung, Abraham Arceo, Luciana Meli, Brock Mendoza, Yasir Sulehria, Yiping Yao, Madhana Sunder, Hao Truong, Shravan Matham, Ruqiang Bao, Heng Wu, Nelson Felix, Sivananda Kanakasabapathy

Proceedings Volume 10146, 1014615 (2017) https://doi.org/10.1117/12.2258380

KEYWORDS: Metals, Titanium, Lithography, Optical lithography, Dry etching, Etching, Photoresist materials, Titanium dioxide, Wet etching, Plasma, Carbon

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Proceedings Article | 27 March 2017 Paper

Fundamentals of EUV resist-inorganic hardmask interactions

Dario Goldfarb, Martin Glodde, Anuja De Silva, Indira Sheshadri, Nelson Felix, Krystelle Lionti, Teddie Magbitang

Proceedings Volume 10146, 1014607 (2017) https://doi.org/10.1117/12.2257933

KEYWORDS: Extreme ultraviolet, Etching, Image resolution, Line width roughness, Interfaces, Semiconducting wafers, Materials processing, Photoresist processing, Silicon, Head-mounted displays, Extreme ultraviolet lithography, Systems modeling, Oxides

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Proceedings Article | 24 March 2017 Paper

Comprehensive analysis of line-edge and line-width roughness for EUV lithography

Ravi Bonam, Chi-Chun Liu, Mary Breton, Stuart Sieg, Indira Seshadri, Nicole Saulnier, Jeffrey Shearer, Raja Muthinti, Raghuveer Patlolla, Huai Huang

Proceedings Volume 10143, 101431A (2017) https://doi.org/10.1117/12.2258194

KEYWORDS: Line width roughness, Edge roughness, Lithography, Extreme ultraviolet lithography, Line edge roughness, Metrology, Photomasks, Semiconducting wafers, Semiconductors, Optical imaging, Photoresist processing, Etching, Extreme ultraviolet, Modulation

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Proceedings Article | 24 March 2017 Presentation + Paper

Ultrathin EUV patterning stack using polymer brush as an adhesion promotion layer

Indira Seshadri, Anuja De Silva, Luciana Meli, Charlie Liu, Cheng Chi, Jing Guo, Kristin Schmidt, Hoa Truang, John Arnold, Nelson Felix, Lovejeet Singh, Tsuyoshi Furukawa, Ramakrishnan Ayothi, Angelique Raley, Richard Farrell

Proceedings Volume 10143, 101431D (2017) https://doi.org/10.1117/12.2258565

KEYWORDS: Extreme ultraviolet, Optical lithography, Polymers, Etching, Extreme ultraviolet lithography, Photoresist materials, Lithography, Photoresist processing, Back end of line, Oxides, Head-mounted displays, Atomic layer deposition, Chemistry

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Proceedings Article | 24 March 2017 Presentation + Paper

Single-expose patterning development for EUV lithography

Anuja De Silva, Karen Petrillo, Luciana Meli, Jeffrey Shearer, Genevieve Beique, Lei Sun, Indira Seshadri, Taehwan Oh, Seulgi Han, Nicole Saulnier, Joe Lee, John Arnold, Bassem Hamieh, Nelson Felix, Tsuyoshi Furukawa, Lovejeet Singh, Ramakrishnan Ayothi

Proceedings Volume 10143, 101431G (2017) https://doi.org/10.1117/12.2261216

KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Materials processing, Photoresist processing, Etching, Metals, Quantum efficiency, Photoresist materials, Interfaces, Silicon

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Proceedings Article | 18 March 2016 Paper

EUV patterning successes and frontiers

Nelson Felix, Dan Corliss, Karen Petrillo, Nicole Saulnier, Yongan Xu, Luciana Meli, Hao Tang, Anuja De Silva, Bassem Hamieh, Martin Burkhardt, Yann Mignot, Richard Johnson, Chris Robinson, Mary Breton, Indira Seshadri, Derren Dunn, Stuart Sieg, Eric Miller, Genevieve Beique, Andre Labonte, Lei Sun, Geng Han, Erik Verduijn, Eunshoo Han, Bong Cheol Kim, Jongsu Kim, Koichi Hontake, Lior Huli, Corey Lemley, Dave Hetzer, Shinichiro Kawakami, Koichi Matsunaga

Proceedings Volume 9776, 97761O (2016) https://doi.org/10.1117/12.2219894

KEYWORDS: Extreme ultraviolet, Optical lithography, Lithography, Extreme ultraviolet lithography, Oxides, Neodymium, Ions, Etching

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Showing 5 of 23 publications

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