Dr. Dirk Hellweg Profile

Dr. Dirk Hellweg

at Carl Zeiss SMT GmbH

SPIE Involvement:

Author

Publications (22)

Proceedings Article | 10 June 2019 Paper

Actinic metrology platform for defect review and mask qualification: flexibility and performance

Renzo Capelli, Martin Dietzel, Dirk Hellweg, Markus Koch, Grizelda Kersteen, Klaus Gwosch, Daniel Pagel

Proceedings Volume 10957, 109570X (2019) https://doi.org/10.1117/12.2518596

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Pellicles, Image processing, Imaging systems, Semiconducting wafers, Metrology, Projection systems

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Proceedings Article | 2 January 2019 Paper

AIMSTM EUV first insertion into the back end of the line of a mask shop: a crucial step enabling EUV production

Renzo Capelli, Nathan Wilcox, Martin Dietzel, Dirk Hellweg, Scott Chegwidden, Joseph Rodriguez

Proceedings Volume 10810, 108100S (2019) https://doi.org/10.1117/12.2503361

KEYWORDS: Extreme ultraviolet, Photomasks, Metrology, Extreme ultraviolet lithography, Imaging systems, Semiconducting wafers, Particles, Scanners, Contamination, Manufacturing

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Proceedings Article | 23 October 2018 Presentation + Paper

AIMS™ EUV tool platform: aerial-image based qualification of EUV masks

Renzo Capelli, Martin Dietzel, Dirk Hellweg, Grizelda Kersteen, Ralf Gehrke, Markus Bauer

Proceedings Volume 10810, 108100V (2018) https://doi.org/10.1117/12.2501379

KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Image processing, Metrology, 3D image processing, High volume manufacturing, 193nm lithography, Lithography, Reflectivity

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SPIE Journal Paper | 17 September 2018

Evaluation of EUV mask impacts on wafer line-width roughness using aerial and SEM image analyses

Xuemei Chen, Erik Verduijn, Obert Wood, Timothy A. Brunner, Renzo Capelli, Dirk Hellweg, Martin Dietzel, Grizelda Kersteen

JM3, Vol. 17, Issue 04, 041012, (September 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.041012

KEYWORDS: Line width roughness, Photomasks, Extreme ultraviolet, Semiconducting wafers, Scanning electron microscopy, Stochastic processes, Speckle, Scanners, Extreme ultraviolet lithography, Metrology

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Proceedings Article | 27 March 2018 Presentation + Paper

Evaluation of EUV mask impacts on wafer line-edge roughness using aerial and SEM image analyses

Xuemei Chen, Erik Verduijn, Obert Wood, Timothy Brunner, Renzo Capelli, Dirk Hellweg, Martin Dietzel, Grizelda Kersteen

Proceedings Volume 10583, 105830J (2018) https://doi.org/10.1117/12.2297364

KEYWORDS: Line width roughness, Photomasks, Semiconducting wafers, Extreme ultraviolet, Scanning electron microscopy, Stochastic processes, Extreme ultraviolet lithography, Speckle, Image processing, Scanners

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Proceedings Article | 19 March 2018 Paper

Aerial image based metrology of EUV masks: recent achievements, status, and outlook for the AIMS EUV platform

Renzo Capelli, Dirk Hellweg, Martin Dietzel, Markus Koch, Conrad Wolke, Grizelda Kersteen

Proceedings Volume 10583, 1058311 (2018) https://doi.org/10.1117/12.2297681

KEYWORDS: Extreme ultraviolet, Photomasks, Line width roughness, Extreme ultraviolet lithography, Stochastic processes, Scanners, Semiconducting wafers, Image processing, Scanning electron microscopy, Metrology

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Proceedings Article | 16 October 2017 Paper

Actinic review of EUV masks: challenges and achievements in delivering the perfect mask for EUV production

Dirk Hellweg, Martin Dietzel, Renzo Capelli, Conrad Wolke, Grizelda Kersteen, Markus Koch, Ralf Gehrke

Proceedings Volume 10451, 104510J (2017) https://doi.org/10.1117/12.2280689

KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Stochastic processes, Extreme ultraviolet lithography, Scanners, 3D metrology, Line width roughness, Manufacturing, Lithography

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Proceedings Article | 24 March 2017 Presentation + Paper

