Dr. Stefan Wurm
Managing Member
SPIE Involvement:
Conference Program Committee | Author
Publications (40)

Proceedings Article | 9 November 2015 Paper
Proceedings Volume 9635, 96351D (2015) https://doi.org/10.1117/12.2205054
KEYWORDS: Extreme ultraviolet, Photomasks, Prototyping, Extreme ultraviolet lithography, Electromagnetic coupling, Metrology, Calibration, Scanners, Image acquisition, Image processing

Proceedings Article | 4 September 2015 Paper
Matt Malloy, Brad Thiel, Benjamin Bunday, Stefan Wurm, Vibhu Jindal, Maseeh Mukhtar, Kathy Quoi, Thomas Kemen, Dirk Zeidler, Anna Lena Eberle, Tomasz Garbowski, Gregor Dellemann, Jan Hendrik Peters
Proceedings Volume 9661, 96610O (2015) https://doi.org/10.1117/12.2196120
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Defect inspection, Extreme ultraviolet, Imaging systems, Wafer inspection, Optical inspection, Wafer-level optics, Optics manufacturing

Proceedings Article | 19 March 2015 Paper
Matt Malloy, Brad Thiel, Benjamin Bunday, Stefan Wurm, Maseeh Mukhtar, Kathy Quoi, Thomas Kemen, Dirk Zeidler, Anna Lena Eberle, Tomasz Garbowski, Gregor Dellemann, Jan Hendrik Peters
Proceedings Volume 9423, 942319 (2015) https://doi.org/10.1117/12.2175535
KEYWORDS: Inspection, Defect inspection, Photomasks, Semiconducting wafers, Optical inspection, Wafer inspection, Extreme ultraviolet, Manufacturing, Prototyping, Optics manufacturing

Proceedings Article | 17 October 2014 Paper
Proceedings Volume 9231, 923103 (2014) https://doi.org/10.1117/12.2076766
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Manufacturing, Optical lithography, Inspection, Pellicles, Logic, Double patterning technology, Lithography

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 90481O (2014) https://doi.org/10.1117/12.2048397
KEYWORDS: Photomasks, Extreme ultraviolet, Mirrors, Semiconducting wafers, Extreme ultraviolet lithography, Scanners, Imaging systems, 3D image processing, Reflectivity, Optical lithography

Proceedings Article | 17 April 2014 Paper
Kevin Cummings, Dominic Ashworth, Mark Bremer, Rodney Chin, Yu-Jen Fan, Luc Girard, Holger Glatzel, Michael Goldstein, Eric Gullikson, Jim Kennon, Bob Kestner, Lou Marchetti, Patrick Naulleau, Regina Soufli, Johannes Bauer, Markus Mengel, Joachim Welker, Michael Grupp, Erik Sohmen, Stefan Wurm
Proceedings Volume 9048, 90481M (2014) https://doi.org/10.1117/12.2046380
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Projection systems, Lithography, Reticles, Cameras, Artificial intelligence, Optical lithography, Wavefronts, Sensors

Proceedings Article | 1 October 2013 Paper
Proceedings Volume 8886, 88860C (2013) https://doi.org/10.1117/12.2039943
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Reflectivity, Multilayers, Ions, Optical lithography, Ion beams, Deposition processes, Coating

Proceedings Article | 1 April 2013 Paper
Karen Petrillo, Kyoungyoung Cho, Alexander Friz, Cecilia Montgomery, Dominic Ashworth, Mark Neisser, Stefan Wurm, Takashi Saito, Lior Huli, Akiteru Ko, Andrew Metz
Proceedings Volume 8679, 867911 (2013) https://doi.org/10.1117/12.2011566
KEYWORDS: Etching, Line width roughness, Extreme ultraviolet, Image processing, Photoresist processing, Extreme ultraviolet lithography, Silicon, Lithography, Optical lithography, Photons

Proceedings Article | 23 March 2012 Paper
Karen Petrillo, George Huang, Dominic Ashworth, Liping Ren, K.-Y. Cho, Stefan Wurm, Shinichiro Kawakami, Lior Huli, Shannon Dunn, Akiteru Ko
Proceedings Volume 8322, 83222H (2012) https://doi.org/10.1117/12.925442
KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Etching, Line edge roughness, Image processing, Extreme ultraviolet, Silicon, Optical lithography, Lithography, Scanning electron microscopy

Proceedings Article | 7 April 2011 Paper
Proceedings Volume 7969, 796913 (2011) https://doi.org/10.1117/12.879513
KEYWORDS: Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Etching, Photoresist processing, Image processing, Semiconducting wafers, Optical lithography, Critical dimension metrology, Scanning electron microscopy

Proceedings Article | 20 March 2010 Paper
Proceedings Volume 7636, 76360K (2010) https://doi.org/10.1117/12.846922
KEYWORDS: Photomasks, Wafer inspection, Inspection, Particles, Extreme ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Defect detection, Mask making, High volume manufacturing

Proceedings Article | 20 March 2010 Paper
Proceedings Volume 7636, 76361D (2010) https://doi.org/10.1117/12.847371
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Defect inspection, Optical inspection, Particles, Reflectivity, Manufacturing, Deep ultraviolet

