Dr. Younjin Cho
at Samsung SDI Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 27 March 2014 Paper
Jin Hee Bae, Kwen Woo Han, Eun Su Park, Hui Chan Yoon, Yoong Hee Na, Jin Woo Seo, Wan Hee Lim, Bo Sun Kim, Jun Young Jang, Younjin Cho
Proceedings Volume 9051, 90511R (2014) https://doi.org/10.1117/12.2046098
KEYWORDS: Dielectrics, Silicon, Silica, Oxides, Semiconductors, Etching, Resistance, Manufacturing, Polymers, Plasma

Proceedings Article | 16 April 2011 Paper
Xinyu Gu, Younjin Cho, Takanori Kawakami, Yuji Hagiwara, Brandon Rawlings, Ryan Mesch, Toshiyuki Ogata, Taeho Kim, Takehiro Seshimo, Wade Wang, Arun Sundaresan, Nicholas Turro, Roel Gronheid, James Blackwell, Robert Bristol, C. Grant Willson
Proceedings Volume 7972, 79720F (2011) https://doi.org/10.1117/12.879861
KEYWORDS: Line edge roughness, Polymers, Lithography, Diffusion, Optical lithography, Photomasks, Chemical analysis, Scanning electron microscopy, Absorbance, Chemistry

Proceedings Article | 16 April 2011 Paper
Younjin Cho, Xinyu Gu, Yuji Hagiwara, Takanori Kawakami, Toshiyuki Ogata, Brandon Rawlings, Yongjun Li, Arun Sundaresan, Nicholas Turro, Robert Bristol, James Blackwell, C. Grant Willson
Proceedings Volume 7972, 797221 (2011) https://doi.org/10.1117/12.879771
KEYWORDS: Polymers, Lithography, Line edge roughness, NOx, Analog electronics, Photomasks, Polymerization, Chlorine, Molecules, Ultraviolet radiation

Proceedings Article | 26 March 2010 Paper
Xinyu Gu, Christopher Bates, Younjin Cho, Takanori Kawakami, Tomoki Nagai, Toshiyuki Ogata, Arunkumar Sundaresan, Nicholas Turro, Robert Bristol, Paul Zimmerman, C. Grant Willson
Proceedings Volume 7639, 763906 (2010) https://doi.org/10.1117/12.846395
KEYWORDS: Lithography, Photomasks, Critical dimension metrology, Photoresist materials, Manufacturing, Polymers, Semiconductors, Double patterning technology, Image processing, Interferometry

Proceedings Article | 1 April 2009 Paper
Xinyu Gu, Adam Berro, Younjin Cho, Kane Jen, Saul Lee, Tomoki Ngai, Toshiyuki Ogata, William Durand, Arunkumar Sundaresan, Jeffrey Lancaster, Steffen Jockusch, Paul Zimmerman, Nicholas Turro, C. Willson
Proceedings Volume 7273, 72731C (2009) https://doi.org/10.1117/12.814298
KEYWORDS: Polymers, Lithography, Crystals, Diffusion, Temperature metrology, Extreme ultraviolet lithography, Sensors, Polymer thin films, Optical lithography, Photomasks

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