Dr. Toshihiko P. Tanaka
Group Leader at Semiconductor Leading Edge Technologies Inc
SPIE Involvement:
Author
Publications (51)

Proceedings Article | 14 October 2011 Paper
Proceedings Volume 8166, 81660G (2011) https://doi.org/10.1117/12.898898
KEYWORDS: Inspection, Photomasks, Defect detection, Multilayers, Extreme ultraviolet lithography, Imaging systems, Transmission electron microscopy, Semiconducting wafers, Light scattering, Atomic force microscopy

SPIE Journal Paper | 1 October 2011
JM3, Vol. 10, Issue 04, 043006, (October 2011) https://doi.org/10.1117/12.10.1117/1.3644984
KEYWORDS: Photomasks, Inspection, Defect detection, Extreme ultraviolet, Wafer inspection, Semiconducting wafers, Defect inspection, Extreme ultraviolet lithography, Printing, Multilayers

Proceedings Article | 20 April 2011 Paper
Proceedings Volume 7971, 797123 (2011) https://doi.org/10.1117/12.879346
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Defect detection, Extreme ultraviolet, Wafer inspection, Defect inspection, Line width roughness, Image processing, Signal to noise ratio

Proceedings Article | 7 April 2011 Paper
Proceedings Volume 7969, 79691J (2011) https://doi.org/10.1117/12.878672
KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Extreme ultraviolet lithography, Logic, Photomasks, Optical proximity correction, Model-based design, Lithography, Point spread functions, Electronic design automation

Proceedings Article | 6 April 2011 Paper
Proceedings Volume 7969, 79690V (2011) https://doi.org/10.1117/12.879398
KEYWORDS: Inspection, Photomasks, Defect detection, Critical dimension metrology, Signal detection, Extreme ultraviolet lithography, Semiconducting wafers, Printing, Extreme ultraviolet, Cameras

SPIE Journal Paper | 1 April 2011
JM3, Vol. 10, Issue 02, 023001, (April 2011) https://doi.org/10.1117/12.10.1117/1.3574117
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Multilayers, Reflectivity, Deep ultraviolet, Lithography, Semiconducting wafers, Reticles, Visible radiation

Proceedings Article | 29 March 2011 Paper
Proceedings Volume 7969, 79690J (2011) https://doi.org/10.1117/12.879551
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Wafer inspection, Defect detection, Extreme ultraviolet, Printing, Scanning electron microscopy, Multilayers, Extreme ultraviolet lithography

SPIE Journal Paper | 1 October 2010
JM3, Vol. 9, Issue 04, 041204, (October 2010) https://doi.org/10.1117/12.10.1117/1.3494618
KEYWORDS: Photomasks, Line width roughness, Image processing, Scanning electron microscopy, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Photoresist processing, Semiconducting wafers, Tolerancing

Proceedings Article | 29 September 2010 Paper
Proceedings Volume 7823, 78231U (2010) https://doi.org/10.1117/12.864305
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Extreme ultraviolet lithography, Defect detection, Particles, Extreme ultraviolet, Scanning electron microscopy, Lithography, Printing

Proceedings Article | 29 September 2010 Paper
Proceedings Volume 7823, 78231V (2010) https://doi.org/10.1117/12.864290
KEYWORDS: Inspection, CCD cameras, Cameras, Imaging systems, Signal detection, Defect detection, Critical dimension metrology, Multilayers, Interference (communication), Defect inspection

Proceedings Article | 27 May 2010 Paper
Proceedings Volume 7748, 774826 (2010) https://doi.org/10.1117/12.867911
KEYWORDS: Model-based design, Optical proximity correction, Critical dimension metrology, Photomasks, Lithography, Extreme ultraviolet lithography, 3D modeling, Semiconducting wafers, Modulation, Data modeling

Proceedings Article | 27 May 2010 Paper
Proceedings Volume 7748, 774805 (2010) https://doi.org/10.1117/12.867774
KEYWORDS: Photomasks, Reflectivity, Extreme ultraviolet lithography, Multilayers, Extreme ultraviolet, Lithography, Semiconducting wafers, Coating, Reticles, Deep ultraviolet

Proceedings Article | 26 May 2010 Paper
Proceedings Volume 7748, 774803 (2010) https://doi.org/10.1117/12.867979
KEYWORDS: Photomasks, Inspection, Critical dimension metrology, Signal detection, Defect detection, Extreme ultraviolet lithography, Imaging systems, Atomic force microscopy, Semiconducting wafers, Multilayers

