Mr. Akira Hamaguchi Profile

Akira Hamaguchi

at KIOXIA Corp

SPIE Involvement:

Author

Publications (13)

SPIE Journal Paper | 31 October 2023 Open Access

In situ electrical property quantification of memory devices by modulated electron microscopy

Muneyuki Fukuda, Kazuhisa Hasumi, Takashi Nobuhara, Hirohiko Kitsuki, Zhigang Wang, Kazuhiro Nojima, Yusaku Suzuki, Akira Hamaguchi, Masashi Kubo, Masaya Hosokawa

JM3, Vol. 22, Issue 04, 041605, (October 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041605

KEYWORDS: Modulation, Electron microscopy, Semiconducting wafers, Scanning electron microscopy, Electrical properties, Inspection, Defect detection, Scanning probe microscopy, Manufacturing, Defect inspection

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Proceedings Article | 27 April 2023 Presentation + Paper

In-situ electrical property quantification of memory devices by modulated electron microscopy

Muneyuki Fukuda, Kazuhisa Hasumi, Takashi Nobuhara, Hirohiko Kitsuki, Zhigang Wang, Kazuhiro Nojima, Yusaku Suzuki, Akira Hamaguchi, Masashi Kubo, Masaya Hosokawa

Proceedings Volume 12496, 124961O (2023) https://doi.org/10.1117/12.2658250

KEYWORDS: Modulation, Electron microscopy, Semiconducting wafers, Inspection, Defect detection, Scanning electron microscopy, Scanning probe microscopy, Electrical properties, Manufacturing, Nanometer integrated circuits, Semiconductor characterization

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Proceedings Article | 22 February 2021 Presentation + Paper

In-line schematic failure analysis technique by defect SEM images

Junya Okude, Chihiro Ida, Kazuhiro Nojima, Akira Hamaguchi

Proceedings Volume 11611, 116110M (2021) https://doi.org/10.1117/12.2583469

KEYWORDS: Computer aided design, Scanning electron microscopy, Failure analysis, Inspection, Optical inspection, Semiconductors, Machine learning, Defect detection

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Proceedings Article | 26 March 2019 Paper

Depth measurement technique for extremely deep holes using back-scattered electron images with high voltage CD-SEM

Takahiro Nishihata, Mayuka Osaki, Maki Tanaka, Takuma Yamamoto, Akira Hamaguchi, Chihiro Ida, Yusaku Suzuki

Proceedings Volume 10959, 109591B (2019) https://doi.org/10.1117/12.2514799

KEYWORDS: 3D metrology, Scanning electron microscopy, Monte Carlo methods, Calibration, 3D acquisition, Scattering, Nondestructive evaluation

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Proceedings Article | 2 April 2014 Paper

Verification metrology system by using inline reference metrology

Hideaki Abe, Yasuhiko Ishibashi, Chihiro Ida, Akira Hamaguchi, Takahiro Ikeda, Yuichiro Yamazaki

Proceedings Volume 9050, 90501L (2014) https://doi.org/10.1117/12.2048686

KEYWORDS: Metrology, Scatterometry, Nondestructive evaluation, Inspection, Semiconducting wafers, Scattering, Silicon, X-rays, Scatter measurement, Signal detection

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Proceedings Article | 20 April 2011 Paper

High-speed atmospheric imaging of semiconductor wafers using rapid probe microscopy

Priyanka Kohli, Jeff Lyons, Andrew D. L. Humphris, Benjamin D. Bunday, Abraham Arceo, Akira Hamaguchi, Dilip Patel, David Bakker

Proceedings Volume 7971, 797119 (2011) https://doi.org/10.1117/12.879456

KEYWORDS: Semiconducting wafers, Image processing, Copper, Microscopy, Scanning electron microscopy, Safety, Semiconductors, Chemical mechanical planarization, Etching, Neodymium

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Proceedings Article | 24 March 2009 Paper

Investigation of factors causing difference between simulation and real SEM image

M. Kadowaki, A. Hamaguchi, H. Abe, Y. Yamazaki, S. Borisov, A. Ivanchikov, S. Babin

Proceedings Volume 7272, 72723I (2009) https://doi.org/10.1117/12.814036

KEYWORDS: Oxides, Scanning electron microscopy, Monte Carlo methods, Silicon, Silica, Wet etching, Inspection, Optical spheres, Electron beams, Data acquisition

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Proceedings Article | 24 March 2009 Paper

Time dependence of SEM signal due to charging: measurements and simulation using Monte Carlo software

H. Abe, S. Babin, S. Borisov, A. Hamaguchi, A. Ivanchikov, M. Kadowaki, Y. Yamazaki

Proceedings Volume 7272, 727248 (2009) https://doi.org/10.1117/12.816899

KEYWORDS: Monte Carlo methods, Scanning electron microscopy, Silica, Silicon, Electron beams, Dielectrics, Defect inspection, Optical simulations, Sensors, 3D modeling

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Proceedings Article | 24 March 2008 Paper

Experiment and simulation of charging effects in SEM

S. Babin, S. Borisov, Y. Miyano, H. Abe, M. Kadowaki, A. Hamaguchi, Y. Yamazaki

Proceedings Volume 6922, 692219 (2008) https://doi.org/10.1117/12.772255

KEYWORDS: Monte Carlo methods, Silica, Scanning electron microscopy, Silicon, Optical simulations, Scattering, Electron beams, Laser scattering, Sensors, Electron transport

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Proceedings Article | 5 April 2007 Paper

Evaluation of CD-SEM measurement uncertainty using secondary electron simulation with charging effect

Hideaki Abe, Akira Hamaguchi, Yuichiro Yamazaki

Proceedings Volume 6518, 65180L (2007) https://doi.org/10.1117/12.712191

KEYWORDS: Critical dimension metrology, Optical simulations, Electron beams, Monte Carlo methods, Silicon, Scanning electron microscopy, Scattering, Laser scattering, Oxides, Atomic force microscopy

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Proceedings Article | 10 May 2005 Paper

Three-dimensional measurement by tilting and moving objective lens in CD-SEM(III)

K. Abe, Y. Tsuruga, S. Okada, T. Noma, H. Aoki, H. Fujii, H. Koike, A. Hamaguchi, Y. Yamazaki

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600336

KEYWORDS: Objectives, Image resolution, Reconstruction algorithms, 3D image processing, Optical systems, Semiconductors, Scanning electron microscopy, 3D image reconstruction, Optical simulations, Image acquisition

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Proceedings Article | 24 May 2004 Paper

Three-dimensional measurement by tilting and moving the objective lens in CD-SEM (II)

Kazuo Abe, Kouji Kimura, Yasuko Tsuruga, Shin-ichi Okada, Hitoshi Suzuki, Nobuo Kochi, Hirotami Koike, Akira Hamaguchi, Yuichiro Yamazaki

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536134

KEYWORDS: Objectives, 3D metrology, Image resolution, 3D image processing, Semiconductors, Reconstruction algorithms, 3D image reconstruction, Magnetism, Electron beams, Optical simulations

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Proceedings Article | 27 December 2002 Paper

Mask defect specifications with fail-bit-map analysis

Shinji Yamaguchi, Eiji Yamanaka, Hiroyuki Morinaga, Kohji Hashimoto, Takashi Sakamoto, Akira Hamaguchi, Satoru Matsumoto, Osamu Ikenaga, Soichi Inoue

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467900

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Cadmium sulfide, Inspection, Opacity, Failure analysis, Lithography, Scanning electron microscopy, Semiconductors

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Showing 5 of 13 publications

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