Proceedings Article | 18 March 2010 Paper
Proceedings Volume 7636, 763604 (2010) https://doi.org/10.1117/12.846629
KEYWORDS: Optical lithography, Extreme ultraviolet, Manufacturing, Line width roughness, Polymers, Etching, Extreme ultraviolet lithography, Resistance, Glasses, Photoresist processing

Proceedings Article | 27 May 2009 Paper
Proceedings Volume 7470, 74700Y (2009) https://doi.org/10.1117/12.835196
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Defect inspection, Reticles, Extreme ultraviolet lithography, Multilayers, Deep ultraviolet, Semiconducting wafers, Critical dimension metrology

Proceedings Article | 23 May 2009 Paper
Proceedings Volume 7470, 747002 (2009) https://doi.org/10.1117/12.834186
KEYWORDS: Extreme ultraviolet lithography, Inspection, Extreme ultraviolet, Lithography, Manufacturing, Defect inspection, Photomasks, Semiconductors, Optical lithography, Airborne remote sensing

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 72713J (2009) https://doi.org/10.1117/12.814249
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Defect inspection, Semiconducting wafers, Extreme ultraviolet lithography, Deep ultraviolet, Wafer inspection, Reticles, Defect detection

Proceedings Article | 18 March 2009 Paper
Long He, John Lystad, Stefan Wurm, Kevin Orvek, Jaewoong Sohn, Andy Ma, Patrick Kearney, Steve Kolbow, David Halbmaier
Proceedings Volume 7271, 72710I (2009) https://doi.org/10.1117/12.814304
KEYWORDS: Reticles, Extreme ultraviolet, Inspection, Photomasks, Particles, Extreme ultraviolet lithography, Silica, Semiconducting wafers, Standards development, Contamination

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 727124 (2009) https://doi.org/10.1117/12.814314
KEYWORDS: Semiconducting wafers, Manufacturing, Extreme ultraviolet lithography, Extreme ultraviolet, Line width roughness, Photoresist processing, Optical lithography, Photomasks, Electroluminescence, Critical dimension metrology

Proceedings Article | 18 March 2009 Paper
Patrick Naulleau, Christopher Anderson, Lorie-Mae Baclea-an, Paul Denham, Simi George, Kenneth Goldberg, Michael Goldstein, Brian Hoef, Russ Hudyma, Gideon Jones, Chawon Koh, Bruno La Fontaine, Brittany McClinton, Ryan Miyakawa, Warren Montgomery, John Roller, Thomas Wallow, Stefan Wurm
Proceedings Volume 7271, 72710W (2009) https://doi.org/10.1117/12.814232
KEYWORDS: Line edge roughness, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Printing, Lithography, Computer aided design, Synchrotrons, Surface roughness

Proceedings Article | 2 May 2008 Paper
J. Peters, C. Tonk, D. Spriegel, Hak-Seung Han, Wonil Cho, Stefan Wurm
Proceedings Volume 6792, 67920F (2008) https://doi.org/10.1117/12.798594
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Printing, Defect detection, Particles, Quartz, Signal detection, Data centers, Defect inspection

Proceedings Article | 3 April 2008 Paper
Andy Ma, Joo-on Park, Kim Dean, Stefan Wurm, Patrick Naulleau
Proceedings Volume 6921, 69213O (2008) https://doi.org/10.1117/12.775037
KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Printing, Scanning electron microscopy, Lithography, Real-time computing, Electroluminescence, Head-mounted displays, Photoresist processing

Proceedings Article | 21 March 2008 Paper
Proceedings Volume 6921, 69211Y (2008) https://doi.org/10.1117/12.772590
KEYWORDS: Photomasks, Critical dimension metrology, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Charge-coupled devices, Inspection, Lithography, Scanners, Line width roughness

Proceedings Article | 21 March 2008 Paper
Long He, Stefan Wurm, Phil Seidel, Kevin Orvek, Ernie Betancourt, Jon Underwood
Proceedings Volume 6921, 69211Z (2008) https://doi.org/10.1117/12.773278
KEYWORDS: Reticles, Extreme ultraviolet, Photomasks, Particles, Inspection, Extreme ultraviolet lithography, Contamination, Robotics, EUV optics, Manufacturing

Proceedings Article | 15 May 2007 Paper
Proceedings Volume 6607, 66073A (2007) https://doi.org/10.1117/12.729029
KEYWORDS: Inspection, Photomasks, Defect inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Visible radiation, Printing, Wafer inspection, Mask making, Manufacturing

Proceedings Article | 3 May 2007 Paper
Proceedings Volume 6533, 65330Z (2007) https://doi.org/10.1117/12.737154
KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Reticles, Defect inspection, Extreme ultraviolet lithography, Manufacturing, Semiconducting wafers, Standards development, Printing

Proceedings Article | 23 March 2007 Paper
Proceedings Volume 6517, 651705 (2007) https://doi.org/10.1117/12.717756
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, EUV optics, Optics manufacturing, Lithography, Reticles, Metrology, Particles, Defect inspection