SPIE Journal Paper | 1 April 2010
JM3, Vol. 9, Issue 02, 023005, (April 2010) https://doi.org/10.1117/12.10.1117/1.3378154
KEYWORDS: Photomasks, Etching, Extreme ultraviolet lithography, Image processing, Multilayers, Photoresist processing, Photovoltaics, Lithography, Extreme ultraviolet, Coating

Proceedings Article | 23 March 2010 Paper
Proceedings Volume 7636, 76361N (2010) https://doi.org/10.1117/12.846325
KEYWORDS: Extreme ultraviolet lithography, Critical dimension metrology, Optical proximity correction, Semiconducting wafers, Photomasks, Etching, Photoresist processing, Overlay metrology, Lithography, Scanning electron microscopy

Proceedings Article | 20 March 2010 Paper
Proceedings Volume 7636, 763618 (2010) https://doi.org/10.1117/12.846487
KEYWORDS: Optical proximity correction, Model-based design, Point spread functions, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Lithography, Space mirrors

Proceedings Article | 20 March 2010 Paper
Proceedings Volume 7636, 76360L (2010) https://doi.org/10.1117/12.846347
KEYWORDS: Photomasks, Line width roughness, Scanning electron microscopy, Extreme ultraviolet lithography, Image processing, Lithography, Extreme ultraviolet, Opacity, Semiconducting wafers, Line edge roughness

Proceedings Article | 18 March 2010 Paper
Proceedings Volume 7636, 763602 (2010) https://doi.org/10.1117/12.846678
KEYWORDS: Inspection, Photomasks, Defect detection, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Multilayers, EUV optics, Phase shifts, Bridges

SPIE Journal Paper | 1 October 2009
JM3, Vol. 8, Issue 04, 041508, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238542
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Point spread functions, Semiconducting wafers, Lithography, Photoresist processing, Semiconductors, Projection systems, Tungsten

Proceedings Article | 30 September 2009 Paper
Proceedings Volume 7488, 74881B (2009) https://doi.org/10.1117/12.829724
KEYWORDS: Inspection, Defect detection, Extreme ultraviolet lithography, Imaging systems, Signal detection, Photomasks, Defect inspection, Charge-coupled devices, Multilayers, Detection and tracking algorithms

Proceedings Article | 30 September 2009 Paper
Proceedings Volume 7488, 748818 (2009) https://doi.org/10.1117/12.829873
KEYWORDS: Photomasks, Etching, Image processing, Extreme ultraviolet lithography, Multilayers, Photoresist processing, Scanners, Coating, Optical lithography, Lithography

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73790H (2009) https://doi.org/10.1117/12.824258
KEYWORDS: Inspection, Defect detection, Photomasks, Particles, Imaging systems, Atomic force microscopy, Scanning electron microscopy, Extreme ultraviolet lithography, Defect inspection, Multilayers

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 727145 (2009) https://doi.org/10.1117/12.814187
KEYWORDS: Point spread functions, Extreme ultraviolet lithography, Electronic design automation, Tolerancing, Optimization (mathematics), Lithography, Convolution, Visualization, Fractal analysis, Extreme ultraviolet

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 72713I (2009) https://doi.org/10.1117/12.813653
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Opacity, Extreme ultraviolet, Lithography, Scanning electron microscopy, Image analysis, Computer simulations, Manufacturing

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 72713H (2009) https://doi.org/10.1117/12.813595
KEYWORDS: Inspection, Signal to noise ratio, Imaging systems, Defect detection, Image quality, Photomasks, Charge-coupled devices, Mirrors, Extreme ultraviolet lithography, EUV optics

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 727120 (2009) https://doi.org/10.1117/12.813484
KEYWORDS: Photomasks, Critical dimension metrology, Extreme ultraviolet lithography, Point spread functions, Semiconducting wafers, Logic, Lithography, Electronic design automation, Projection systems, Mask making

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 727122 (2009) https://doi.org/10.1117/12.813602
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Mirrors, EUV optics, Light sources, Charge-coupled devices, Defect detection, Multilayers, Defect inspection

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 71222D (2008) https://doi.org/10.1117/12.801420
KEYWORDS: Inspection, Mirrors, Imaging systems, Point spread functions, Light scattering, Surface roughness, Photomasks, Extreme ultraviolet lithography, Defect detection, Multilayers