Printability and actinic AIMS review of programmed mask blank defects

Erik Verduijn, Pawitter Mangat, Obert Wood, Jed Rankin, Yulu Chen, Francis Goodwin, Renzo Capelli, Sascha Perlitz, Dirk Hellweg, Ravi Bonam, Shravan Matham, Nelson Felix, Daniel Corliss

Proceedings Volume 10143, 101430K (2017) https://doi.org/10.1117/12.2260053

KEYWORDS: Photomasks, Semiconducting wafers, Scanning electron microscopy, Extreme ultraviolet, Printing, Bridges, Extreme ultraviolet lithography, Inspection, Chromium, Atomic force microscopy

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Proceedings Article | 24 March 2017 Presentation + Paper

Actinic review of EUV masks: performance data and status of the AIMS EUV system

Dirk Hellweg, Markus Koch, Sascha Perlitz, Martin Dietzel, Renzo Capelli

Proceedings Volume 10143, 101430J (2017) https://doi.org/10.1117/12.2261662

KEYWORDS: Photomasks, Extreme ultraviolet, Metrology, EUV optics, Extreme ultraviolet lithography, Imaging systems, Line width roughness, Surface roughness, Semiconducting wafers, Scanners, Speckle, Scanning electron microscopy

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Proceedings Article | 18 March 2016 Paper

Actinic review of EUV masks: performance data and status of the AIMS EUV System

Dirk Hellweg, Sascha Perlitz, Krister Magnusson, Renzo Capelli, Markus Koch, Matt Malloy

Proceedings Volume 9776, 97761A (2016) https://doi.org/10.1117/12.2219247

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Metrology, Scanners, EUV optics, Particles, Prototyping, Reticles, Electromagnetic coupling

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Proceedings Article | 9 November 2015 Paper

Actinic review of EUV masks: status and recent results of the AIMS EUV system

Sascha Perlitz, Jan Hendrik Peters, Markus Weiss, Dirk Hellweg, Renzo Capelli, Krister Magnusson, Matt Malloy, Stefan Wurm

Proceedings Volume 9635, 96351D (2015) https://doi.org/10.1117/12.2205054

KEYWORDS: Extreme ultraviolet, Photomasks, Prototyping, Extreme ultraviolet lithography, Electromagnetic coupling, Metrology, Calibration, Scanners, Image acquisition, Image processing

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Proceedings Article | 16 March 2015 Paper

Actinic review of EUV masks: Status and recent results of the AIMS EUV system

Markus Weiss, Dirk Hellweg, Markus Koch, Jan Hendrik Peters, Sascha Perlitz, Anthony Garetto, Krister Magnusson, Renzo Capelli, Vibhu Jindal

Proceedings Volume 9422, 942219 (2015) https://doi.org/10.1117/12.2086265

KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Imaging systems, Line width roughness, Scanners, Prototyping, EUV optics, Metrology, Reflectivity

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Proceedings Article | 29 October 2014 Paper

AIMS EUV first light imaging performance

Anthony Garetto, Renzo Capelli, Krister Magnusson, Jan Hendrik Peters, Sascha Perlitz, Ulrich Matejka, Dirk Hellweg, Markus Weiss, Michael Goldstein

Proceedings Volume 9235, 92350N (2014) https://doi.org/10.1117/12.2068308

KEYWORDS: Extreme ultraviolet, Photomasks, Scanners, Extreme ultraviolet lithography, Inspection, Electromagnetic coupling, Scanning electron microscopy, Prototyping, Manufacturing, Logic

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Proceedings Article | 24 April 2014 Paper

Actinic review of EUV masks: first results from the AIMS EUV system integration

Markus Weiss, Dirk Hellweg, Jan Hendrik Peters, Sascha Perlitz, Anthony Garetto, Michael Goldstein

Proceedings Volume 9048, 90480X (2014) https://doi.org/10.1117/12.2046302

KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Reticles, Scanners, System integration, Metrology, Prototyping, Manufacturing

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Proceedings Article | 1 October 2013 Paper

Status of the AIMS EUV development project

Anthony Garetto, Jan Hendrik Peters, Dirk Hellweg, Markus Weiss

Proceedings Volume 8886, 88860I (2013) https://doi.org/10.1117/12.2031611

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Photomasks, Electromagnetic coupling, Metrology, Prototyping, Inspection, Manufacturing, Reticles

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Proceedings Article | 8 November 2012 Paper

