Dr. Andrew Greene Profile

Dr. Andrew Greene

at IBM Thomas J Watson Research Ctr

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 10 April 2024 Presentation + Paper

Novel ellipsometry metrology-based machine learning technique for low sensitivity characterization of critical dimensions within gate-all-around transistors

Houssam Chouaib, Valeria Dimastrodonato, Anderson Chou, Agostino Cangianoa, Andrew Cross, Derrick Shaughnessy, Zhengquan Tan, Daniel Schmidt, Curtis Durfee, Shanti Pancharatnam, Julien Frougier, Andrew Greene, Mary Breton

Proceedings Volume 12955, 129550L (2024) https://doi.org/10.1117/12.3010790

KEYWORDS: Semiconducting wafers, Education and training, Transmission electron microscopy, Nanosheets, Gallium arsenide, Data modeling, Ellipsometry, Metrology, Diffractive optical elements, Mathematical optimization

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SPIE Journal Paper | 21 February 2023 Open Access

Spectral interferometry for fully integrated device metrology

Daniel Schmidt, Manasa Medikonda, Michael Rizzolo, Claire Silvestre, Julien Frougier, Andrew Greene, Mary Breton, Aron Cepler, Jacob Ofek, Itzik Kaplan, Roy Koret, Igor Turovets

JM3, Vol. 22, Issue 03, 031203, (February 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.3.031203

KEYWORDS: Metrology, Interferometry, Data modeling, Tunable filters, Semiconducting wafers, Scatterometry, Optical filters, Machine learning, Education and training, Dielectrics

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Proceedings Article | 26 May 2022 Presentation + Paper

Vertical travelling scatterometry for metrology on fully integrated devices

D. Schmidt, M. Medikonda, M. Rizzolo, C. Silvestre, J. Frougier, A. Greene, M. Breton, A. Cepler, J. Ofek, I. Kaplan, R. Koret, I. Turovets

Proceedings Volume 12053, 120530S (2022) https://doi.org/10.1117/12.2614077

KEYWORDS: Metrology, Semiconducting wafers, Scatterometry, Optical filters, Dielectrics, Data modeling, Back end of line, Front end of line, Chemical mechanical planarization, Transmission electron microscopy

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SPIE Journal Paper | 18 April 2022 Open Access

Review of nanosheet metrology opportunities for technology readiness

Mary Breton, Daniel Schmidt, Andrew Greene, Julien Frougier, Nelson Felix

JM3, Vol. 21, Issue 02, 021206, (April 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.2.021206

KEYWORDS: Metrology, Scatterometry, Optical lithography, Machine learning, Silicon, Atomic force microscopy, Nanowires, Germanium, Line edge roughness, Scanning electron microscopy

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Proceedings Article | 5 March 2021 Presentation + Paper

OCD enhanced: implementation and validation of spectral interferometry for nanosheet inner spacer indentation

D. Schmidt, C. Durfee, S. Pancharatnam, M. Medikonda, A. Greene, J. Frougier, A. Cepler, G. Belkin, D. Shafir, R. Koret, R. Shtainman, I. Turovets, S. Wolfling

Proceedings Volume 11611, 116111U (2021) https://doi.org/10.1117/12.2582364

KEYWORDS: Interferometry, Silicon, Metrology, Scatterometry, Reflectometry, Transmission electron microscopy, Semiconductor manufacturing, Reflectivity, Polarization control

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Proceedings Article | 22 February 2021 Presentation

Nanosheet metrology opportunities for technology readiness

Mary Breton, Daniel Schmidt, Andrew Greene, Julien Frougier, Curtis Durfee, Indira Seshadri, Jennifer Church, Veeraraghavan Basker, Nelson Felix

Proceedings Volume 11611, 116111R (2021) https://doi.org/10.1117/12.2583636

KEYWORDS: Metrology, Line edge roughness, Gallium arsenide, Transistors, Semiconductors, Nondestructive evaluation, Nanotechnology, Manufacturing, Machine learning, Logic

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Proceedings Article | 22 February 2021 Presentation

Performance of stacked nanosheet gate all around FET’s with EUV patterned gate and sheets

Indira Seshadri, Jennifer Church, Prateek Hundekar, Mary Breton, Jingyun Zhang, Eric Miller, Andrew Greene, Julien Frougier, Chris Waskiewicz, Tao Li, Tsung-Sheng Kang, Daniel Dechene, Carl Radens, Stuart Sieg, Veeraraghavan Basker, Nelson Felix, Chris Mack

Proceedings Volume 11609, 116090S (2021) https://doi.org/10.1117/12.2583897

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Proceedings Article | 2 April 2020 Presentation + Paper

AFM characterization for Gate-All-Around (GAA) devices

Mary Breton, Jennifer Fullam, Dexin Kong, Daniel Schmidt, Andrew Greene, Julien Frougier, Sean Hand, Jason Osborne, Weijie Wang, David Fey

Proceedings Volume 11325, 1132514 (2020) https://doi.org/10.1117/12.2551931

KEYWORDS: Atomic force microscopy, Metrology, Transmission electron microscopy, Gallium arsenide, 3D metrology, Measurement devices, Scanning electron microscopy, Semiconducting wafers, Visualization, X-ray optics

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Proceedings Article | 25 March 2020 Presentation

A comparative analysis of EUV sheet and gate patterning for beyond 7nm gate all around stacked nanosheet FET’s (Conference Presentation)

Indira Seshadri, Praveen Joseph, Stuart Sieg, Tao Li, Wenyu Xu, Eric Miller, Dan Dechene, Andrew Greene, Carl Radens, Jingyun Zhang, Yann Mignot, Pietro Montanini, Mary Breton, Veeraraghavan Basker, Nelson Felix

Proceedings Volume 11328, 113280B (2020) https://doi.org/10.1117/12.2552159

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Showing 5 of 9 publications

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