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 712227 (2008) https://doi.org/10.1117/12.801576
KEYWORDS: Photomasks, Etching, Reflectivity, Extreme ultraviolet lithography, Multilayers, Photoresist processing, Coating, Extreme ultraviolet, Lawrencium, Lithography

Proceedings Article | 19 May 2008 Paper
Proceedings Volume 7028, 70281R (2008) https://doi.org/10.1117/12.793069
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Electroluminescence, Reflectivity, Lithography, Line width roughness, Refractive index, Silicon, Binary data, Molybdenum

Proceedings Article | 19 May 2008 Paper
Proceedings Volume 7028, 70281S (2008) https://doi.org/10.1117/12.793070
KEYWORDS: Mirrors, Surface roughness, Photomasks, Inspection, Point spread functions, Light scattering, Spatial frequencies, Extreme ultraviolet lithography, Defect inspection, Charge-coupled devices

Proceedings Article | 21 March 2008 Paper
Proceedings Volume 6921, 69213H (2008) https://doi.org/10.1117/12.771857
KEYWORDS: Critical dimension metrology, Photomasks, Extreme ultraviolet lithography, Floods, Mirrors, Lithography, Projection systems, Semiconducting wafers, 3D modeling, Error analysis

Proceedings Article | 20 March 2008 Paper
Proceedings Volume 6921, 692102 (2008) https://doi.org/10.1117/12.772625
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Inspection, Particles, Defect inspection, Line width roughness, Contamination control, Reliability

Proceedings Article | 16 November 2007 Paper
Proceedings Volume 6730, 673017 (2007) https://doi.org/10.1117/12.746550
KEYWORDS: Photomasks, Reflectivity, Extreme ultraviolet lithography, Electroluminescence, Tantalum, Extreme ultraviolet, Lithography, Germanium, Chromium, Refractive index

Proceedings Article | 30 October 2007 Paper
Nobuyuki Iriki, Yukiyasu Arisawa, Hajime Aoyama, Toshihiko Tanaka
Proceedings Volume 6730, 67305K (2007) https://doi.org/10.1117/12.746592
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Diffusion, Semiconducting wafers, Waveguides, Critical dimension metrology, Optical lithography, Lithography, Tolerancing, 3D modeling

Proceedings Article | 14 May 2007 Paper
Proceedings Volume 6607, 66070K (2007) https://doi.org/10.1117/12.728934
KEYWORDS: Inspection, Smoothing, Extreme ultraviolet, Multilayers, Defect inspection, EUV optics, Phase shifts, Photomasks, Extreme ultraviolet lithography, Electromagnetic simulation

Proceedings Article | 16 March 2007 Paper
Nobuyuki Iriki, Hajime Aoyama, Toshihiko Tanaka
Proceedings Volume 6517, 65172K (2007) https://doi.org/10.1117/12.711288
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Finite-difference time-domain method, Waveguides, Lithography, Diffusion, Computer simulations, Silicon

Proceedings Article | 15 March 2007 Paper
Toshihiko Tanaka, Tsuneo Terasawa, Nobuyuki Iriki, Hajime Aoyama, Toshihisa Tomie
Proceedings Volume 6517, 65171Y (2007) https://doi.org/10.1117/12.711263
KEYWORDS: Inspection, Signal detection, Photomasks, Extreme ultraviolet, Reflectivity, Critical dimension metrology, Extreme ultraviolet lithography, Defect inspection, Mirrors, Multilayers

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6152, 61523U (2006) https://doi.org/10.1117/12.655154
KEYWORDS: Signal detection, Inspection, Extreme ultraviolet, Mirrors, Defect detection, Light sources, Scattering, Charge-coupled devices, Photomasks, Interference (communication)

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6152, 615226 (2006) https://doi.org/10.1117/12.654730
KEYWORDS: Deep ultraviolet, Semiconducting wafers, Ultraviolet radiation, Reflectivity, Inspection, Wafer-level optics, Defect inspection, Imaging systems, Defect detection, Image analysis

Proceedings Article | 23 March 2006 Paper
Proceedings Volume 6151, 61511U (2006) https://doi.org/10.1117/12.655078
KEYWORDS: Charge-coupled devices, Point spread functions, Inspection, CCD image sensors, Clocks, Extreme ultraviolet lithography, Iron, Extreme ultraviolet, Photomasks, X-rays

