Mr. Kosuke Takai Profile

Kosuke Takai

at KIOXIA Corp

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 23 August 2021 Paper

Self-aligned double patterning process for sub-15nm nanoimprint template fabrication

Yoshinori Kagawa, Machiko Suenaga, Hikaru Sasaki, Koji Murano, Shunko Magoshi, Ryu Komatsu, Kosuke Takai, Mitsuru Kondo, Hideaki Sakurai, Shingo Kanamitsu

Proceedings Volume 11908, 119080D (2021) https://doi.org/10.1117/12.2603907

KEYWORDS: Forward error correction, Critical dimension metrology, Nanoimprint lithography, Double patterning technology, Lithography, Scanning electron microscopy, Nanolithography, Image processing, Semiconducting wafers, Etching

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Proceedings Article | 29 September 2019 Presentation + Paper

Capability of DUV inspection for the LWR improved EUV mask of sub-15 nm hp on wafer

Masato Naka, Keisuke Chiba, Ai Kumada, Keiko Morishita, Kosuke Takai, Ryoji Yoshikawa, Yukiyasu Arisawa, Takashi Kamo, Eishi Shiobara, Shingo Kanamitsu

Proceedings Volume 11148, 111480X (2019) https://doi.org/10.1117/12.2536474

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Line width roughness, Signal to noise ratio, Deep ultraviolet, Scanning electron microscopy, Critical dimension metrology, Extreme ultraviolet lithography

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Proceedings Article | 29 September 2019 Presentation + Paper

Novel cleaning technology for nanoparticle removal

Mana Tanabe, Kosuke Takai, Kyo Otsubo, Kaori Umezawa, Minako Iinuma, Hideaki Sakurai, Shingo Kanamitsu

Proceedings Volume 11148, 111480N (2019) https://doi.org/10.1117/12.2536471

KEYWORDS: Particles, Photomasks, Nanoparticles, Liquids, Nanotechnology, Inspection, Lithography, Optical lithography

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Proceedings Article | 12 June 2018 Paper

Fabrication of Ta based absorber EUV mask with SRAF

Keiko Morishita, Kosuke Takai, Kenji Masui, Takashi Kamo, Tsukasa Abe, Yasutaka Morikawa, Naoya Hayashi

Proceedings Volume 10807, 108070F (2018) https://doi.org/10.1117/12.2503150

KEYWORDS: Photomasks, Line width roughness, Extreme ultraviolet, SRAF, Extreme ultraviolet lithography, Tantalum, Scanning electron microscopy, Chromium

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Proceedings Article | 10 May 2016 Paper

Etched multilayer EUV mask fabrication for sub-60nm pattern based on effective mirror width

Noriko Iida, Kosuke Takai, Takashi Kamo, Yasutaka Morikawa, Naoya Hayashi

Proceedings Volume 9984, 99840E (2016) https://doi.org/10.1117/12.2242872

KEYWORDS: Extreme ultraviolet, Mirrors, Extreme ultraviolet lithography, Photomasks, Multilayers, Transmission electron microscopy, Image processing, Photoresist processing, Scanning electron microscopy, Radon

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Proceedings Article | 23 October 2015 Paper

Process capability of etched multilayer EUV mask

Kosuke Takai, Noriko Iida nee Sakurai, Takashi Kamo, Yasutaka Morikawa, Naoya Hayashi

Proceedings Volume 9635, 96351C (2015) https://doi.org/10.1117/12.2197686

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Mask cleaning, Multilayers, Transmission electron microscopy, Image processing, Reflectivity, Inspection, Particles, Neodymium

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Proceedings Article | 16 September 2014 Paper

Capability of etched multilayer EUV mask fabrication

Kosuke Takai, Koji Murano, Takashi Kamo, Yasutaka Morikawa, Naoya Hayashi

Proceedings Volume 9235, 923515 (2014) https://doi.org/10.1117/12.2067892

KEYWORDS: Photomasks, Extreme ultraviolet, Lithography, Reflectivity, Scanning electron microscopy, Extreme ultraviolet lithography, Mask making, Projection systems, Ultraviolet radiation, Binary data

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Proceedings Article | 1 October 2013 Paper

