Prof. David C. Joy Profile

Prof. David C. Joy

Professor at Univ of Tennessee

SPIE Involvement:

Author | Instructor

Publications (31)

Proceedings Article | 15 April 2010 Paper

Evaluating SEM performance from the contrast transfer function

David Joy, Joseph Michael, Brendan Griffin

Proceedings Volume 7638, 76383J (2010) https://doi.org/10.1117/12.846455

KEYWORDS: Contrast transfer function, Scanning electron microscopy, Spatial frequencies, Image resolution, Signal processing, Microscopes, Ions, Electron microscopes, Metrology, Spatial resolution

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Proceedings Article | 24 March 2008 Paper

Modeling for metrology with a helium beam

Ranjan Ramachandra, Brendan Griffin, David Joy

Proceedings Volume 6922, 69221W (2008) https://doi.org/10.1117/12.772300

KEYWORDS: Ions, Metrology, Helium, Monte Carlo methods, Gold, Solids, Ion beams, Copper, Aluminum, Silver

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Proceedings Article | 10 September 2007 Paper

Length calibration standards for nano-manufacturing

David Joy, Sachin Deo, Brendan Griffin

Proceedings Volume 6648, 664807 (2007) https://doi.org/10.1117/12.735576

KEYWORDS: Scanning electron microscopy, Calibration, Metrology, Electron beam lithography, Semiconducting wafers, Electron beams, Diffraction gratings, Raster graphics, Silicon, Standards development

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Proceedings Article | 5 April 2007 Paper

Device metrology with high-performance scanning ion beams

David Joy, Brendan Griffin, John Notte, Lewis Stern, Shawn McVey, Bill Ward, Clarke Fenner

Proceedings Volume 6518, 65181I (2007) https://doi.org/10.1117/12.710926

KEYWORDS: Ions, Ion beams, Metrology, Electron beams, Scanning electron microscopy, Helium, Image enhancement, Microscopes, Image resolution, Signal generators

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Proceedings Article | 5 April 2007 Paper

Magnification calibration standards for sub-100nm metrology

Sachin Deo, David Joy

Proceedings Volume 6518, 65183N (2007) https://doi.org/10.1117/12.711790

KEYWORDS: Calibration, Metrology, Standards development, Scanning electron microscopy, Line edge roughness, Silicon, Electron beam lithography, Hydrogen, Electron beams, Semiconductors

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SPIE Journal Paper | 1 April 2007

Effects of fast secondary electrons to low-voltage electron beam lithography

Mehdi Bolorizadeh, David Joy

JM3, Vol. 6, Issue 02, 023004, (April 2007) https://doi.org/10.1117/12.10.1117/1.2728899

KEYWORDS: Electrons, Polymethylmethacrylate, Electron beams, Electron beam lithography, Scanning electron microscopy, Monte Carlo methods, Lithography, Scattering, Laser scattering, Solids

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Proceedings Article | 24 March 2006 Paper

Effects of low-voltage electron beam lithography

Mehdi Bolorizadeh, David Joy

Proceedings Volume 6151, 61512C (2006) https://doi.org/10.1117/12.656496

KEYWORDS: Polymethylmethacrylate, Electron beam lithography, Scanning electron microscopy, Monte Carlo methods, Lithography, Electron beams, Scattering, Laser scattering, Electron microscopes, Optical lithography

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Proceedings Article | 24 March 2006 Paper

Tools to measure CD-SEM performance

Jihoon Kim, Kiran Jalhadi, Sachin Deo, Soo-Young Lee, David Joy

Proceedings Volume 6152, 61520T (2006) https://doi.org/10.1117/12.650649

KEYWORDS: Zone plates, Image resolution, Spatial resolution, Image analysis, Interference (communication), Fourier transforms, Scanning electron microscopy, Image enhancement, Electron beam lithography, Signal to noise ratio

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Proceedings Article | 24 May 2004 Paper

Low vacuum microscopy for mask metrology

David Joy

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.532856

KEYWORDS: Metrology, Electron beams, Photomasks, Phase shifts, Scanning electron microscopy, Microscopy, Contamination, Quartz, Metals, Electroluminescence

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Proceedings Article | 20 May 2004 Paper

System considerations for maskless lithography

Thomas Karnowski, David Joy, Larry Allard, Lloyd Clonts

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.530899

KEYWORDS: Printing, Monte Carlo methods, Manufacturing, Error analysis, Maskless lithography, Chemical elements, Lithography, Semiconductors, Polymethylmethacrylate, Photomasks

