Yuya Kamei
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 1 May 2023 Poster + Paper
Proceedings Volume 12498, 124981F (2023) https://doi.org/10.1117/12.2657076
KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Line edge roughness, Etching, Solubility, High volume manufacturing, Silicon carbide, Silicon, Scanning electron microscopy

Proceedings Article | 11 November 2022 Presentation
Seiji Nagahara, Arnaud Dauendorffer, Xiang Liu, Tomoya Onitsuka, Hisashi Genjima, Noriaki Nagamine, Yuhei Kuwahara, Yuya Kamei, Shinichiro Kawakami, Makoto Muramatsu, Satoru Shimura, Kathleen Nafus, Noriaki Oikawa, Yannick Feurprier, Marc Demand, Sophie Thibaut, Alexandra Krawicz, Steven Grzeskowiak, Katie Lutker-Lee, Eric Liu, Christopher Catano, Joshua LaRose, Jeffrey Shearer, Lior Huli, Philippe Foubert, Danilo De Simone
Proceedings Volume PC12292, PC122920N (2022) https://doi.org/10.1117/12.2642941
KEYWORDS: Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Etching, Plasma etching, Lithography, Yield improvement, Stochastic processes, Plasma, Photoresist materials

Proceedings Article | 25 May 2022 Poster + Paper
Proceedings Volume 12055, 120550N (2022) https://doi.org/10.1117/12.2613974
KEYWORDS: Metals, Contamination, Semiconducting wafers, Optical lithography, Extreme ultraviolet lithography, Contamination control, Coating, Bridges, Manufacturing, Oxides

Proceedings Article | 25 May 2022 Poster + Paper
Yuya Kamei, Tomoya Onitsuka, Takashi Yamauchi, Takahiro Shiozawa, Yuhei Kuwahara, Shinichiro Kawakami, Seiji Fujimoto, Arisa Hara, Satoru Shimura
Proceedings Volume 12055, 120550O (2022) https://doi.org/10.1117/12.2613643
KEYWORDS: Particles, Bridges, Etching, Semiconducting wafers, Metals, Extreme ultraviolet, Silicon carbide, Photoresist processing, Optical lithography, Lithography

Proceedings Article | 28 September 2021 Presentation
Arnaud Dauendorffer, Tomoya Onitsuka, Hiroki Tadatomo, Keisuke Yoshida, Takahiro Shiozawa, Hisashi Genjima, Noriaki Nagamine, Yuya Kamei, Soichiro Okada, Shinichiro Kawakami, Makoto Muramatsu, Satoru Shimura, Kathleen Nafus, Noriaki Oikawa, Yannick Feurprier, Marc Demand, Ainhoa Romo Negreira, Seiji Nagahara, Congque Dinh, Luka Kljucar, Danilo De Simone, Philippe Foubert
Proceedings Volume 11854, 118540B (2021) https://doi.org/10.1117/12.2600860
KEYWORDS: Extreme ultraviolet lithography, Optical lithography, Metals, Etching, Stochastic processes, Semiconductors, Semiconductor manufacturing, Resistance, Photomasks, Particles

Showing 5 of 17 publications
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