Proceedings Article | 9 November 2005 Paper
Tetsuaki Matsunawa, Hirokazu Nosato, Hidenori Sakanashi, Masahiro Murakawa, Nobuharu Murata, Tsuneo Terasawa, Toshihiko Tanaka, Nobuyuki Yoshioka, Osamu Suga, Tetsuya Higuchi
Proceedings Volume 5992, 599254 (2005) https://doi.org/10.1117/12.632041
KEYWORDS: Optical proximity correction, Genetic algorithms, Photomasks, Model-based design, Genetics, Optimization (mathematics), Semiconductors, Semiconducting wafers, Wafer-level optics, Computer simulations

Proceedings Article | 12 June 2003 Paper
Takashi Hattori, Yoshiyuki Yokoyama, Kaori Kimura, Ryoko Yamanaka, Toshihiko Tanaka, Hiroshi Fukuda
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485203
KEYWORDS: Polymers, Lithography, Phase shifts, Carbon, Etching, Polymer thin films, Photomasks, Distortion, Transparency, Polymerization

Proceedings Article | 24 August 2001 Paper
Yoshiyuki Yokoyama, Takashi Hattori, Kaori Kimura, Toshihiko Tanaka, Hiroshi Shiraishi
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436901
KEYWORDS: Polymers, Lithography, Phase shifts, Photomasks, Distortion, Scanning electron microscopy, Photography, Phase shifting, Silicon, Semiconducting wafers

Proceedings Article | 23 June 2000 Paper
Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388262
KEYWORDS: Polymers, Silicon, Lithography, Semiconducting wafers, Diamond, Polymer thin films, Photoresist processing, Polymethylmethacrylate, Excimer lasers, Polymerization

Proceedings Article | 11 June 1999 Paper
Ryoko Yamanaka, Takashi Hattori, Toshiyuki Mine, Keiko Hattori, Toshihiko Tanaka, Tsuneo Terasawa
Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350202
KEYWORDS: Silicon, Photoemission spectroscopy, Lithography, Chemical vapor deposition, Deep ultraviolet, Reflectance spectroscopy, Spectroscopy, Oxides, Polymers, Chemical species

SPIE Journal Paper | 1 October 1996
Akira Imai, Tsuneo Terasawa, Norio Hasegawa, Naoko Asai, Toshihiko Tanaka, Shinji Okazaki
OE, Vol. 35, Issue 10, (October 1996) https://doi.org/10.1117/12.10.1117/1.600980
KEYWORDS: Photomasks, Excimer lasers, Chromium, Lithography, Phase measurement, Phase shifts, Scanning electron microscopy, Optics manufacturing, Semiconducting wafers, Semiconductors

Proceedings Article | 14 June 1996 Paper
Shou-ichi Uchino, Takumi Ueno, Sonoko Migitaka, Jiro Yamamoto, Toshihiko Tanaka, Fumio Murai, Hiroshi Shiraishi, Michiaki Hashimoto
Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241842
KEYWORDS: Lithography, Optical lithography, Scanning electron microscopy, Industrial chemicals, Diffusion, Ultraviolet radiation, Absorption, Photography, Analytical research, Photomasks

Proceedings Article | 7 June 1996 Paper
Toshihiko Tanaka, Naoko Asai, Shou-ichi Uchino
Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240926
KEYWORDS: Antireflective coatings, Reflectivity, Reflection, Critical dimension metrology, Refractive index, Optical lithography, Absorption, Excimer lasers, Lithography, Silicon

Proceedings Article | 3 July 1995 Paper
Akira Imai, Tsuneo Terasawa, Norio Hasegawa, Naoko Asai, Toshihiko Tanaka, Shinji Okazaki
Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212800
KEYWORDS: Photomasks, Excimer lasers, Chromium, Phase measurement, Lithography, Optical simulations, Phase shifts, Scanning electron microscopy, Optical lithography, Device simulation

Proceedings Article | 1 July 1991 Paper
Tsuneo Terasawa, Norio Hasegawa, Akira Imai, Toshihiko Tanaka, Souichi Katagiri
Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44782
KEYWORDS: Photomasks, Phase shifts, Phase shifting, Monochromatic aberrations, Optical lithography, Image quality, Scanning electron microscopy, Wavefronts, Photomicroscopy, Analytical research

Showing 5 of 51 publications
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