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Lithographic processes for printing device structures on integrated circuits (ICs) are the fundamental technology behind Moore's law. Next-generation techniques like maskless lithography or ML2 have the advantage that the long, tedious and expensive process of fabricating a unique mask for the manufactured chip is not necessary. However, there are some rather daunting prblems with establishing ML2 as a viable commercial technology. The data rate necessary for ML2 to be competitive in manufacturing is not feasible with technology in the near future. There is also doubt that the competing technologies for the writing mechanisms and corresponding photoresist (or analogous medium) will be able to accurately produce the desired patterns necessary to produce multi-layer semiconductor devices. In this work, we model the maskless printing system from a signal processing point of view, utilizing image processing algorithms and concepts to study the effects of various real-world constraints and their implications for a ML2 system. The ML2 elements are discrete devices, and it is doubtful that their motion can be controlled to the level where a one-for-one element to exposed pixel relationship is allowable. Some level of sub-element resolution can be achieved with gray scale levels, but with the highly integrated manufacturing practices required to achieve massive parallelism, the most effective elements will be simple on-ofrf switches that fire a fixed level of energy at the target medium. Consequently gray-scale level devidces are likely not an option. Another problem with highly integrated manufacturing methods is device uniformity. Consequently, we analyze the redundant scanning array concept (RSA) conceived by Berglund et al. which can defeat many of these problems. We determine some basic equations governing its application and we focus on applying the technique to an array of low-energy electron emitters. Using the results of Monte Carlo simulations on electron beam profiles, we determine an empirical "impulse response" for each emitter and thus determine how each emission manifests itself in the final printed lithographic pattern. We apply methods to determine the best printable image for a variety of RSA geometries, including different levels of redundancy and achieved printer element spacing. We use concepts of total printing error to help quantify the printing quality. Through simulation, we report the effects of dead or missing elements. We also present some error analysis to account for non-ideal array positioning. Ultimately, we believe that printing quality should be the grounds for determining the necessary data rates to support competitive manufacturing with ML2 devices.

Proceedings Article | 10 July 2003 Paper

Applications of image diagnostics to metrology quality assurance and process control

John Allgair, Victor Boksha, Benjamin Bunday, Alain Diebold, Daniel Cole, Mark Davidson, Jerry Hutcheson, Andrew Gurnell, David Joy, John McIntosh, Sylvain Muckenhirn, Joseph Pellegrini, Robert Larrabee, James Potzick, Andras Vladar, Nigel Smith, Alexander Starikov, Neal Sullivan, Oliver Wells

Proceedings Volume 5042, (2003) https://doi.org/10.1117/12.504320

KEYWORDS: Metrology, Diagnostics, Dimensional metrology, Optical lithography, Manufacturing, Process control, Image processing, Critical dimension metrology, Semiconducting wafers, Edge roughness

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Proceedings Article | 2 June 2003 Paper

Simulation of repairing thin-film phase defect in masks for EUV lithography

Yeong-Uk Ko, David Joy, Scott Hector, Bing Lu

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485014

KEYWORDS: Monte Carlo methods, Photomasks, Extreme ultraviolet lithography, Electrons, Electron beams, Thin films, Gaussian beams, Diffusion, Radiation effects, Extreme ultraviolet

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Proceedings Article | 2 June 2003 Paper

Soft electron beam etching for precision TEM sample preparation

Philip Rack, Alexander Thesen, Stephen Randolph, Jason Fowlkes, David Joy

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.482822

KEYWORDS: Etching, Electron beams, Silicon, Transmission electron microscopy, Monte Carlo methods, Ion beams, Photomicroscopy, Ionization, Tungsten, Metrology

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Proceedings Article | 9 August 2002 Paper

Laser synthesis of single-wall carbon nanotubes with time-resolved in situ diagnostics

David Geohegan, Alexander Puretzky, Henrik Schittenhelm, Xudong Fan, Philip Britt, Michael Guillorn, Michael Simpson, Vladimir Merkulov, Derek Austin, Stephen Pennycook, David Joy

Proceedings Volume 4762, (2002) https://doi.org/10.1117/12.478646

KEYWORDS: Single walled carbon nanotubes, Nanoparticles, Carbon, Carbon nanotubes, Diagnostics, Spectroscopy, Metals, Plasma, Annealing, Imaging spectroscopy

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Proceedings Article | 16 July 2002 Paper

Simulation of imaging in projection microscope using multi-beam probe

Yeong-Uk Ko, David Joy

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473497

KEYWORDS: Electrons, Microscopes, Microelectromechanical systems, Mirrors, Monte Carlo methods, Ultraviolet radiation, Optical simulations, Photons, Chemical analysis, Inspection

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Proceedings Article | 16 July 2002 Paper

