Dr. Seong-Ho Moon Profile

Dr. Seong-Ho Moon

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 8 November 2012 Paper

The new test pattern selection method for OPC model calibration, based on the process of clustering in a hybrid space

Dmitry Vengertsev, Kihyun Kim, Seung-Hune Yang, Seongbo Shim, Seongho Moon, Artem Shamsuarov, Sooryong Lee, Seong-Woon Choi, Jungdal Choi, Ho-Kyu Kang

Proceedings Volume 8522, 85221A (2012) https://doi.org/10.1117/12.953827

KEYWORDS: Optical proximity correction, Calibration, Semiconducting wafers, Data modeling, Statistical modeling, Logic devices, Principal component analysis, Model-based design, Lithography, Optics manufacturing

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Proceedings Article | 3 April 2012 Paper

Optical performance comparison between negative tone development and positive tone development

Seung-Hune Yang, Eun Sung Kim, Seongho Moon, Sooryong Lee, Seong-Woon Choi, Jungdal Choi

Proceedings Volume 8325, 832504 (2012) https://doi.org/10.1117/12.915931

KEYWORDS: Photomasks, Binary data, Critical dimension metrology, Image quality, 3D acquisition, Image processing, Mathematical modeling, Image enhancement, Semiconducting wafers, 3D image processing

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Proceedings Article | 13 March 2012 Paper

Computational process optimization of array edges

Bernd Küchler, Artem Shamsuarov, Thomas Mülders, Ulrich Klostermann, Seung-Hune Yang, Seongho Moon, Vitaliy Domnenko, Sung-Woon Park

Proceedings Volume 8326, 83260H (2012) https://doi.org/10.1117/12.916528

KEYWORDS: SRAF, Source mask optimization, Tolerancing, Array processing, Photomasks, Printing, Optimization (mathematics), Manufacturing, Lithography, Optical proximity correction

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Proceedings Article | 5 April 2011 Paper

Physical simulation for verification and OPC on full chip level

Seongbo Shim, Seongho Moon, Youngchang Kim, Seongwoon Choi, Younghee Kim, Bernd Küchler, Ulrich Klostermann, Munhoe Do, Sooryoung Lee

Proceedings Volume 7973, 79732I (2011) https://doi.org/10.1117/12.879577

KEYWORDS: Optical proximity correction, Lithography, Signal processing, Image quality, Nanoimprint lithography, Photomasks, Calibration, System on a chip, Data modeling, Computer simulations

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Proceedings Article | 23 March 2011 Paper

Fine calibration of physical resist models: the importance of Jones pupil, laser bandwidth, mask error and CD metrology for accurate modeling at advanced lithographic nodes

Seongho Moon, Seunghune Yang, Artem Shamsuarov, Eunju Kim, Junghoon Ser, Youngchang Kim, Seongwoon Choi, Changjin Kang, Ulrich Klostermann, Bernd Küchler, John Lewellen, Thomas Schmöller, Sooryong Lee

Proceedings Volume 7973, 79730X (2011) https://doi.org/10.1117/12.879592

KEYWORDS: Calibration, Photomasks, Scanning electron microscopy, Cadmium, Metrology, Data modeling, Critical dimension metrology, 3D modeling, Optical proximity correction, Laser metrology

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Proceedings Article | 25 September 2010 Paper

New method to determine process window considering pattern failure

Seung-Hune Yang, Seongho Moon, Junghoon Ser, Young-Chang Kim, Sung-Woon Choi, Chang-Jin Kang

Proceedings Volume 7823, 78230H (2010) https://doi.org/10.1117/12.864301

KEYWORDS: Bridges, Failure analysis, Critical dimension metrology, Semiconducting wafers, Image processing, Lithography, Image analysis, Optical inspection, Remote sensing, Line edge roughness

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Showing 5 of 6 publications

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