Status of the AIMS(TM) EUV Project

Anthony Garetto, Jan Hendrik Peters, Sascha Perlitz, Ulrich Matejka, Dirk Hellweg, Markus Weiss

Proceedings Volume 8522, 852220 (2012) https://doi.org/10.1117/12.981345

KEYWORDS: Extreme ultraviolet, Photomasks, Prototyping, Manufacturing, Climatology, Particles, Inspection, Scanners, Metrology, Extreme ultraviolet lithography

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Proceedings Article | 23 March 2012 Paper

Closing the infrastructure gap: status of the AIMS EUV project

Dirk Hellweg, Markus Weiss, Sascha Perlitz, Jan Hendrik Peters, Wolfgang Harnisch, Michael Goldstein

Proceedings Volume 8322, 83220L (2012) https://doi.org/10.1117/12.918691

KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Scanners, Inspection, Manufacturing, Semiconducting wafers, Multilayers, Mirrors, Metrology

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Proceedings Article | 14 October 2011 Paper

Development status and infrastructure progress update of aerial imaging measurements on EUV masks

Sascha Perlitz, Wolfgang Harnisch, Ulrich Strößner, Jan Hendrik Peters, Markus Weiss, Dirk Hellweg

Proceedings Volume 8166, 816610 (2011) https://doi.org/10.1117/12.899038

KEYWORDS: Extreme ultraviolet, Photomasks, Manufacturing, Plasma, Extreme ultraviolet lithography, Airborne remote sensing, Light sources, Metrology, EUV optics, Electron beam lithography

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Proceedings Article | 5 April 2011 Paper

AIMS EUV: the actinic aerial image review platform for EUV masks

Dirk Hellweg, Johannes Ruoff, Alois Herkommer, Joachim Stühler, Thomas Ihl, Heiko Feldmann, Michael Ringel, Ulrich Strößner, Sascha Perlitz, Wolfgang Harnisch

Proceedings Volume 7969, 79690H (2011) https://doi.org/10.1117/12.879422

KEYWORDS: Extreme ultraviolet, Scanners, Extreme ultraviolet lithography, Photomasks, EUV optics, Reticles, Projection systems, Optics manufacturing, Charge-coupled devices, Artificial intelligence

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Proceedings Article | 2 April 2011 Paper

Concept and feasibility of aerial imaging measurements on EUV masks

Sascha Perlitz, Wolfgang Harnisch, Ulrich Strößner, Heiko Feldmann, Dirk Hellweg, Michael Ringel

Proceedings Volume 7985, 79850U (2011) https://doi.org/10.1117/12.895208

KEYWORDS: Extreme ultraviolet, Photomasks, Scanners, Extreme ultraviolet lithography, Reticles, Particles, Lithography, Metrology, Airborne remote sensing, Electromagnetic coupling

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Proceedings Article | 4 March 2010 Paper

Generation of arbitrary freeform source shapes using advanced illumination systems in high-NA immersion scanners

Jörg Zimmermann, Paul Gräupner, Jens Neumann, Dirk Hellweg, Dirk Jürgens, Michael Patra, Christoph Hennerkes, Manfred Maul, Bernd Geh, Andre Engelen, Oscar Noordman, Melchior Mulder, Sean Park, Joep De Vocht

Proceedings Volume 7640, 764005 (2010) https://doi.org/10.1117/12.847282

KEYWORDS: Diffractive optical elements, Fiber optic illuminators, Reticles, Lithographic illumination, Mirrors, Critical dimension metrology, Distortion, Source mask optimization, Manufacturing, Semiconducting wafers

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Proceedings Article | 4 December 2008 Paper

Extending KrF lithography beyond 80nm with the TWINSCAN XT:1000H 0.93NA scanner

Wim de Boeij, Gerald Dicker, Marten de Wit, Frank Bornebroek, Mark Zellenrath, Harm-Jan Voorma, Bart Smeets, Rene Toussaint, Bart Paarhuis, Marteijn de Jong, Dirk Hellweg, Klaus Kornitzer

Proceedings Volume 7140, 71401B (2008) https://doi.org/10.1117/12.805381

KEYWORDS: Semiconducting wafers, Scanners, Fiber optic illuminators, Lithography, Imaging systems, Overlay metrology, Polarization, Monochromatic aberrations, Reticles, Optical design

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Showing 5 of 22 publications

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