Low-voltage-point source microscope for interferometry

Bernhard Frost, David Joy, Alexander Thesen

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473498

KEYWORDS: Microscopes, Reflection, Carbon, Interferometry, Lenses, Microchannel plates, Sensors, Electron microscopes, Electron beams, Holograms

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Proceedings Article | 16 July 2002 Paper

Future of e-beam metrology: obstacles and opportunities

David Joy

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473408

KEYWORDS: Metrology, Scanning electron microscopy, Sensors, Critical dimension metrology, Signal to noise ratio, Spatial resolution, Image resolution, Lenses, Scatterometry, 3D metrology

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Proceedings Article | 18 March 2002 Paper

Laser synthesis of single-wall carbon nanotubes with time-resolved in-situ diagnostics

David Geohegan, Alexander Puretzky, Henrik Schittenhelm, Xudong Fan, Philip Britt, Michael Guillorn, Michael Simpson, Vladimir Merkulov, Derek Austin, Stephen Pennycook, David Joy

Proceedings Volume 4636, (2002) https://doi.org/10.1117/12.459725

KEYWORDS: Single walled carbon nanotubes, Nanoparticles, Carbon, Carbon nanotubes, Spectroscopy, Metals, Diagnostics, Annealing, Imaging spectroscopy, Plasma

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Proceedings Article | 22 August 2001 Paper

Monte Carlo model of charging in resists in e-beam lithography

Yeong-Uk Ko, David Joy

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436751

KEYWORDS: Electrons, Electron beam lithography, Monte Carlo methods, Electron beams, Manufacturing, Semiconductor manufacturing, Semiconductors, Control systems, Photomasks, Mask making

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Proceedings Article | 22 August 2001 Paper

Secondary-electron image profiles using bias voltage technique in deep contact hole

Yeong-Uk Ko, David Joy, Neal Sullivan, Martin Mastovich

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436786

KEYWORDS: Selenium, Monte Carlo methods, Oxides, Semiconducting wafers, Image enhancement, Electron beams, Autoregressive models, Image processing, Semiconductors, Fabrication

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Proceedings Article | 22 August 2001 Paper

Initial results with a point projection microscope

Bernhard Frost, David Joy

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436765

KEYWORDS: Holograms, Microscopes, Holography, Sensors, Electron microscopes, Reflection, Projection systems, 3D image reconstruction, Fourier transforms, Distance measurement

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Proceedings Article | 12 April 2001 Paper

Time-resolved diagnostics and mechanisms of single-wall carbon nanotube synthesis by the laser vaporization technique

David Geohegan, Alexander Puretzky, Xudong Fan, Stephen Pennycook, Michael Guillorn, Michael Simpson, Vladimir Merkulov, Derek Austin, David Joy

Proceedings Volume 4347, (2001) https://doi.org/10.1117/12.425010

KEYWORDS: Single walled carbon nanotubes, Carbon, Imaging spectroscopy, Nanoparticles, Spectroscopy, Laser ablation, Plasmas, Carbon nanotubes, Cobalt, Diagnostics

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Proceedings Article | 2 June 2000 Paper

Metrics of resolution and performance for CD-SEMs

David Joy, Yeong-Uk Ko, Justin Hwu

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386444

KEYWORDS: Image resolution, Interference (communication), Signal to noise ratio, Spatial resolution, Scanning electron microscopy, Image analysis, Image enhancement, Image transmission, Microscopes, Electron microscopes

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Proceedings Article | 2 June 2000 Paper

1999 ITRS metrology roadmap and its implications for lithography

Alain Diebold, David Joy

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386443

KEYWORDS: Metrology, Scanning electron microscopy, Optical transfer functions, Microscopy, Lithography, Sensors, Electron beams, Diffraction, Semiconducting wafers, Holography

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Proceedings Article | 2 June 2000 Paper

Monte Carlo model of charging in resists in e-beam lithography

Yeong-Uk Ko, Justin Hwu, David Joy

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386526

KEYWORDS: Electrons, Electron beam lithography, Monte Carlo methods, Electron beams, Manufacturing, Semiconductor manufacturing, Semiconductors, Control systems, Photomasks, Lithography

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Proceedings Article | 2 June 2000 Paper

Computer modeling of charging-induced electron beam deflection in electron beam lithography

Justin Hwu, Yeong-Uk Ko, David Joy

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386477

KEYWORDS: Electron beams, Optical simulations, Computer simulations, Electron beam lithography, Electrodes, Monte Carlo methods, Mathematical modeling, Data modeling, Glasses, Computer programming

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Proceedings Article | 25 June 1999 Paper

In-line holography using a point source

Bernhard Frost, David Joy

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351149

KEYWORDS: Holograms, Microscopes, Sensors, Optical simulations, Holography, Chemical species, Ray tracing, 3D image reconstruction, Reflection, Electron microscopes