Proceedings Article | 15 March 2007 Paper
Long He, Kevin Orvek, Phil Seidel, Stefan Wurm, Jon Underwood, Ernie Betancourt
Proceedings Volume 6517, 65171O (2007) https://doi.org/10.1117/12.712872
KEYWORDS: Reticles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Particles, Pellicles, Inspection, Robotics, Contamination, Standards development

Proceedings Article | 23 March 2006 Paper
Proceedings Volume 6151, 61510F (2006) https://doi.org/10.1117/12.656502
KEYWORDS: Mirrors, Extreme ultraviolet, Reflectivity, Carbon monoxide, Extreme ultraviolet lithography, Molecules, EUV optics, Carbon, Reflectometry, Synchrotrons

Proceedings Article | 16 June 2005 Paper
Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637331
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Inspection, Photomasks, Lithography, Ultraviolet radiation, EUV optics, Defect inspection, Reflectivity, Deposition processes

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599978
KEYWORDS: Photodiodes, Mirrors, Extreme ultraviolet lithography, Extreme ultraviolet, Electrodes, Reflectivity, Atomic force microscopy, Scanning electron microscopy, Ions, Xenon

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600093
KEYWORDS: Molybdenum, Silicon, Ruthenium, Gold, Ions, Xenon, Palladium, Extreme ultraviolet lithography, Atomic force microscopy, Crystals

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599799
KEYWORDS: Ions, Xenon, Mirrors, Extreme ultraviolet, Photodiodes, Diagnostics, Sensors, Plasma, Reflectivity, Iron

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599859
KEYWORDS: Ions, Xenon, Plasma, Silicon, Molybdenum, Sputter deposition, Carbon, Pulsed laser operation, Gold, Silicon carbide

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599343
KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Multilayers, Printing, Scanning electron microscopy, Cadmium, Extreme ultraviolet lithography, Binary data, Imaging systems

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600048
KEYWORDS: Ions, Plasma, Tin, Extreme ultraviolet, Mirrors, Gold, EUV optics, Metals, Etching, Molybdenum

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537403
KEYWORDS: Electrons, Extreme ultraviolet lithography, Silicon, Oxides, Extreme ultraviolet, Oxygen, EUV optics, Mirrors, Reflectivity, Oxidation

Proceedings Article | 16 June 2003 Paper
Donna O'Connell, Sang Hun Lee, William Ballard, Daniel Tichenor, Louis Bernardez, Steven Haney, Terry Johnson, Pamela Barr, Alvin Leung, Karen Jefferson, William Replogle, John Goldsmith, Henry Chapman, Patrick Naulleau, Stefan Wurm, Eric Panning
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484967
KEYWORDS: Projection systems, Lithography, Monochromatic aberrations, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Scanning electron microscopy, Line edge roughness, Reticles, Wavefronts

Proceedings Article | 1 July 2002 Paper
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472316
KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Photoresist materials, Scanning electron microscopy, Extreme ultraviolet, Photoresist processing, Semiconducting wafers, Deep ultraviolet, Semiconductors, Photoresist developing

Proceedings Article | 1 July 2002 Paper
Sang Hun Lee, Daniel Tichenor, William Ballard, Luis Bernardez, John Goldsmith, Steven Haney, Karen Jefferson, Terry Johnson, Alvin Leung, Donna O'Connell, William Replogle, John Wronosky, Kenneth Blaedel, Patrick Naulleau, Kenneth Goldberg, Eric Gullikson, Henry Chapman, Stefan Wurm, Eric Panning, Pei-yang Yan, Guojing Zhang, John Bjorkholm, Glenn Kubiak, Donald Sweeney, David Attwood, Charles Gwyn
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472300
KEYWORDS: Extreme ultraviolet, Lithography, Projection systems, Semiconducting wafers, Extreme ultraviolet lithography, Photomasks, Reticles, Printing, Point spread functions, Image resolution

Proceedings Article | 27 April 1999 Paper
Andreas Steinbach, Martin Sussiek, Siegfried Bernhard, Stefan Wurm, Christian Koelbl, Daniel Koehler, Dirk Knobloch
Proceedings Volume 3743, (1999) https://doi.org/10.1117/12.346913
KEYWORDS: Semiconducting wafers, Etching, Plasma, Oxides, Process control, Plasma etching, Sensors, Plasma systems, Electrodes, Aluminum

Showing 5 of 40 publications
Conference Committee Involvement (8)
International Conference on Extreme Ultraviolet Lithography 2025
21 September 2025 | Monterey, California, United States
40th European Mask and Lithography Conference (EMLC 2025)
16 June 2025 | Dresden, Germany
International Conference on Extreme Ultraviolet Lithography 2024
30 September 2024 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography 2023
2 October 2023 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography 2022
26 September 2022 | Monterey, California, United States
Photomask Technology 2015
29 September 2015 | Monterey, California, United States
SPIE Photomask Technology
10 September 2013 | Monterey, California, United States
Photomask Technology
11 September 2012 | Monterey, California, United States
Showing 5 of 8 Conference Committees
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top