Patterning of EUVL binary etched multilayer mask

Kosuke Takai, Takeharu Motokawa, Koji Murano, Takashi Kamo, Naoya Hayashi

Proceedings Volume 8880, 88802M (2013) https://doi.org/10.1117/12.2033258

KEYWORDS: Photomasks, Etching, Extreme ultraviolet lithography, Binary data, Ruthenium, Tantalum, Lithography, Optical lithography, Photoresist processing, Wafer-level optics

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Proceedings Article | 2 August 2013 Paper

Improvement of EUVL mask structure with black border of etched multilayer

Kosuke Takai, Koji Murano, Eiji Yamanaka, Shinji Yamaguchi, Masato Naka, Takashi Kamo, Naoya Hayashi

Proceedings Volume 8701, 87010Y (2013) https://doi.org/10.1117/12.2031582

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Inspection, Extreme ultraviolet, Bridges, Deep ultraviolet, Reflectivity, Lithography, Scanning electron microscopy, Ruthenium

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Proceedings Article | 25 September 2010 Paper

High performance photomask technology with the advanced binary film

Koji Murano, Kosuke Takai, Kunihiro Ugajin, Machiko Suenaga, Takeharu Motokawa, Masato Saito, Tomotaka Higaki, Osamu Ikenaga, Hidehiro Watanabe

Proceedings Volume 7823, 78232W (2010) https://doi.org/10.1117/12.866015

KEYWORDS: Photomasks, Critical dimension metrology, Etching, Chromium, Lithography, Binary data, Photomask technology, Thin films, Photoresist processing, Inspection

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Proceedings Article | 23 March 2010 Paper

Process liability evaluation for beyond 22nm node using EUVL

Kazuo Tawarayama, Hajime Aoyama, Kentaro Matsunaga, Yukiyasu Arisawa, Taiga Uno, Shunko Magoshi, Suigen Kyoh, Yumi Nakajima, Ryoichi Inanami, Satoshi Tanaka, Ayumi Kobiki, Yukiko Kikuchi, Daisuke Kawamura, Kosuke Takai, Koji Murano, Yumi Hayashi, Ichiro Mori

Proceedings Volume 7636, 76361O (2010) https://doi.org/10.1117/12.846265

KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Manufacturing, Lithography, Etching, Extreme ultraviolet, Photoresist processing, Reactive ion etching, Silica, Metals

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SPIE Journal Paper | 1 October 2009

Process liability evaluation for extreme ultraviolet lithography

Hajime Aoyama, Kazuo Tawarayama, Yuusuke Tanaka, Daisuke Kawamura, Yukiyasu Arisawa, Taiga Uno, Takashi Kamo, Toshihiko Tanaka, Toshiro Itani, Hiroyuki Tanaka, Yumi Nakajima, Ryoichi Inanami, Kosuke Takai, Koji Murano, Takeshi Koshiba, Kohji Hashimoto, Ichiro Mori

JM3, Vol. 8, Issue 04, 041508, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238542

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Point spread functions, Semiconducting wafers, Lithography, Photoresist processing, Semiconductors, Projection systems, Tungsten

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Proceedings Article | 11 May 2009 Paper

Study of CD variation at EUV mask fabrication occurred by electric conduction from top to back side

Kosuke Takai, Koji Murano, Kazuki Hagihara, Masamitsu Itoh, Tsukasa Abe, Takashi Adachi, Hideo Akizuki, Tadahiko Takikawa, Hiroshi Mohri, Naoya Hayashi

Proceedings Volume 7379, 73792I (2009) https://doi.org/10.1117/12.824332

KEYWORDS: Photomasks, Extreme ultraviolet, Etching, Coating, Extreme ultraviolet lithography, Mask making, Conductive coatings, Critical dimension metrology, Photoresist processing, Ions

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Proceedings Article | 18 March 2009 Paper

Process liability evaluation for EUVL

Proceedings Volume 7271, 727120 (2009) https://doi.org/10.1117/12.813484

KEYWORDS: Photomasks, Critical dimension metrology, Extreme ultraviolet lithography, Point spread functions, Semiconducting wafers, Logic, Lithography, Electronic design automation, Projection systems, Mask making

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Showing 5 of 14 publications

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