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Proceedings Article | 14 June 1999 Paper

Secondary electron spectroscopy for microanalysis and defect review

David Joy, Neeraj Khanna, David Braski

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350849

KEYWORDS: Spectroscopy, Contamination, X-rays, Electron beams, Aluminum, Scanning electron microscopy, Semiconductors, Chemical elements, X-ray detectors, Electron microscopes

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Proceedings Article | 8 June 1998 Paper

Some issues in SEM-based metrology

David Joy

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308720

KEYWORDS: Scanning electron microscopy, Metrology, Spatial resolution, Sensors, Spatial frequencies, Image resolution, Signal to noise ratio, Lenses, Semiconductors, Electron beams

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Proceedings Article | 8 June 1998 Paper

Ultralow-energy imaging for metrology

David Joy

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308753

KEYWORDS: Electrons, Sensors, Metrology, Electroluminescence, Scanning electron microscopy, Electron beams, Monochromatic aberrations, Diffraction, Scattering, Oxides

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Proceedings Article | 12 July 1996 Paper

Separation and characterization of single-chain polymer particles

Reinhard Festag, Bernhard Wunderlich, David Joy, Spiro Alexandratos, Kelsey Cook

Proceedings Volume 2809, (1996) https://doi.org/10.1117/12.244324

KEYWORDS: Particles, Polymers, Molecules, Crystals, Electrodes, Scanning electron microscopy, Solids, Oxides, Capillaries, Ions

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Showing 5 of 31 publications

Proceedings Volume Editor (6)

SPIE Conference Volume | 5 June 2012

Scanning Microscopies 2012: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences

SPIE Conference Volume | 9 June 2011

Scanning Microscopies 2011: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences

SPIE Conference Volume | 2 June 2010

Scanning Microscopy 2010

SPIE Conference Volume | 8 June 2009

Scanning Microscopy 2009

SPIE Conference Volume | 8 June 2009

Scanning Microscopy 2009

Showing 5 of 6 publications

Conference Committee Involvement (22)

Scanning Microscopies 2014

16 September 2014 | Monterey, California, United States

Scanning Microscopies 2012: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences

24 April 2012 | Baltimore, Maryland, United States

Metrology, Inspection, and Process Control for Microlithography XXVI

13 February 2012 | San Jose, California, United States

Scanning Microscopies 2011: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences

26 April 2011 | Orlando, Florida, United States

Metrology, Inspection, and Process Control for Microlithography XXV

28 February 2011 | San Jose, California, United States

Scanning Microscopy 2010

17 May 2010 | Monterey, California, United States

Scanning Microscopy 2010

17 May 2010 | Monterey, United States

Metrology, Inspection, and Process Control for Microlithography XXIV

22 February 2010 | San Jose, California, United States

Instrumentation, Metrology, and Standards for Nanomanufacturing III

4 August 2009 | San Diego, California, United States

Scanning Microscopy 1

5 May 2009 | Monterey, California, United States

Scanning Microscopy 3

5 May 2009 | Monterey, California, United States

Scanning Microscopy 2

5 May 2009 | Monterey, California, United States

SPIE Scanning Microscopy

4 May 2009 | Monterey, United States

Metrology, Inspection, and Process Control for Microlithography XXIII

23 February 2009 | San Jose, California, United States

Instrumentation, Metrology, and Standards for Nanomanufacturing II

10 August 2008 | San Diego, California, United States

Metrology, Inspection, and Process Control for Microlithography XXII

25 February 2008 | San Jose, California, United States

Instrumentation, Metrology, and Standards for Nanomanufacturing

29 August 2007 | San Diego, California, United States

Metrology, Inspection, and Process Control for Microlithography XXI

26 February 2007 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XX

20 February 2006 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XIX

28 February 2005 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XVIII

23 February 2004 | Santa Clara, California, United States

Metrology, Inspection, and Process Control for Microlithography XVII

24 February 2003 | Santa Clara, California, United States

Showing 5 of 22 Conference Committees

Course Instructor

SC955: Software for Scanning Microscopy

This course introduces attendees to computer software which can interpret SEM images, interpret X-ray analytical data, and simulate signal generation processes. Programs to be demonstrated include, IMAGE-J, DTSA II, and a variety of Monte Carlo simulations for both PC and Mac. The goal of the course is to make you feel comfortable in using these programs by providing both some background to what the software does and detailed step by step instructions for problem solving. We will work through typical applications of each package to familiarize you with the procedures for data input and output and program set-up, and identify known limitations and problems with implementations of the programs on different computers. A full set of notes on each program, and every example, will be provided.

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